Methods and systems for providing plasma treatments to optical surfaces

ABSTRACT

A device for inhibiting condensation distortion on an optical element is provided. The device may include a housing; a chamber within the housing; electrical circuitry in the housing; a plasma activation region configured to retain the optical element in a manner exposing an optical surface to the plasma activation region, wherein the electrical circuitry is configured to form an electrical connection with a first electrode located on the first side of the dielectric barrier; a second electrode located on a second side of the dielectric barrier, opposite the plasma activation region; and at least one processor configured to: control electricity flow through the circuitry to cause an electric field associated with a voltage drop between the first electrode and a second electrode to generate plasma within the plasma-activation region; and maintain the generated plasma for a time period sufficient to cause the optical surface to become hydrophilic.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the benefit of priority of U.S. ProvisionalPatent Application No. 63/178,024, filed Apr. 22, 2021, and IsraelPatent Application No. 288770, filed Dec. 8, 2021, each of which ishereby incorporated by reference in its entirety. This application isalso a continuation-in-part of U.S. patent application Ser. No.17/573,130, filed Jan. 11, 2022, now pending, which is a continuation ofU.S. patent application Ser. No. 16/539,851, filed Aug. 13, 2019, nowU.S. Pat. No. 11,246,480, which is a continuation-in-part of U.S. patentapplication Ser. No. 15/757,659, filed Mar. 6, 2018, now U.S. Pat. No.10,413,168, which is a U.S. national stage entry of InternationalApplication No. PCT/IL2016/050990, filed Sep. 7, 2016, which claimsbenefit of U.S. Provisional Patent Application No. 62/215,061, filedSep. 7, 2015, each of which is also hereby incorporated by reference inits entirety.

TECHNICAL FIELD

The disclosure, in some embodiments, relates to the field of viewinginstruments, and more particularly, to techniques for improving theeffectiveness of viewing instruments by reducing an accumulation ofcondensation.

BACKGROUND

Medical scopes are widely used in medical procedures, particularly inminimally invasive surgical procedures. Such scopes generally fall intotwo categories—endoscopes and laparoscopes, both of which are used tovisualize internal areas of the body. Endoscopes are commonly used toobtain a visual of the interior of a hollow organ or cavity such as adigestive tract. Laparoscopes are commonly inserted through smallincisions in a patient's skin. As a shorthand, both are often referredto as endoscopes. By way of example only, endoscopes can be used toperform arthroscopy, bronchoscopy, colonoscopy, cystoscopy, enterostomy,hysteroscopy, laparoscopy, laryngoscopy, mediastinoscopy, sigmoidoscopy,esophagogastroduodenoscopy, and ureteroscopy. The medical scopes used toperform these procedures have optics at one end (e.g., a lens) asdiscussed below.

Endoscopes often include a distal end configured to be inserted into apatient's body, and a proximal end configured to remain outside thepatient's body during the procedure. Typically, the distal end includesa viewport such as a lens or a window or a bare end of an optical fiberor even a mirror (such as a dentist mirror, for example). Through theviewport, the scope enables collecting an image of the surroundings ofthe viewport, e.g., using a light-sensitive device such as a CCD. Theviewport may be aimed to collect light from in front of the device(namely from a region coinciding with the longitudinal axis of thedevice), or the viewport may be slanted in an angle relative to thelongitudinal axis or may be facing perpendicular to the longitudinalaxis of the device (as is demonstrated for example in colonoscopies).The proximal end often includes or is connected to a control portionconfigured to be operated by a medical practitioner (e.g., a handle),possibly including user interface components such as switches,navigating sticks, touch screens, and touch pads.

Laparoscopes often include a rod or shaft capable of a rigid orrelatively rigid position and having a viewport, sometimes including anobjective lens, at the distal end, and an eyepiece and/or an integratedvisual display at the proximal end. The scope may also be connected to aremote visual display device or a video camera to record surgicalprocedures.

In a laparoscopic procedure, the patient's abdominal or pelvic cavity isaccessed through one or two or more relatively small incisions(typically between about 3 mm and about 15 mm) and a laparoscope may beinserted through one of the incisions to allow the practitioner a viewof the target internal organs for surgery. The abdomen is typicallyinflated with a gas using an insufflator—carbon dioxide is usually usedfor insufflation—to distend the abdominal space by elevating theabdominal wall above the internal organs and thereby create a sufficientworking and viewing space for the surgeon.

The local environment within a patient's abdominal space is generallyhumid and warm compared to the endoscope or laparoscope which is beinginserted. Consequently, the viewport of the laparoscope tends to blur,e.g., due to fog, that is to say due to condensation of vapor on theviewport, or, for example, due to accumulation of droplets, e.g., blooddroplets originating from surgical activity during the procedure. Asimilar phenomenon may occur with non-laparoscopic endoscopes. When suchfogging occurs, the surgeon's view is inhibited, requiring the surgeonin some instances to remove the scope from the body in order to wipe thelens.

SUMMARY

Embodiments consistent with the present disclosure provide systems andmethods generally relating to plasma treatments for prevention offogging on optical surfaces. The disclosed systems and methods may beimplemented using a combination of conventional hardware and software aswell as specialized hardware and software, such as a machine constructedand/or programmed specifically for performing functions associated withthe disclosed method steps. Consistent with other disclosed embodiments,non-transitory computer readable storage media may store programinstructions, which are executable by at least one processing device andperform any of the steps and/or methods described herein.

Consistent with disclosed embodiments, systems, devices, methods, andcomputer readable media for treating objects with plasma are disclosed.For example, a plasma generation device for treating objects isdisclosed. The embodiments may include a housing; a plasma-generationzone within the housing configured to enable accommodation of an object;circuitry for supplying energy to carry out a plasma treatment forincreasing hydrophilicity of the object to a desired level; at least onesensor configured to measure at least one plasma-activation parameterduring the plasma treatment; and at least one processor configured todetermine, based on the at least one plasma-activation parameter, thatthe plasma treatment is below a threshold for increasing thehydrophilicity of the object to the desired level, and output anotification indicating of plasma treatment failure.

Consistent with disclosed embodiments, systems, devices, methods, andcomputer readable media for treating elongated tools with plasma aredisclosed. The embodiments may include a housing; a bore within thehousing, the bore having an open end on a surface of the housing forinsertion of the elongated tool therein; at least one vacuum pump forcausing a vacuum in at least a portion of the bore; an insertiondetector for determining when the elongated tool is inserted within thebore; a vacuum sensor associated with the housing for determining anextent of negative pressure in the at least a portion of the bore; aplasma generator for generating plasma within the bore; and at least oneprocessor configured to: receive an insertion signal from the insertiondetector indicating that the elongated tool is within the bore; inresponse to the insertion signal, activate the at least one vacuum pumpto generate a negative pressure in the at least a portion of the bore;receive a signal from the vacuum sensor and determine therefrom that anegative pressure in the at least a portion of the bore is sufficientfor plasma generation; and activate the plasma generator after thedetermination is made that negative pressure in the at least a portionof bore is sufficient for plasma generation, thereby exposing a distalend region of the elongated tool to plasma.

Consistent with disclosed embodiments, systems, devices, methods, andcomputer readable media for inhibiting condensation distortion onoptical elements are disclosed. For example, a device for inhibitingcondensation distortion on an optical element of a medical instrumentconfigured for insertion into a body cavity is disclosed. Theembodiments may include a housing; a cavity within the housing, thecavity being sized to removably retain at least a portion of the medicalinstrument therein, wherein the portion includes the optical element; aplasma activation zone within the cavity and arranged such that when theat least a portion of the medical instrument is retained within thecavity, the optical element is located within the plasma activationzone; a plasma generator configured to be activated to cause formationof a plasma cloud in the plasma activation zone in a vicinity of theoptical element; and a controller configured to activate the plasmagenerator for a time period sufficient to cause the optical element tobecome hydrophilic prior to insertion into the body cavity.

Consistent with disclosed embodiments, systems, devices, methods, andcomputer readable media for inhibiting condensation distortion onoptical elements are disclosed. The embodiments may include a housing; achamber within the housing; electrical circuitry in the housing; aplasma activation region associated with the chamber and beingconfigured to retain the optical element in a manner exposing an opticalsurface of the optical element thereof to the plasma activation region,wherein the plasma-activation region is configured to contain gas on afirst side of a dielectric barrier and the electrical circuitry isconfigured to form an electrical connection with a first electrodelocated on the first side of the dielectric barrier; a second electrodeconnected to the electrical circuitry, and being located on a secondside of the dielectric barrier, opposite the plasma activation region;and at least one processor configured to: control electricity flowthrough the circuitry to cause an electric field associated with avoltage drop between the first electrode and a second electrode tothereby generate plasma within the plasma-activation region; andmaintain the generated plasma in the plasma-generating region for timeperiod sufficient to cause the optical surface to become hydrophilic.

Consistent with disclosed embodiments, systems, devices, methods, andcomputer readable media for generating plasma for treating objects aredisclosed. For example, a plasma generator for treating objects isdisclosed. The embodiments may include a housing; a plasma generationzone within the housing configured to enable accommodation of an object;a plasma generator for enabling formation of plasma within the plasmageneration zone; a plurality of vacuum pumps within the housing, eachpump having a vacuum inlet; a plurality of conduits within the housingconnecting the plurality of vacuum pumps in series, such that whenactivated, the series of pumps cause a vacuum within the plasmageneration zone; and at least one processor configured to simultaneouslyoperate the plurality of vacuum pumps while the object is in a region ofthe plasma generation zone.

Some disclosed embodiments involve systems and methods for inhibitingcondensation distortion on an optical element of a medical instrumentconfigured for insertion into a body cavity. The optical element of themedical instrument may be treated to cause at least one surface of theoptical element to become super-hydrophilic. Once treated, the medicalinstrument, with the super-hydrophilic optical element, is inserted intothe body cavity and exposed to moisture, such that the moisture forms afilm barrier on the at least one surface of the optical element tothereby inhibit condensation distortion.

Consistent with some disclosed embodiments, systems, devices, methods,and computer readable media for treating equipment of differingdimensions in a vacuum environment are disclosed. These embodiments mayinclude an enclosure having a channel for receiving elongated tools ofvarying diameters, the enclosure being divided into a vacuum chamberregion and a non-vacuum region. These embodiments may also include anannular seal disposed between the vacuum chamber region and thenon-vacuum region, the annular seal being formed of a flexible materialand configured to form a vacuum seal against a wall of a first tool whenthe first tool is inserted therein and against a wall of a second toolwhen the second tool is inserted therein, wherein the first tool has adiameter at least one and a half times greater than a diameter of thesecond tool.

Some embodiments may include inserting during a first treatment session,a first removable enclosure into a housing, the first removableenclosure being divided into a vacuum chamber region and a non-vacuumregion separated by a first annular seal configured to adjust to varyingtool sizes; inserting during the first treatment session, a firstelongated tool into the first removable enclosure, the first elongatedtool having a first region of a first dimension; sealing, upon insertionof the first elongated tool, the first region of the first dimensionwith the first annular seal; maintaining the first elongated tool in thefirst enclosure during an establishment of at least a partial vacuum inthe vacuum chamber region; and extracting the first elongated tool fromthe first enclosure. These embodiments may also include inserting duringa second treatment session, a second removable enclosure into thehousing, the second removable enclosure being divided into a secondvacuum chamber region and a second non-vacuum region separated by asecond annular seal corresponding in configuration to the first annularseal; inserting during the second treatment session, a second elongatedtool into the second removable enclosure, the second elongated toolhaving a second region of a second dimension differing from the firstdimension; sealing, upon insertion of the second elongated tool, thesecond region of the second dimension with the second annular seal;maintaining the second elongated tool in the second enclosure during anestablishment of at least a partial vacuum in the second vacuum chamberregion; and extracting the second elongated tool from the secondenclosure. Some disclosed embodiments may also involve maintainingduring a second treatment session, the first removable enclosure withinthe housing; inserting during the second treatment session, a secondelongated tool into the first removable enclosure, the second elongatedtool having a second region of a second dimension differing from thefirst dimension; sealing, upon insertion of the second elongated tool,the second region of the second dimension with the first annular seal;maintaining the second elongated tool in the first enclosure during anestablishment of at least a partial vacuum in the vacuum chamber region;and extracting the second elongated tool from the first enclosure.

Some disclosed embodiments include an apparatus for preparing a medicaldevice for a medical procedure. The medical device may have a distalsegment configured to be inserted into a patient's body, the distalsegment having an optical member having an optical surface. Somedisclosed apparatuses include an operational unit, an adapter configuredto be detached from the operational unit, and at least one electrodewhich may be included in the operational unit or in the adapter or(where there are more than one electrode) both. The operational unit mayinclude an EM power source and a housing having a slot configured toreceive the adapter in the slot. The operational unit may also includean adapter identifier, configured to receive an identification signalfrom a corresponding transponder, and a controller functionallyassociated with the adapter identifier. The adapter may include a hollowcylinder extending between an opening and a distal end of the hollowcylinder, wherein the opening is dimensioned to allow insertion of thedistal segment into the hollow cylinder. The adapter may also include aseal positioned in the hollow cylinder and defining a distal portion ofthe hollow cylinder between the seal and the distal end of the hollowcylinder. The seal is dimensioned to sealingly fit an externalcircumference of the distal segment when the distal segment is insertedinto the hollow cylinder. The adapter may also include a transponder,being configured to transmit the identification signal identifying theadapter or a position thereof relative to the adapter identifier, whenthe adapter is in the slot. The apparatus is configured, when the distalsegment is in the hollow cylinder of the adapter, the adapter is in theslot and the adapter identifier receives the identification signal fromthe transponder, to apply a plasma-generating EM field in the distalportion of the hollow cylinder by the at least one electrode, theelectrode receiving EM power from the power source.

According to some embodiments, the adapter includes a hollow cylinderextending between an opening dimensioned and configured to receive thedistal segment of the medical device and a distal end of the hollowcylinder. The adapter may also include a seal positioned in the hollowcylinder and defining a distal portion of the hollow cylinder betweenthe seal and the distal end of the hollow cylinder, the seal dimensionedto sealingly fit an external circumference of the distal segment whenthe distal segment is inserted into the hollow cylinder. The adapter mayalso include a transponder configured to transmit an identificationsignal identifying the adapter when the adapter is in the slot. In someembodiments, the transponder stores information identifying the adapter.In some embodiments, the transponder is configured to transmit theidentification signal in response to a coded signal, thereby identifyingthe adapter.

According to some embodiments, a seal in the adaptor is dimensioned tosealingly fit distal segments having external circumferences in a rangebetween a first circumference L and a second circumference greater than1.5L. The adapter may also include an electrical feedthroughelectrically connecting an external contact outside of the hollowcylinder to an electrical conductor inside the hollow cylinder in thedistal portion thereof.

Some disclosed embodiments involve a method of preparing at least afirst medical device and a second medical device for a medical procedurecarried out on a single patient. Each such medical device has a distalsegment including an optical member. The circumference of the distalsegment of one of the first and second medical devices is L and thecircumference of the distal segment of the other medical device isgreater than 1.2L. Some disclosed methods include providing a plasmachamber having at least one electrode electrically associable with apower source and configured for applying in the plasma chamber a plasmagenerating EM field. The plasma chamber may also have an opening and aseal dimensioned and configured to receive the distal segment of each ofthe first and second medical devices in the opening. An associatedmethod may also include inserting the distal segment of the firstmedical device into the plasma chamber through the opening so that theseal and the distal end together seal the opening. Such a method mayalso include supplying EM power from the power source to the at leastone electrode, thereby applying a plasma generating EM field andgenerating plasma in the vicinity of the optical member. The method mayfurther include repeating the steps of inserting the distal segment andsupplying EM power for the second medical device.

Consistent with some disclosed embodiments, an adaptive seal made of aflexible material is disclosed. The seal may be shaped as a combinedouter tube and an inner annular ring extending radially along a wavycurve having at least one crest between the outer tube and a centralopening of the seal. Such an adaptive seal is thereby configured tosealingly fit to an external surface of a member positioned in thecentral opening and having a smooth circumference within a range betweena first circumference L and a second circumference 1.5L. A smoothcircumference may include a convex curve outlining a convex shape andhaving no corners or sharp edges.

The forgoing summary provides certain examples of disclosed embodimentsto provide a flavor for this disclosure and is not intended to summarizeall aspects of the disclosed embodiments. Additional features andadvantages of the disclosed embodiments will be set forth in part in thedescription that follows, and in part will be apparent from thedescription, or may be learned by practice of the disclosed embodiments.The features and advantages of the disclosed embodiments will berealized and attained by the elements and combinations particularlypointed out in the appended claims.

It is to be understood that both the foregoing general description andthe following detailed description are examples and explanatory only andare not restrictive of the disclosed embodiments as claimed.

The accompanying drawings constitute a part of this specification. Thedrawings illustrate several embodiments of the present disclosure and,together with the description, serve to explain the principles of thedisclosed embodiments as set forth in the accompanying claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute apart of this disclosure, illustrate various disclosed embodiments.Dimensions of components and features shown in the drawings aregenerally chosen for convenience and clarity of presentation and are notnecessarily shown to scale. The drawings are listed below.

FIG. 1A is a perspective view of an embodiment of an apparatus forpreparing a medical instrument to a medical procedure, consistent withsome disclosed embodiments.

FIG. 1B is a perspective view of a distal end of an example of anendoscope, the distal end having a viewport suitable to beplasma-treated by the apparatus of FIG. 1A.

FIG. 10 is a perspective view of an example of a sterility screen of theapparatus of FIG. 1A having a sterility sleeve for covering an exampleof a plasma applicator of the apparatus of FIG. 1A, the sterility sleevebeing rolled prior to use.

FIG. 1D is a perspective view of the sterility screen of FIG. 10,wherein the sterility sleeve is partially unrolled to cover the plasmaapplicator.

FIG. 1 E is a perspective view of the sterility screen of FIG. 10,wherein the sterility sleeve is unrolled and covering the plasmaapplicator.

FIG. 2 is a cross-sectional view of an embodiment of a sheath of anapparatus for preparing a medical instrument consistent with someembodiments of the present disclosure.

FIG. 3A is a cross-sectional view of a sheath positioned inside a boreof a plasma applicator of the apparatus, consistent with some disclosedembodiments.

FIG. 3B is a cross-sectional view of a detail of the sheath of FIG. 3A.

FIG. 3C is a cross-sectional view of another embodiment of a sheath anda generating field applicator for preparing a medical instrument to amedical procedure, consistent with some disclosed embodiments.

FIG. 4 is a cross-sectional view of yet another embodiment of a sheathof an apparatus for preparing a medical instrument to a medicalprocedure, consistent with some disclosed embodiments.

FIGS. 5A, 5B and 5C are respective cross-sectional side, front, and topviews of a plasma generating system, consistent with some disclosedembodiments.

FIG. 6 is a flowchart illustrating a method for inhibiting condensationdistortion on an optical element, consistent with some disclosedembodiments.

FIG. 7 is a perspective view of the plasma generating system of FIGS.5A-5C with the front end removed to reveal internal components.

FIGS. 8A and 8B illustrate two views of a sheath containing an insertedmedical instrument, consistent with some disclosed embodiments.

FIG. 9 illustrates how the sheath of FIG. 8 may be inserted into theplasma generating system of FIGS. 5A-5C, consistent with some disclosedembodiments.

FIG. 10A illustrates a perspective view of a pump assembly consistentwith some disclosed embodiments.

FIG. 10B illustrates a top view of the pump assembly of FIG. 10A;

FIG. 100 illustrates a partial perspective view of a pump manifold foruse in the pump assembly of FIG. 10A.

FIG. 11 illustrates a cutaway perspective view of the plasma generatingsystem of FIGS. 5A-5C, consistent with some disclosed embodiments.

FIG. 12 illustrates a cross-sectional view of a channel in a housing ofthe device of FIGS. 5A-5C, with two medical instruments of varyingdimensions that may be inserted into the channel.

FIG. 13 illustrates a partial perspective view of an integrated sheathand cover consistent with some disclosed embodiments.

FIG. 14 is a flowchart illustrating a method of treating an elongatedtool with plasma, consistent with some disclosed embodiments.

FIG. 15 is a flowchart illustrating a method of inhibiting condensationdistortion on an optical element of a medical instrument consistent withsome disclosed embodiments.

FIG. 16 is a flowchart illustrating a method for determining when aplasma treatment is insufficient, and outputting a notification of such,consistent with some disclosed embodiments.

FIG . 17 is a flowchart that illustrates a method for treating anelongated tool with plasma, in accordance with an embodiment of thepresent disclosure.

FIG. 18 is a flowchart that illustrates a method for inhibitingcondensation distortion on an optical element of a medical instrumentconfigured for insertion into a body cavity, in accordance with anembodiment of the present disclosure.

FIG. 19 is a block diagram of an example process for inhibitingcondensation distortion on an optical element, consistent withembodiments of the present disclosure.

FIG. 20 depicts a flow chart of a method for generating plasma fortreating objects, consistent with disclosed embodiments.

FIG. 21A depicts a perspective view of an apparatus, including anoperational unit and an adapter, for preparing a medical device for amedical procedure, consistent with some disclosed embodiments.

FIG. 21B depicts a perspective view of a distal segment of a medicaldevice, the distal segment having an optical element suitable for plasmatreatment with the apparatus of FIG. 21A, consistent with some disclosedembodiments.

FIG. 21C depicts a perspective view of the apparatus of FIG. 21A insidea sterility cup and covered with a cup cover, consistent with somedisclosed embodiments.

FIG. 22A depicts an internal view of an adapter of an apparatus forpreparing a medical device for a medical procedure, consistent with somedisclosed embodiments.

FIG. 22B depicts a cross-sectional, perspective view of an adaptivevacuum seal of the adapter of FIG. 22A, consistent with some disclosedembodiments.

FIG. 22C depicts an internal view of the adapter of FIG. 22A inside anoperational unit and housing the distal segment of an endoscope,consistent with some disclosed embodiments.

FIG. 23A depicts an electrode arrangement configured for treating anoptical element of a medical device with plasma, consistent with somedisclosed embodiments.

FIG. 23B depicts another electrode arrangement configured for treatingan optical element of a medical device with plasma, consistent with somedisclosed embodiments.

FIG. 23C depicts a further electrode arrangement configured for treatingan optical element of a medical device with plasma, consistent with somedisclosed embodiments.

FIG. 24 depicts an apparatus, including an operational unit and anadapter, for plasma treatment of a medical device, consistent with somedisclosed embodiments.

FIG. 25A depicts the apparatus of FIG. 24 in which the adapter includesa transponder with a magnet, consistent with some disclosed embodiments.

FIG. 25B depicts the apparatus of FIG. 24 in which the adapter includesa transponder with a mirror, consistent with some disclosed embodiments.

FIG. 25C depicts the apparatus of FIG. 24 in which the adapter includesa transponder with a code sticker, consistent with some disclosedembodiments.

FIG. 25D depicts the apparatus of FIG. 24 in which the adapter includesa transponder with an RFID chip, consistent with some disclosedembodiments.

FIG. 25E depicts the apparatus of FIG. 24 in which the adapter includesa transponder with a smart card, consistent with some disclosedembodiments.

FIG. 26 depicts a flow chart of a method for treating equipment ofdiffering dimensions in a vacuum environment, consistent with somedisclosed embodiments.

DETAILED DESCRIPTION

Exemplary embodiments are described with reference to the accompanyingdrawings. In the figures, which are not necessarily drawn to scale, theleft-most digit(s) of a reference number identifies the figure in whichthe reference number first appears. Wherever convenient, the samereference numbers are used throughout the drawings to refer to the sameor like parts. While examples and features of disclosed principles aredescribed herein, modifications, adaptations, and other implementationsare possible without departing from the spirit and scope of thedisclosed embodiments. Also, the words “comprising,” “having,”“containing,” and “including,” and other similar forms are intended tobe equivalent in meaning and be open ended in that an item or itemsfollowing any one of these words is not meant to be an exhaustivelisting of such item or items or meant to be limited to only the listeditem or items. It should also be noted that as used in the presentdisclosure and in the appended claims, the singular forms “a,” “an,” and“the” include plural references unless the context clearly dictatesotherwise.

Unless specifically stated otherwise, as apparent from the followingdescription, throughout the specification discussions utilizing termssuch as “processing,” “calculating,” “computing,” “determining,”“generating,” “setting,” “configuring,” “selecting,” “defining,”“applying,” “obtaining,” “monitoring,” “providing,” “identifying,”“segmenting,” “classifying,” “analyzing,” “associating,” “extracting,”“storing,” “receiving,” “transmitting,” or the like, include actionsand/or processes of a computer that manipulate and/or transform datainto other data, the data represented as physical quantities, forexample such as electronic quantities, and/or the data representingphysical objects. The terms “computer,” “processor,” “controller,”“processing unit,” “computing unit,” and “ processing module” should beexpansively construed to cover any kind of electronic device, componentor unit with data processing capabilities, including, by way ofnon-limiting example, a personal computer, a wearable computer, smartglasses, a tablet, a smartphone, a server, a computing system, a cloudcomputing platform, a communication device, a processor (for example,digital signal processor (DSP), an image signal processor (ISR), amicrocontroller, a field programmable gate array (FPGA), an applicationspecific integrated circuit (ASIC), a central processing unit (CPA), agraphics processing unit (GPU), a visual processing unit (VPU), and soon), possibly with embedded memory, a single core processor, a multicore processor, a core within a processor, any other electroniccomputing device, or any combination of the above.

The operations in accordance with the teachings herein may be performedby a computer specially constructed or programmed to perform thedescribed functions.

As used herein, the phrase “for example,” “such as,” “for instance” andvariants thereof describe non-limiting embodiments of the presentlydisclosed subject matter. Reference in the specification to features of“embodiments,” “one case,” “some cases,” “other cases” or variantsthereof means that a particular feature, structure or characteristicdescribed may be included in at least one embodiment of the presentlydisclosed subject matter. Thus, the appearance of such terms does notnecessarily refer to the same embodiment(s). As used herein, the term“and/or” includes any and all combinations of one or more of theassociated listed items.

Features of the presently disclosed subject matter, are, for brevity,described in the context of particular embodiments. However, it is to beunderstood that features described in connection with one embodiment arealso applicable to other embodiments. Likewise, features described inthe context of a specific combination may be considered separateembodiments, either alone or in a context other than the specificcombination.

In embodiments of the presently disclosed subject matter, one or morestages illustrated in the figures may be executed in a different orderand/or one or more groups of stages may be executed simultaneously andvice versa. The figures illustrate a general schematic of the systemarchitecture in accordance embodiments of the presently disclosedsubject matter. Each module in the figures can be made up of anycombination of software, hardware and/or firmware that performs thefunctions as defined and explained herein. The modules in the figuresmay be centralized in one location or dispersed over more than onelocation.

Examples of the presently disclosed subject matter are not limited inapplication to the details of construction and the arrangement of thecomponents set forth in the following description or illustrated in thedrawings. The subject matter may be practiced or carried out in variousways. Also, it is to be understood that the phraseology and terminologyemployed herein is for the purpose of description and should not beregarded as limiting.

In this document, an element of a drawing that is not described withinthe scope of the drawing and is labeled with a numeral that has beendescribed in a previous drawing may have the same use and description asin the previous drawings.

The drawings in this document may not be to any scale. Different figuresmay use different scales and different scales can be used even withinthe same drawing, for example different scales for different views ofthe same object or different scales for the two adjacent objects.

Consistent with disclosed embodiments, “at least one processor” mayconstitute any physical device or group of devices having electriccircuitry that performs a logic operation on an input or inputs. Forexample, the at least one processor may include one or more integratedcircuits (IC), including application-specific integrated circuit (ASIC),microchips, microcontrollers, microprocessors, all or part of a centralprocessing unit (CPU), graphics processing unit (GPU), digital signalprocessor (DSP), field-programmable gate array (FPGA), server, virtualserver, or other circuits suitable for executing instructions orperforming logic operations. The instructions executed by at least oneprocessor may, for example, be pre-loaded into a memory integrated withor embedded into the controller or may be stored in a separate memory.The memory may include a Random-Access Memory (RAM), a Read-Only Memory(ROM), a hard disk, an optical disk, a magnetic medium, a flash memory,other permanent, fixed, or volatile memory, or any other mechanismcapable of storing instructions. In some embodiments, the at least oneprocessor may include more than one processor. Each processor may have asimilar construction, or the processors may be of differingconstructions that are electrically connected or disconnected from eachother. For example, the processors may be separate circuits orintegrated in a single circuit. When more than one processor is used,the processors may be configured to operate independently orcollaboratively. The processors may be coupled electrically,magnetically, optically, acoustically, mechanically or by other meansthat permit them to interact.

Disclosed embodiments may include and/or access a data structure. A datastructure consistent with the present disclosure may include anycollection of data values and relationships among them. The data may bestored linearly, horizontally, hierarchically, relationally,non-relationally, uni-dimensionally, multidimensionally, operationally,in an ordered manner, in an unordered manner, in an object-orientedmanner, in a centralized manner, in a decentralized manner, in adistributed manner, in a custom manner, or in any manner enabling dataaccess. By way of non-limiting examples, data structures may include anarray, an associative array, a linked list, a binary tree, a balancedtree, a heap, a stack, a queue, a set, a hash table, a record, a taggedunion, ER model, and a graph. For example, a data structure may includean XML database, an RDBMS database, an SQL database or NoSQLalternatives for data storage/search such as, for example, MongoDB,Redis, Couchbase, Datastax Enterprise Graph, Elastic Search, Splunk,SoIr, Cassandra, Amazon DynamoDB, Scylla, HBase, and Neo4J. A datastructure may be a component of the disclosed system or a remotecomputing component (e.g., a cloud-based data structure). Data in thedata structure may be stored in contiguous or non-contiguous memory.Moreover, a data structure, as used herein, does not require informationto be co-located. It may be distributed across multiple servers, forexample, that may be owned or operated by the same or differententities. Thus, the term “data structure” as used herein in the singularis inclusive of plural data structures. Disclosed herein are systems,methods and computer readable media for rendering objects hydrophilicand or treating objects using plasma. Some embodiments involve a plasmagenerator for carrying out a plasma treatment of an object. Plasmatreatment applied to a surface of an object may increase hydrophilicityof the surface, thereby preventing a condensation of fluid droplets(e.g., fog) thereon. The presence of droplets may be particularlyrelevant when the object includes one or more optical elements sincedroplets may affect the interaction of the object with light, and causedistortions that hamper optical performance. Each fluid droplet mayfunction as an individual lens that separately distorts light raystransmitted through or reflected off the surface. The collective effectof many individual droplets, each having different opticalcharacteristics, may result in a rough optical surface, which mayprevent obtaining a sharp image from light passing through or reflectedoff the surface, and consequently impair optical quality. However, byincreasing hydrophilicity of the object surface to change the surfacetension thereon, plasma treatment may be applied to the object surface,preventing fluid from accumulating as droplets. Increased hydrophilicitymay cause fluid to coat the object as a thin, even layer of fluid,instead of accumulating as individual droplets. Distributing the fluidas a thin, even coating on the object may reduce the distortion of lightwaves interacting with the object surface, by maintaining a uniformindex of refraction and maintain the optical quality, and/or limitdegradation. The plasma treatment may thus reduce variations in thethickness of the fluid coating the object surface and may reduce thevariability of the optical path length of light passing through thefluid coating, accordingly.

In some embodiments, the object may be a medical instrument having anoptical element, such as a viewport of a laparoscope or endoscope, alens, a mirror, or any other medical instrument having opticalcapabilities. Inserting an untreated optical element into a moist bodycavity may cause fog to accumulate thereon due to water and/orwater-based fluids (e.g., bodily fluids) condensing on the surface ofthe optical element as droplets. The condensation may distort theinteraction of light waves with the optical element and adversely affectvisibility via the optical element. Increasing hydrophilicity of theoptical element may reduce such distortion by preventing theaccumulation of fluid on the optical element as individual droplets.

For ease of discussion herein, references to an endoscope or alaparoscope are intended to broadly refer to both, and disclosuresrelated to one are intended to equally apply to the other unlessotherwise stated.

Treating the viewport (e.g., optical element) of the endoscope withplasma may increase hydrophilicity of the viewport to achieve completewetting of the viewport by water and/or water-based fluid. Completewetting may be achieved by increasing the surface tension of the treatedsurface of the viewport to above the surface tension of water, namelyabove 0.072 N/m. In some embodiments, the plasma treatment may increasethe surface tension of the viewport surface to above 0.08 N/m, or above0.1 N/m, e.g., for a limited time period following the plasma treatment.When the surface tension of the treated surface of the viewport isgreater than the surface tension of water, water-based fluid may beprevented from accumulating as droplets on the surface, but rather wetthe viewport surface, e.g., such that a contact angle formed between thewater-based fluid molecules and the viewport is less than 10 degrees(e.g., less than 5 degrees or substantially 0 degrees). Increasing thehydrophilicity thus may eliminate or significantly reduce blur caused bycondensation of moisture on the surface of the viewport as droplets(e.g., fog). Instead, the fluid may form a thin and even layer on thesurface of the viewport due to the increased hydrophilicity. This maymaintain the optical quality of the viewport in its original (e.g., dry)state, or at least limit degradation of the optical quality whenwater-based fluid is introduced to the viewport. Similarly, increasingthe hydrophilicity of the viewport via the plasma treatment may reducevariations of fluid thickness on the surface of the treated viewport,consequently reducing optical length variability of light waves passingthrough fluid condensed on the treated viewport. The reduction ofoptical length variability may improve the optical quality of thetreated viewport when coming into contact with a fluid, as compared thediminished optical quality typically associated with an untreatedviewport after coming into contact with the fluid.

In some embodiments, the viewport at the distal end of the endoscope maybe configured for collecting an image, e.g., when the distal end of theendoscope is inserted into a body. In some embodiments, the viewport maybe transparent, e.g., as a viewport of a laparoscope. In someembodiments, the viewport may be reflective, such as a mirror for adental instrument. In some embodiments, the viewport may be bothtransparent and reflective (e.g., via a two-way mirror). The viewportmay be made of glass, quartz, plastic, semiconductor, metal or any othermaterial suitable for optical applications.

According to some embodiments, to treat an object with plasma, a plasmageneration device may be provided. The plasma generation device may belocated in a housing having a bore, slot or other opening. Such anopening in the housing may be configured to receive an object, e.g.,while shrouded within a sheath for convenience and sterility.Alternatively, the opening in the housing may be configured to receive ashroud or sheath which is configured to subsequently receive an objectfor treatment. The plasma generation device may apply an electric and/orelectromagnetic field suitable for generating plasma inside the bore,thereby permitting treatment of the object, such as the viewport locatedat the distal end of the object positioned therein, e.g., inside thesheath. According to some embodiments the sheath may be provided with atleast one electrode and at least one sheath electric contact configuredto electrically contact a corresponding electric contact in the plasmageneration device when the sheath is inserted into the bore. The atleast one electrode may thus apply an electric and/or electromagneticfield for generating plasma within the sheath. Treating the object withthe generated plasma while encased within the sheath may cause thesurface tension of the external surface of the object to be higher thanthe surface tension of water. Consequently, the object may be highlyhydrophilic (e.g., super hydrophilic to prevent blurring caused by anaccumulation of condensation when in contact with a fluid.

FIG. 1A schematically depicts a plasma generating system 100, accordingto aspects of some embodiments. Plasma generating system 100 may includean operating unit 120 and a plasma applicator 130 (also referred toherein as a plasma generating field applicator) electrically associatedwith operating unit 120, e.g., via a cable 112. The term “plasmagenerator” may refer to any device or system capable of forming plasma.Such a device or system may be configured to treat objects via a plasmacloud by executing one or more actions and/or functions based oncomputer program instructions that may be generated and/or received fromat least one processor. The formation of a plasma cloud may be achievedby subjecting gas to a strong electromagnetic field to the point wherean ionized gaseous substance becomes increasingly electricallyconductive. Operating unit 120 may be associated with at least oneprocessor 102 (e.g., a controller), a power supply 104, such as abattery, circuitry 106, and at least one memory 108. At least oneprocessor 102 may be commutatively coupled to at least one memory 108using wired and/or wireless means, e.g., via bus system 110. At leastone processor 102 may be further electrically coupled to power supply104 and circuity 106, e.g., via a bus system 110. At least one processor102 may be configured to execute one or more program code instructionswith respect to one or more data items stored in at least one memory106. The at least one program code instruction may facilitate control ofone or operational aspects of plasma generation system 100, e.g., tocontrol the generation of plasma via plasma applicator 130. For example,at least one processor 102 may control and moderate one or moreattributes of energy supplied by power supply 104 (e.g., as electricpower) to plasma applicator 130 for the purpose of generating plasma totreat an object, for example by controlling one or more components(e.g., switches, diodes, and other logical componentry) of circuity 106.While at least one processor 102, power supply 104, circuity 106, and atleast one memory 108 are shown inside operating unit 120, this isintended for illustrative purposes only and does not limit the inventionto the configuration illustrated. For example, at least one processor102 and at least one memory 108 may include multiple local and/or remoteprocessors and memory units, as known in the art of distributedcomputing. Similarly, while FIG. 1A shows power supply 104 and circuitry106 positioned within operating unit 120, this is not required, andpower supply 104 and/or circuitry 106 may be external to operating unit120, e.g., power supply 104 may be within a wall unit that is coupled tooperating unit 120 via cable.

FIG. 1B schematically depicts an object 200 (e.g., a medical instrumentsuch as an endoscope), according to aspects of some embodiments. Object200 may have a surface that may be susceptible to an accumulation offluid as droplets. Plasma generation system 100 may be used to prepareobject 200, e.g., for a medical procedure. Object 200 may include adistal end 210. Distal end 210 may include an optical element (e.g., aviewport) 220 configured to enable collecting light from thesurroundings of optical element 220. In some embodiments, opticalelement 220 may include one or more substantially transparent elements,such as a window or a lens and may be made of material such as glass orquartz, semiconductor, or plastic such as Perspex, allowing light fromthe outside of object 200 to be collected inside of object 200, e.g. bya light sensitive device (not shown here) such as a camera.Additionally, or alternatively, according to some embodiments opticalelement 220 may include one or more substantially reflective elements,such as a mirror, that reflects light (e.g., rather than transfers lighttherethrough) for example towards a light collecting and/or reflectingapparatus (not shown here) or a light sensitive device. Optical element220 may include a surface 222 which may be exposed to moisture, e.g.,during a medical procedure. Consequently, if left untreated, e.g., notimmunized against fogging, surface 222 may become covered with fog dueto an accumulation of droplets on surface 222, e.g., due to, but notlimited to, condensation of vapor.

In some embodiments, plasma generating system 100 may further include aprotecting shroud 110 dimensioned to receive therein distal end 210 ofobject 200. Protecting shroud 110 may be alternatively referred to as asheath. Plasma applicator 130 may include a slot 132 (e.g., a bore,cavity or other opening) configured to receive therein distal end 210 ofobject 200, while distal end 210 is shrouded within protecting shroud110. In some embodiments, for use, distal end 210 of object 200 may beinserted into protecting shroud 110, following which protecting shroud110, with distal end 210 being shrouded therein, may be inserted intoslot 132. According to some embodiments, protecting shroud 110 may beinserted into slot 132, following which distal end 210 may be insertedand advanced into protecting shroud 110.

Reference is now made to FIGS. 1C-1E, which taken together illustrate aschematic depiction of a sterility screen 140, according to somedisclosed embodiments. According to some embodiments plasma generatingsystem 100 (FIG. 1A) may further include sterility screen 140 having anopening 142. When using sterility screen 140 with plasma generatingsystem 100, protecting shroud 110 may be inserted into slot 132 throughopening 142 of sterility screen 140, as is further detailed andexplained herein below. According to some embodiments protecting shroud110 may be a dispensable, disposable, or replaceable part, beingconfigured to be used during a single e.g., partial medical procedurecarried out on a single patient. According to some embodiments,protecting shroud 110 may function as a sterility barrier for object 200(FIG. 1B), preventing exposure of object 200, e.g., to body fluids of apatient during a medical procedure. Protecting shroud 110 mayadditionally prevent exposure of object 200 to contaminants presentwithin plasma applicator 130, which may or may not be maintained sterileduring use and after use. According to some embodiments, sterilityscreen 140 may facilitate in maintaining plasma applicator 130 clear offluids (e.g., bodily fluids) that may be transferred via object 200during use and after use.

According to some embodiments sterility screen 140 may be attached to asterility sleeve 144, as depicted schematically in FIGS. 10, 1D, and 1E.Sterility sleeve 144 may extend between sterility screen 140 and asleeve distal end 146. According to some embodiments sterility sleeve144 may be soft or flexible, e.g., like a sock. Prior to use, sterilitysleeve 144 may be folded or rolled, as schematically depicted in FIG.10. For use, sterility sleeve 144 may be unfolded, or unrolled toencompass, envelop, and cover plasma applicator 130 or a portionthereof, e.g., by inserting plasma applicator 130 into sterility sleeve144 through sleeve distal end 146. During use, sterility sleeve 144 maybe disposed around plasma applicator 130 so as to envelop and coverplasma applicator 130. Enveloping plasma applicator 130 thus may ensurethat inserting protecting shroud 110 through opening 142 and into slot132, and/or object 200 into protecting shroud 110, may substantiallyreduce contamination of plasma applicator 130. According to someembodiments, sterility sleeve 144 may be substantially rigid, having ashape of e.g., a tube, being configured to house protecting shroud 110therein. According to some embodiments sterility sleeve 144 may includea double-sided sticky pad (not shown here) in a bottom portion thereof,where one side of the double-sided sticky pad may be configured toadhere to plasma applicator 130, and the opposite side of thedouble-sided sticky pad may be configured to adhere to a flat surface,such as a desk, or a table or another working platform. Attaching plasmaapplicator 130 thus to the working platform may stabilize plasmaapplicator 130 and facilitate inserting and extracting protecting shroud110 (or object 200) from plasma applicator 130. According to someembodiments, sterility screen 140 together with sterility sleeve 144,may be attached to protecting shroud 110, so that insertion ofprotecting shroud 110 into slot 132 and encapsulating plasma applicator130 with sterility sleeve 144 may be performed substantially together.

Upon activation of power supply 104, plasma applicator 130 may befurther configured to apply an electric and/or electromagnetic fieldsuitable for plasma generation when distal end 210 of object 200 (FIG.1B), shrouded within protecting shroud 110, is positioned inside slot132. The electric and/or electromagnetic field may be applied to theinside of protecting shroud 110 inside slot 132 with distal end 210positioned therein. In some embodiments, distal end 210 includes aviewport 222 (FIG. 1B) including one or more optical elements, e.g.,such as a viewport of an endoscope. Thus, the electric and/orelectromagnetic field suitable for plasma generation may be applied inproximity to viewport 222.

According to some embodiments plasma applicator 130 may be fluidlyassociated with a gas pump and additionally or alternatively with a gasreservoir (neither of which is shown here). The gas pump and the gasreservoir may be used to controllably evacuate, or to controllably flushwith a preferred gas, respectively, a vicinity of the distal end of theendoscope, to facilitate plasma ignition, as is further detailed andexplained below. According to some embodiments, a preferred gas may beargon or nitrogen. According to some embodiments, a gas pressuresuitable for plasma ignition after evacuation may be below 0.1 Atm.According to some embodiments, the vicinity of the distal end of theendoscope may be pumped and evacuated and then flushed with a desiredgas. According to some embodiments, the gas pump and/or the gasreservoir, as the case may be, may be optionally situated in theoperating unit 120 (FIG. 1A).

Operating unit 120 may be configured to enable a user of plasmagenerating system 100 to operate and control the apparatus. Operatingunit 120 may thus include one or more command switches and one or morecontrollers, such as physical or virtual switches, buttons, andcontrollers. The control unit may further include indicators forproviding a user with required data and information for operating theapparatus, such as indication LEDs, displays and possibly an operatingsoftware executable by at least one processor 102 for providing a userwith operating and command screens to allow a user to operate andcommand the apparatus.

Reference is now made to FIG. 2 depicting, in a cross-sectional view, anembodiment of a protecting shroud 310 according to an aspect of someembodiments. Protecting shroud 310 may be suitable for use with anobject, such as endoscope 380, depicted schematically inside protectingshroud 310 in dashed lines. Endoscope 380 may include a distal end 382and an electrically conducting surface—e.g., a metallic surface 384—atdistal end 382. Distal end 382 of endoscope 380 may be disposed with aviewport 390. Viewport 390 may further include an optical element 392,which may be subject to plasma treatment as described herein.

Protecting shroud 310 may include a hollow cylinder 312 extendingbetween a proximal opening 314 and a cylinder distal end 316. Protectingshroud 310 may further include a vacuum seal 320 having one or more(e.g., three) O-rings, e.g., O-rings 320 a, 320 b and 320 c.

Vacuum seal 320 may be adapted to fit an external dimension (e.g. anexternal diameter) of endoscope 380 so as to allow insertion ofendoscope 380 into protecting shroud 310 using a slight force, e.g. byhand, as is known in the art. Accordingly, vacuum seal 320 may beconfigured to hold a pressure difference (or gas concentrationdifference) between an inside 322 of protecting shroud 310 and anoutside 324 of protecting shroud 310 when endoscope 380 is positionedinside protecting shroud 310. Vacuum seal 320 may also assist inmechanically stabilizing endoscope 380 inside protecting shroud 310,thereby assisting in preventing gas leakage between the inside 322 andthe outside 324 of protecting shroud 310. Vacuum seal 320 may furtherassist in plasma generation in proximity to viewport 390, as is furtherexplained below.

Protecting shroud 310 may further include a cathode 330 arranged onhollow cylinder 312 and configured to establish an electricalfeedthrough between the outside 324 of protecting shroud 310 and theinside 322 thereof. Cathode 330 may be flexible and electrically exposedon the inside 322 of protecting shroud 310 and on the outside thereof,thereby allowing insertion of endoscope 380 into protecting shroud 310while forming an electric contact between cathode 330 and metallicsurface 384. Protecting shroud 310 may further include an anode 340arranged in proximity to cylinder distal end 316. Anode 340 may beshaped as a metallic block having, for example, a circular smoothsurface 342 facing the inside 322. According to some embodiments,surface 342 may be curved. According to some embodiments (not shownhere), anode 340 may be shaped as a pointed tip pointing towards theinside 322. According to some embodiments, anode 340 may be shaped as aring. Anode 340 may be mounted on a disk 344 made of a dielectricmaterial, so that disk 344 forms a dielectric barrier between anode 340,positioned on one side of the dielectric barrier, and cathode 330 withmetallic surface 384 of endoscope 380, positioned on the other side ofthe dielectric barrier, where metallic surface 384 is at a samepotential as cathode 380. In other words, disk 344 may be configured toensure plasma generation in a Dielectric Barrier Discharge (DBD) mode ofoperation, e.g., by interrupting a line-of-sight between anode 340, onone side of the dielectric barrier, and cathode 330 and metallic surface384 of endoscope 380 on the other side of the dielectric barrier,thereby forming the dielectric barrier. In a DBD mode, plasma may begenerated more uniformly over the available space in the vicinity of theview port, whereas arcing or other types of specific and narrow electrictransportation trajectories between the anode and the cathode may beprevented. Cathode 330 and/or anode 340 may receive electrical energyfor generating an electric and/or electromagnetic field suitable forcarrying out a plasma treatment via circuity 106, power supply 104and/or 530, at least one processor 102 and cable 112 (FIG. 1A).

It is noted that the thickness of the dielectric barrier may have asubstantially strong effect on the uniformity of the plasma generatingelectric and/or electromagnetic field in the vicinity of viewport 390,and hence on the quality of the plasma treatment. The “quality” of theplasma treatment herein may refer to a level of hydrophilicity attained,and the duration of time during which the electric and/orelectromagnetic filed is activated to obtain that hydrophilicity. Inother words, a high-quality plasma treatment may achieve a relativelyhigh level of hydrophilicity (e.g., obtaining a surface tension abovethat of water namely above 0.072 N/M on the treated surface) within arelatively short duration (e.g., of 5 minutes, or 1 minute or as shortas 10 second or even as short as 5 second of activated electric and/orelectromagnetic field). The thickness of the dielectric barrier maygenerally be as low as possible to facilitate plasma ignition, yet largeenough to prevent breakdown and arcing. Exemplary thickness of adielectric material such as PET or polycarbonate in embodimentsdescribed herein may be in the range of about 0.3 mm to about 3 mm forRF electric and/or electromagnetic field at frequencies in the MHz range(e.g., about 2 MHz).

According to some embodiments anode 340 may be configured to displaceflexibly relative to hollow cylinder 312, to facilitate a reliableelectrical contact between anode 340 and a feeding contactor as isexplained further below. According to some embodiments disc 344 may besupported by springs 346 relative to the cylinder 312.

In operation, a plasma generating electric power (e.g., provided bypower supply 530) may be supplied between anode 340 and cathode 330.Consequently, a plasma generating electric and/or electromagnetic fieldin a DBD mode may be generated between anode 340 and metallic surface384 being in electrical contact with cathode 330. The plasma generatingelectric and/or electromagnetic field may generate plasma in the spacebetween anode 340 and cathode 330, and particularly in the vicinity ofviewport 390 and adjacent optical element 392.

Reference is now made to FIG. 3A, depicting a portion of an embodimentof a plasma applicator 348 suitable for use with a protecting shroud 310a, where protecting shroud 310 a is slightly different from protectingshroud 310 of FIG. 2, as is detailed below. Plasma applicator 348 may beconfigured to receive energy for carrying out a plasma treatment, e.g.,via circuity 106, power supply 104, at least one processor 102, andcable 112 (FIG. 1A). Plasma applicator 348 may include a bore 350configured for receiving therein protecting shroud 310 a. In someembodiments, endoscope 380 may be shrouded within protecting shroud 310a. Plasma applicator 348 may further include a cathode contactor 352configured to contact a cathode 330 when protecting shroud 310 a isinside bore 350. An electric conductor 354, such as an electric wire,electrically associated with cathode contactor 352, may be used tosupply electric power generated by a power source (e.g., power supply104) to cathode contactor 352 and to cathode 330. Plasma applicator 348may further include an anode contactor 356 configured to contact anode340 when protecting shroud 310 a is inside bore 350. An electricconductor 358, such as an electric wire, electrically associated withanode contactor 356, may be used to supply electric power generated bythe power source to anode 340. Anode contactor 356 may be supportedflexibly, e.g., by a spring 360, to facilitate a reliable electriccontact between anode contactor 356 and anode 340 when protecting shroud310 a is inserted to bore 350.

It is noted that characteristics of an electric and/or electromagneticfield capable of generating plasma from a gas may depend strongly oncharacteristics of the gas itself, in addition to the geometry of theelectrodes involved (such as the shape and configuration of electrodesused to apply the electric and /or electromagnetic field, the distancebetween the electrodes, and any other physical aspect of the electrodeaffecting the electric field). Generally, the higher the pressure of thegas, the higher the electric and/or electromagnetic field should be toignite plasma from the gas. Also, some gases ignite at lower fields thanothers. For example, plasma may be ignited in helium gas at atmosphericpressure and using an RF field (in a frequency between 1 MHz and 15 MHz)of about 7 KV over a distance of 1 cm between electrodes, and at avoltage of about 200V if the gas is at a pressure of 0.8 KPa. With asimilar configuration of electrodes and at similar field frequencies,plasma may be ignited in air at a voltage of about 20 KV in atmosphericpressure and at a voltage of about 800V in 0.8 KPa.

Thus, according to some embodiments, plasma applicator 348 may beconfigured to stream gas from a gas reservoir (not shown here) to bore350, or to pump air from bore 350, to generate a low-pressure zone inthe space between the electrodes 330 and 340, to facilitate plasmaignition. Thus, according to some embodiments, plasma applicator 348 maybe connected to a hose 364 fluidly associating a gas reservoir (notshown here) containing a gas suitable for plasma generation therein suchas helium or argon or nitrogen, with bore 350. A valve 366 controlled bya control unit (not shown here) operable by a user, may be used toschedule and regulate the flow of gas into bore 350. During operation,according to some embodiments, after introducing protecting shroud 310a, with endoscope 380 positioned therein, into bore 350, valve 366 maybe opened to allow gas flow into bore 350. Protecting shroud 310 a maybe penetrable to gas flow through openings 368 between hollow cylinder312 and disc 344, enabling the gas to flow into protecting shroud 310 a,and towards viewport 390. Excess of gas flowing into bore 350 may freelyescape through the gap in bore 350 between protecting shroud 310 a andplasma applicator 348 (e.g., the gap being not sealed). Following asuitable time period of gas flow (e.g., 5 seconds or 10 second or 30second or even 1 minute) the electric power source may be activated tosupply power to anode 340 and cathode 330 to generate a plasmagenerating electric field near viewport 390. According to someembodiments the gas reservoir may be portable and suitable for a singletime use.

According to some embodiments, hose 364 may be used to pump gas (e.g.,air) from protecting shroud 310 a and particularly from the space nearviewport 390, to facilitate plasma ignition. Air may be sucked from thevicinity of viewport 390 through openings 368 towards bore 350 and intohose 364. A vacuum seal 370 may enable generating vacuum near viewport390 by withholding a pressure difference between a region near cylinderend 316 and a region near opening 314 of protecting shroud 310 a.According to some embodiments air may be pumped through hose 364 by avacuum pump (not shown here), fluidly associated with hose 364.According to some embodiments hose 364 may be fluidly associated to apumped container (not shown) which may be continuously pumped, e.g., bya small vacuum pump. Fluid association may be provided through hose 364,the hose being in constant fluid communication with the container,thereby being also continuously pumped. Opening valve 366 may result inpumping bore 350 and particularly the space near viewport 390 by thevacuum pump or by the pumped container, depending on the particularitiesof the embodiment. The volume of the pumped region in fluidly connectedparts of bore 350 and of protecting shroud 310 a may be, according tosome embodiments, smaller than 10 cc, and a pumped container and hose ofe.g. about 1000 cc (1 liter) may suffice to establish a suitable vacuumlevel between e.g. about 0.1 atm and about 0.01 atm within less thanabout 5 or less than about 10 seconds, which may be sufficient forplasma excitation for about 30 seconds or even about 1 minute tosatisfactorily plasma-treat optical element 392.

Reference is now made to FIG. 3B which illustrates a close-up depictionof anode 340 interfacing with disc 344, according to some embodiments.Protecting shroud 310 a may further include a sterility filter 372positioned in openings 368 for maintaining a sterility barrier betweenprotecting shroud 310 a and plasma applicator 348. Maintaining asterility barrier may be understood as meaning that microbial organismsmay not penetrate sterility filter 372. For example, microbial organismsmay include any form of prokaryotic cells or eukaryotic cells, includingfungi and bacteria. Sterility filter 372 may be disposed, according tosome embodiments, across cylinder end 316 in openings 368, so that gasflowing from plasma applicator 348 into protecting shroud 310 a mayenter protecting shroud 310 a without introducing contaminants, e.g.,sterile, and/or gas flowing from the inside 322 of protecting shroud 310a into plasma applicator 348 enters plasma applicator 348 withoutintroducing contaminants, e.g., sterile. Thus, sterility filter 372 mayprevent a transfer of contamination from plasma applicator 348 (e.g.,from surroundings of bore 350) onto endoscope 380, and/or may prevent atransfer of contamination from endoscope 380 onto plasma applicator 348.Additionally, or alternatively, a sterility filter may be positioned inplasma applicator 348, or for example in hose 364.

FIG. 3C schematically depicts a plasma applicator 448 and acorresponding sheath 410 (e.g., protecting shroud) according to someexemplary embodiments. Plasma applicator 448 differs from plasmaapplicator 348 by the inclusion of an applicator gas port 402 fluidlyassociated with hose 364, and by sheath 410 including a sheath gas port404 configured to fluidly connect to applicator gas port 402. Fluidconnectivity between the inside 322 of sheath 410 and the outside 324 ofsheath 410—e.g. within the space of bore 450 of plasma applicator 448,may be prevented by a vacuum seal 408, e.g. an O-ring. Thus, when sheath410 is inserted into plasma applicator 448, sheath gas port 404 mayfluidly connect to applicator gas port 402, thereby establishing fluidconnectivity of hose 364 to the inside 322 of sheath 410. Consequently,a plasma-ignition facilitating gas (such as helium or argon) may bedriven directly into sheath 410 through hose 364, and additionally oralternatively, gas (e.g., air), may be pumped from sheath 410 throughhose 364. Fluid connectivity between the bore 450 and the inside 322 ofthe sheath may thus be prevented. A sterility filter 472 may bepositioned inside sheath gas port 404, for maintaining a sterilitybarrier between the inside 322 of sheath 410 and plasma applicator 448.As explained above regarding sterility filter 372 in FIG. 3B, gasflowing from plasma applicator 448 into the inside 322 of sheath 410 mayenter sheath 410 sterile, and/or gas flowing from the inside 322 ofsheath 410 into plasma applicator 448 may enter plasma applicator 448sterile. Thus, sterility filter 472 may prevent contamination fromplasma applicator 448 (e.g., from surroundings of bore 450) ontoendoscope 380, and/or may prevent contamination from endoscope 380 ontothe plasma applicator 448.

Sheath 410 may further differ from protecting shroud 310 in having aring anode 440 shaped as a ring on an external circumference of hollowcylinder 312 near distal cylinder end 316 (instead of anode 340 inprotecting shroud 310). Hence hollow cylinder 312, being made of adielectric material, may function as a dielectric barrier 444 betweenanode 440, on one side of dielectric barrier 444, and cathode 330 andmetallic surface 384 of the endoscope, on the other side of dielectricbarrier 444, so that plasma is generated in sheath 410 in a DBD mode ofoperation as described above regarding protecting shroud 310. Accordingto some embodiments sheath 410 may include a stopper 442 inside hollowcylinder 412. Stopper 442 may be configured to limit advancement ofendoscope 380 into sheath 410, so that a pre-determined, desired gap maybe established between anode 440 and metallic surface 384 of endoscope380, thereby ensuring plasma generation at a known field (the fieldbeing determined by the voltage supplied between cathode 330 and anode440 and the gap there between). Stopper 442 may further be employed as adielectric barrier on the line of sight between anode 440 and cathode330, thereby assisting in focusing plasma towards view port 390.

When sheath 410 is inserted into bore 450 of plasma applicator 448, ananode contactor 456 of plasma applicator 448 may contact ring anode 440.Anode contactor 456 may be electrically associated with an electricconductor 458 which is configured to connect to a power supply (e.g.,power supply 530) to enable providing energy (e.g., as electric power)to ring anode 440 for generating a plasma generating electric and/orelectromagnetic field, as described above. It is noted that cathode 330of sheath 410 may be electrically associated with cathode contactor 352when sheath 410 is inserted into bore 450 as described above. Thus, uponactivation, a suitably connected power supply may provide a plasmagenerating electric and/or electromagnetic field (in a DBD mode) betweenring anode 440 and metallic surface 384 of endoscope 380 to generatedplasma in the vicinity of view port 390.

FIG. 4 schematically depicts a sheath 510 according to an aspect of someembodiments. Sheath 510 may be configured to facilitate plasma ignition,without pumping the space around the endoscope as described in theembodiments above nor without streaming gas into that space. In otherwords, sheath 510 may enable providing plasma treatment to a view portof an endoscope according to the teachings herein, using a plasmaapplicator that is not connected neither to a gas reservoir nor to a gaspump. Accordingly, sheath 510 may not have a gas port, such as gas port402, and may not be connected to a hose, such as hose 364.

Sheath 510 may include a hollow cylinder 312 extending between anopening 314 and cylinder end 316. Sheath 510 may differ from protectingshroud 310 in that hollow cylinder 312 may be bound and sealed nearcylinder end 316, thereby substantially preventing permeation orpenetration of gas molecules through cylinder end 316. Sheath 510 mayfurther differ from protecting shroud 310 in having a leakage seal 530inside hollow cylinder 312, and a hermetic screen 518 in hollow cylinder312 situated between leakage seal 530 and cylinder end 316. Hermeticscreen 518 may be configured to be impermeable to gas molecules, therebydefining a closed space 520, closed between hermetic screen 518 andcylinder end 316. Closed space 520 inside sheath 510 may thus beairtight, namely maintained to remain sealed from the outside 324 ofsheath 510. Closed space 520 may contain a gas suitable for plasmaignition, e.g. Argon, at a gas pressure of about 1 atmosphere, so thatthere is, at most, only minor pressure gradients over the hermeticscreen.

Hermetic screen 518 may be breakable, being thereby configured to break(tear down) upon insertion of an endoscope such as endoscope 380 intosheath 510. According to some embodiments, sheath 510 may furtherinclude one or more tearing needles 522 attached flexibly to hollowcylinder 312 near hermetic screen 518 outside of closed space 520.Tearing needles 522 may be configured to lean flexibly towards hermeticscreen 518 and to tear the hermetic screen when pushed by an objectinserted into the sheath. Thus, for use, the endoscope may be insertedinto sheath 510 and affecting tearing down of hermetic screen 518 bypushing tearing needles 522 towards hermetic screen 518. The endoscopemay be further advanced until the viewport of the endoscope is betweencathode 330 and anode 340. It is noted that during insertion, theendoscope may first be advanced through leakage seal 530, and thenthrough hermetic screen 518, which may break. The endoscope may then befurther advanced to be positioned in place within sheath 510. Oncehermetic screen 518 is broken, the gas inside space 520 may be preventedfrom freely flowing towards opening 324 by a sealing formed betweenleakage seal 530 and the endoscope. During further advancement of theendoscope into sheath 510, the free volume of space 520 for the gas mayreduce, yet pressure build up in the region of closed space 520 may beprevented, due to gas escaping under a pressure difference acrossleakage seal 530. As a result, when endoscope 380 is fully inserted intosheath 510, closed space 520 and particularly the space proximal theviewport of the endoscope, between anode 340 and cathode 330, mayinclude substantially the gas that was contained in the space 520 beforethe tear-up of hermetic screen 518, at approximately atmosphericpressure, thereby facilitating plasma ignition therein. According tosome embodiments hermetic screen 518 may be made of Mylar or metalizedMylar or Kapton or metalized Kapton and the like.

There is thus provided according to an aspect of the disclosure anapparatus (e.g., plasma generating system 100 in FIG. 1A) for preparingan endoscope ((200 in FIG. 1, 380 in FIGS. 2, 3A and 3C) for anendoscopy procedure. The apparatus may include a sheath (110 in FIG. 1A,310, 310 a in FIGS. 2 and 3A, 410 in FIG. 3C, 510 in FIG. 4) dimensionedto receive therein a distal end (210, 382) of the endoscope. The distalend may include a view port (220, 390) configured to enable collectingan image of the surrounding of the view port there through.

The apparatus may further include a plasma generating field applicator(130, 348, 448), electrically associated with an electric power source.The plasma generating field applicator may have a bore (132, 350, 450)configured to receive therein the distal end of the endoscope shroudedwithin the sheath. The plasma generating field applicator may beconfigured to apply electric power suitable for plasma generation withinthe sheath. The sheath may be detachable from the distal end of theendoscope and from the plasma generating field applicator. According tosome embodiments the view port of the endoscope may be transparent ormay be a mirror.

According to some embodiments the apparatus may further include asterility sleeve (144) extending between a first end (146) and a secondend (140), configured to encapsulate the plasma generating fieldapplicator, having on the first end a first opening configured to enableinserting the plasma generating field applicator into the sterilitysleeve, and on second end a second opening (142) configured to enableinserting the endoscope into the plasma generating field applicator.According to some embodiments the sterility sleeve may be soft andaccording to some embodiments the sterility sleeve may be rigid. Thesterility sleeve may be detached from the plasma generating fieldapplicator. According to some embodiments the sterility sleeve may beattached to the sheath, and according to some embodiments the sterilitysleeve may be detached from the sheath.

According to some embodiments the sheath may include at least oneelectrode (340, 440) and a first sheath electric contact (340, 440)electrically connected to the electrode. The first sheath electriccontact may be configured to electrically contact a corresponding firstapplicator electric contact (356, 456) in the plasma generating fieldapplicator when the sheath is inserted into the bore (350, 450). The atleast one electrode may thereby be configured to apply a plasmagenerating field inside (322) the sheath upon receiving the electricpower from the plasma generating field applicator.

According to some embodiments the sheath may further include a secondsheath electric contact (330), configured to contact the endoscope whenthe distal end of the endoscope is received within the sheath. Thesecond sheath electric contact may be configured to electrically contacta second applicator electric contact (352) when the sheath is insertedinto the bore (350, 450).

According to some embodiments the sheath may include a hollow,substantially rigid tube (312, 412) extending between an opening (314)configured to receive the distal end of the endoscope, and a distal end(316) of the sheath. According to some embodiments the hollow tube maybe a hollow cylinder (312, 412).

According to some embodiments the sheath further may include a seal(320, 530) positioned between the opening and the distal end along aninner circumference of the hollow tube, being dimensioned to encirclethe endoscope (380), being thereby configured to sealingly contact theendoscope when the endoscope is received inside the hollow tube.According to some embodiments the seal may include an O-ring.

According to some embodiments the plasma generating field applicator(348, 448) may be connected to a hose (364). The hose may becontrollably fluidly connected to the bore (350, 450). According to someembodiments the plasma generating field applicator (348, 448) mayinclude a controlled valve (366), controllably fluidly connecting thehose (364) with the bore (350, 450). According to some embodiments theplasma generating field applicator (348) may include an applicator gasport (402) fluidly connected with the hose, and the sheath (410)comprises a sheath gas port (404). The sheath gas port may be configuredto sealingly connect with the applicator gas port for fluidly connectingthe hose with an inside (322) of the sheath. The sealed connectionbetween the sheath gas port and the applicator gas port may prevent,e.g. by seal 408, flow communication between the inside (322) of thesheath (fluidly associated with hose 364) and the bore (450), when thesheath is inserted into the bore.

According to some embodiments the sheath (510) may include a seal (530)inside the hollow tube (312) configured to sealingly contact theendoscope when the distal end of the endoscope is inserted into thehollow tube. The sheath (510) may further include a hermetic screen(518) spanning across the hollow tube and configured to thereby define aclosed and sealed space (520) between the hermetic screen and the distalend (316) of the hollow tube. According to some embodiments the sheathmay further include one or more tearing needles (522) positioned insidethe hollow tube between the seal (530) and the hermetic screen (518)being configured to tear down the hermetic seal upon insertion of theendoscope into the hollow tube.

According to an aspect of some embodiments there is provided a method ofpreparing an endoscope for an endoscopy procedure. The method mayinclude providing a sheath (110, 310, 310 a, 410, 510) dimensioned toreceive therein a distal end (210, 382) of the endoscope, the distal endcomprising a view port (220, 390) configured to allow collecting animage of the surrounding of the view port there through. The method mayfurther include providing a plasma generating field applicator (130,348, 448) electrically associated with an electric power source. Theplasma generating field applicator may have a bore (132, 350, 450)configured to receive therein the distal end of the endoscope shroudedwithin the sheath. The plasma generating field applicator may beconfigured to apply electric power suitable for plasma generation withinthe sheath (e.g., by the electrodes 330, 340 and 440). The sheath may bedetachable from the plasma generating field applicator and from thedistal end of the endoscope. The method may further include positioningthe distal end of the endoscope shrouded within the sheath in the boreof the plasma generating field applicator and activating the powersource to generate plasma within the sheath, thereby plasma-treating theview port at the distal end of the endoscope.

According to some embodiments, the method may further includepreventing, by the sheath, contamination of the plasma generating fieldapplicator with fluids dispersed on the distal end. According to someembodiments, the plasma generation field applicator may include a hose(364) and the method may further include controllably (by closing andopening valve 366) flowing a gas into an inside (322) of the sheath orpumping the inside of the sheath via the hose.

According to an aspect of some embodiments there is further provided amethod of preparing an endoscope (380) for an endoscopy procedure, theendoscope comprising a distal end (382) comprising a view port (390).The view port may be made of a dielectric material and is proximal to ametallic segment (384) at the distal end of the endoscope. The methodmay include placing the distal end of the endoscope in a closed plasmachamber (e.g., sheaths 310, 310 a, 410 or 510, wherein the insertion ofthe endoscope seals the inside 322 of the sheaths, thereby defining aclosed plasma chamber therein). The closed plasma chamber may have atleast an anode (340, 440) and a cathode (330) wherein the cathodeelectrically contacts the metallic segment. A line-of-sight between theanode and the cathode is interrupted by a dielectric barrier (344, 444),and the method may further include applying a plasma-generatingelectromagnetic field between the anode and the cathode, therebygenerating plasma in a DBD mode in a vicinity (322) of the view port.According to some embodiments, the electric barrier (444) electricallymay isolate the anode (440) from gas in the vicinity (322) of the viewport. According to some embodiments of the method, the view port may betransparent or alternatively reflective (e.g., a mirror), orsemi-transparent (e.g., a two-way mirror both reflecting andtransmitting light). According to some embodiments of the method theview port may be made of glass or quartz or plastic.

FIGS. 5A, 5B, and 5C illustrate three views of a plasma generatingsystem 500, in accordance with some embodiments of the presentdisclosure. Plasma generating system 500 may include a housing 510having a cavity 502 and accommodating a plasma generation zone 504(e.g., a plasma activation zone) and a plasma generator including atleast a first electrical contact 522, a second electrical contact 524,an energy source 530 (e.g., a battery), and a transformer 526. Housing510 may also accommodate a filter 506 and a controller 508. Transformer526 may be a ring-shaped solenoid, illustrated in cross section assections 526a and 526b. Transformer 526 may be electrically coupled onone side (e.g., an input) to a power source 530 and electrically coupledon the other side (e.g., an output) to first electrical contact 522, forexample via one or more conducting wires and screws 528. Transformer 526may convert an incoming voltage (e.g., 24V) to a substantially highervoltage (e.g., 10kV to 20kV). First electrical contact 522 may beelectrically coupled to the higher voltage level produced by transformer526, and second electrical contact 524 may be connected to a lowervoltage potential, such as a ground, to generate a substantially highvoltage potential between first electrical contact 522 and secondelectrical contact 524, First electrical contact 522 may be electricallycoupled to the external insulating surface of a protecting shroud, suchas protecting shroud 310 a of FIG. 3A encasing viewport 390 andconfigured for insertion into cavity 502. Second electrical contact 524may be electrically coupled to an optical element (e.g., viewport 390 ofFIG. 3A), internal to insulating protecting shroud, thereby creating asubstantial voltage potential between the optical element positionedinternal to the insulating protecting shroud and first electricalcontact 522.

Plasma generating system 500 may include plasma-generation zone 504within cavity 502, which may be arranged such that when the at least aportion of an object having an optical element (e.g., endoscope 308having viewport 392 of FIG. 2) is retained within cavity 502, theoptical element is located within plasma-generation zone 504.Plasma-generation zone 504 may thus be subject to the same voltagepotential between first electrical contact 522 and second electricalcontact 524 thereby facilitating the generation of plasma insideplasma-generation zone 504. The generation of plasma insideplasma-generation zone 504 may be further promoted by creating a lowpressure (e.g., vacuum) inside plasma-generation zone 504. The Plasmagenerator may generate plasma for treating an object (e.g., a medicalinstrument) within plasma generation zone 504 in accordance withembodiments disclosed herein. Cavity 502 of housing 510 may correspondto one or more of slot 132 (FIG. 1A), opening 142 (FIG. 1D), opening 314(FIG. 2), bore 350 (FIG. 3A), and bore 450 (FIG. 3C). Plasma generationzone 504 may correspond to plasma applicator 348 (FIG. 3A). Cavity 502may provide access to plasma generation zone 504, e.g., to enableinserting an object into plasma generation zone 504 for carrying out aplasma treatment to increase the hydrophilicity of the object.Controller 508 may control one or more aspects of the plasma generator,such as the influx and/or outflow of gas into plasma activation zone 504for the purpose of generating plasma, the generation of an electricand/or electromagnetic field for generating plasma, and any otherparameter relevant to the generation of plasma via the plasma generator.Plasma generating system 500 may further include one or more sensors,such as a pressure sensor 1100 (FIG. 11), a voltage sensor 514 and aplasma frequency sensor 512. While voltage sensor 514 and plasmafrequency sensor 512 are illustrated inside plasma-generation zone 504,this is but one exemplary implementation and it may be noted that thevoltage sensor and plasma frequency sensor may be positioned at anylocation that is electrically coupled to the voltage source (e.g.,transformer 526).

FIG. 6 is a flowchart that illustrates an example of a method 600 forinhibiting condensation distortion on an optical element of a medicalinstrument configured for insertion into a body cavity, in accordancewith some embodiments of the present disclosure. Step 602 of method 600may include exposing the optical element of the medical instrument toplasma. Step 604 of method 600 may include maintaining the plasma incontact with the optical element for a period sufficient to cause theoptical element to become hydrophilic. Step 606 of method 600 mayinclude removing the optical element from the plasma. Step 608 of method600 may include inserting the medical instrument, with the hydrophilicoptical element, into the body cavity. Step 610 of method 600 mayinclude exposing the hydrophilic optical element to moisture, such thatthe moisture forms a film barrier on an optical surface of the opticalelement to thereby inhibit condensation distortion.

FIG. 7 illustrates another cross-sectional view of plasma generatingsystem 500 (FIGS. 5A-5C), in accordance with some embodiments of thepresent disclosure. As illustrated in the figure, plasma generatingsystem 500 is configured to treat an optical surface 706 of a medicalinstrument and may include electrical circuitry 700, a first pair ofelectrodes 702A and 702B designed to touch the disposable, and a secondpair of electrodes 704A and 704B designed to touch the medicalinstrument.

FIG. 8A depicts a cross-sectional view of a sheath 800 with an endoscope802, in accordance with some embodiments of the present disclosure. Asillustrated in the figure, sheath 800 may include an annular seal 804,an opening 806 associated with a one-way valve 808, and an electrode810. FIG. 8B depicts another cross-sectional view of sheath 800configured to removably receive an inserted medical instrument therein(e.g., endoscope 802), in accordance with an embodiment of the presentdisclosure. As illustrated in the figure, sheath 800 may include atleast one stopper 812 configured to limit travel of endoscope 802.

FIG. 9 illustrates how sheath 800 may be inserted into plasma generatingsystem 500. As illustrated in the figure, plasma generating system mayinclude a bore 900 sized to retain sheath 800. Other related elementsare illustrated in other figures.

FIG. 10A depicts a plurality of vacuum pumps located within plasmagenerating system 500 in accordance with the following embodiment of thepresent disclosure. As illustrated in the figure, plasma generatingsystem 500 may include a plurality of vacuum pumps (e.g., vacuum pumps1000A, 1000B, 1000C, and 1000D) and conduits connecting them in series(e.g., conduit 1002). Other related elements are illustrated in otherfigures. FIGS. 10B and 100 depict example cross-sectional drawings ofthe pump manifold of the plasma generating system 500, demonstrating howthe plurality of vacuum pumps are connected in series.

FIG. 11 illustrates another cross-sectional view of plasma generatingsystem 500, in accordance the present disclosure. As illustrated in thefigure, plasma generating system 500 may further include one or moresensors, such as a pressure sensor 1100 and other sensors configured tomeasure a plasma-activation parameter) and a display 1102 for displayinga notification.

FIG. 12 depicts another cross-sectional view of sheath 800, inaccordance with some embodiments. As illustrated in the figure, sheath800 may include an annular seal 1200 configured to enable formation of avacuum chamber regardless of the diameter of the scope and an adjustingcap 1202 that may be utilized when using scopes with smaller diameters.

FIG. 13 depicts an integrated sheath and cover, in accordance with someembodiments of the present disclosure. Specifically, FIG. 13 illustratesa receptacle 1300 (e.g., sheath 800) configured for insertion into acavity of plasma generating system 500, a shield 1302 sterilely affixedto the proximal end of receptacle 1300, and an adhesive 1304 forsecuring shield 1302.

FIG. 14 is a flowchart that illustrates a method 1400 for treating anelongated tool with plasma, in accordance with some embodiments of thepresent disclosure. Step 1402 of method 1400 may include receiving aninsertion signal from the detector indicating that the elongated tool iswithin the bore. Step 1404 of method 1400 may include activating, inresponse to the insertion signal, the at least one pump to generate anegative pressure in the at least a portion of the bore. Step 1406 ofmethod 1400 may include receiving a signal from the vacuum sensor anddetermining therefrom that a negative pressure in the at least a portionof the bore is sufficient for plasma generation. Step 1408 of method1400 may include activating the plasma generator after the determinationis made that negative pressure in the at least a portion of the bore issufficient for plasma generation, thereby exposing a distal end regionof the elongated tool to plasma.

FIG. 15 is a flowchart that illustrates an example method of inhibitingcondensation distortion on an optical element of a medical instrumentconfigured for insertion into a body cavity, in accordance with someembodiments of the present disclosure.

To ensure that a plasma treatment sufficiently increases hydrophilicityof an object to a desired level, at least one processor may execute oneor more program code instructions to monitor the plasma treatment. Theat least one processor may determine the effectiveness of the plasmatreatment based on one or more parameters, such as may be measured byone or more sensors. In some embodiments, when a parameter indicatesthat the plasma treatment does not sufficiently increase hydrophilicityof the object, the processor may output a notification. In someembodiments, the notification may trigger an adjustment and/orcalibration for the plasma treatment.

The following detailed description includes references to theaccompanying drawings. Wherever possible, the same reference numbers areused in the drawings and the description to refer to the same or similarparts. While several illustrative embodiments are described herein,modifications, adaptations and other implementations are possible. Forexample, substitutions, additions, or modifications may be made to thecomponents illustrated in the drawings, and the illustrative methodsdescribed herein may be modified by substituting, reordering, removing,or adding steps to the disclosed methods. Accordingly, the followingdetailed description is not limited to the disclosed embodiments andexamples. Instead, the proper scope is defined by the appended claims.

In some embodiments, a plasma generation device for treating objects isprovided. The term “plasma” may refer to a state of matter containing anabundance of charged particles, e.g., electrons and ions. Consequently,plasma may be highly electrically conductive and sensitive to electricand/or electromagnetic fields. The term “plasma generation device” mayinclude any apparatus or combination of components capable of generatingplasma, e.g., by converting (e.g., igniting) a gas to transform the gasto a plasma state or plasma cloud. The term “treating objects” may referto a process, procedure or protocol applied to modify one or moreproperties of a physical object. For example, plasma generating systems100 (FIG. 1A) and 500 (FIGS. 5A-5C) illustrate exemplary implementationsof a plasma generation device in accordance with disclosed embodiments.In some embodiments, the plasma generation device may contain a gas, andtwo electrodes (e.g., an anode and a cathode) for applying an electricor electromagnetic field to the contained gas. The electric orelectromagnetic field may ionize the contained gas to the point that thegas becomes an electrically conductive plasma cloud.

In some embodiments, the object may include an optical element. An“optical element” may include any article of manufacture through whichlight may either pass and/or be reflected. The optical element may be acombination of one or more of a lens, polarizer, diffraction grating,prism, reflector, filter, viewing window, mirror, protective window, orany other component in which light passes or is reflected. The opticalelement may modify one or more properties of a light wave directed to orfrom the optical element, such as the intensity, phase, propagationdirection, frequency, wavelength, or polarization of the light wave. Forexample, the optical element may be formed from metal, glass, plastic,semiconductor, or any other material exhibiting optical properties. Theproperties modified by the treatment may relate to optical, electric,magnetic, or conductive properties of the object. For example, an objectmay be treated by exposing the object to a plasma cloud generated by theplasma generation device. The exposure of the object to plasma maymodify an optical property of the object by affecting the hydrophilicityof the object, e.g., by causing a fluid to coat the object uniformly(e.g., evenly) instead of forming as individual (e.g., separate)droplets. An example of an optical element is optical element 392 (FIG.3C), such as may be provided with viewport 390 (FIGS. 2, 3A, and 3C).

In some embodiments the plasma generation device may have a housing. Theterm “housing” may refer to any supporting structure, frame, cage,enclosure, or encompassment capable of accommodating a plasma generator.The housing may be made of any suitable material, such as plastic,metal, glass, wood, or any other material capable of encasing the plasmageneration device. In some embodiments, the housing may include one ormore insulating materials to insulate the plasma generation deviceencased therein from one or more environmental conditions, such as anelectric and/or electromagnetic field, light, humidity, temperature,impact, mechanical and/or acoustic vibrations, and any otherenvironmental attribute that may affect the generation of plasma by theplasma generating device. An example of a housing for the plasmageneration device is illustrated by housing 510 of FIGS. 5A-5C encasingplasma generation zone 504. Similarly, the exterior of plasma generatingfield applicator 130 (FIG. 1A) may form a housing consistent withdisclosed embodiments.

In some embodiments, the housing may be provided with a bore (e.g.,“cavity” or “slot”). In some embodiments, the bore may be sized toremovably retain at least a portion of the object. For example, thesurface of the housing may expose an entrance into the bore forinserting the object therein. The bore may be any suitable shape or sizefor containing the object. For example, the bore may be tubular toaccommodate a sheath configured to retain an elongated medicalinstrument. The bore may have a cross-section that is round, triangular,square, rectangular, oval, or any other regular or irregular shape. Anexample of a bore disposed within the housing for the plasma generationdevice may be illustrated by slot 132 (FIGS. 1A and 10), opening 142(FIG. 1D), opening 314 (FIG. 2), bore 350 (FIG. 3A), bore 450 (FIG. 3C),and bore 900 (FIG. 9).

Some embodiments may involve the plasma generation device including aplasma-generation zone within the housing. As used herein, the term“plasma generation zone” may refer to a physical volume or space inwhich a plasma cloud may be formed, e.g., by igniting a gas introducedtherein. The plasma generation zone may be of any size. For example, theplasma generation zone may be less than 15 cm³, less than 10 cm³, orless than 5 cm³. Plasma generation zone of 504 of FIG. 5A is anexemplary implementation of plasma generation zone, in accordance withdisclosed embodiments. In some embodiments, the plasma activation zonemay be positioned within a cavity configured to retain at least aportion of the object therein, and thereby expose the at least portionof the object to the plasma treatment. For example, the plasmageneration zone (e.g., plasma generation zone 504) may be positionedwithin bore 350 (FIG. 3A) configured to retain at least a portion ofendoscope 380 therein, thereby exposing the at least portion ofendoscope 380 to plasma.

In some embodiments, the plasma-generation zone may be associated with acavity configured to retain the object in a manner exposing at least aportion of the object to the plasma-generation zone. The term “cavity”may refer to a chamber, crevice, or pit capable of containing an object.The chamber within the plasma-generation zone may accommodate at least aportion of an object inside the plasma-generation zone together with aplasma cloud (e.g., generated by igniting a gas streamed therein),thereby exposing the at least portion of the object to the plasma cloud.For example, the cavity may accommodate a viewport of an endoscopewithin the plasma-generation zone, to expose the viewport to a plasmacloud generated inside the plasma activation zone after a gas has beenignited. Consequently, the hydrophilicity of the viewport may increaseto prevent fog from forming when the viewport is subsequently insertedinto a body. For example, referring to FIG. 5A, a treatment device mayhave a cavity 502 disposed within housing 510. Cavity 502 may beconfigured to retain a medical instrument (e.g., endoscope 380 of FIG.2) in a manner to expose optical element 392 situated at the distal endof endoscope 380 to plasma generation zone 504.

In some embodiments, the plasma generation zone may be configured toenable accommodation of an object; The term “accommodation” may refer toa capability for surrounding, holding, enclosing, supporting orotherwise containing an object, e.g., within the plasma generation zone.For example, the object may be supported within the plasma generationzone to expose the object to a plasma cloud. The term “object” may beany physical component such as may include an optical element. Theoptical element may include one or more of a mirror, lens, viewingwindow or other optical surface. In some embodiments, the term “object”may additionally or alternatively include a medical instrument, such asmay be configured for insertion into a patient's body. For example,endoscope 380 (FIG. 3A) illustrates an exemplary implementation of anobject in accordance with disclosed embodiments.

In some embodiments, the object is at least a portion of a medicalinstrument and at least one processor is configured to output anotification indicating of plasma treatment failure prior to using themedical instrument in a medical procedure. The term “medical instrument”may refer to any device or equipment used to perform a medicalprocedure. For example, the medical instrument may be an endoscope,laparoscope, gastroscope, cystoscope, ureteroscope, arthroscope,colonoscope, mirror (e.g., dental mirror), intraoral scanner, and anyother instrument suitable for insertion into a patient's body. In someembodiments, the medical instrument may have an elongated shape. Thecross section of the medical instrument may be round, square,triangular, rectangular, oval, or any suitable shape for insertion intoa patient's body. The width of the medical instrument may be uniformedor varied, and the edges of the medical instrument may be angular orcurved. The term “notification” may refer to conveyed or transmittedinformation. For example, after determining that the plasma treatmentfor an endoscope has failed, the at least one processor may conveyinformation indication the failure to a medical practitioner, before themedical practitioner uses the endoscope for performing an endoscopy. Thenotification may be in the form of text, sound, vibration, visual alert(e.g., flashing light) or any combination thereof. Turning to FIG. 2,optical element 392 positioned at the distal end of endoscope 380 is anexemplary implementation of an object that is at least a portion of amedical instrument, in accordance with disclosed embodiments. Controller508 (FIG. 5B) may output a notification via display 1102 indicating ofplasma treatment failure prior to using endoscope 380 in a medicalprocedure.

In some embodiments, the plasma generation device may include circuitryfor supplying energy to carry out a plasma treatment. The term“circuitry” may include any combination of electronic componentry (e.g.,memory units, switches, gates, wires, transformers, and other electroniccomponentry) for performing one or more operations (e.g., logicaloperations) in response to receiving an electric signal (e.g., from aprocessor operating as a controller) as an input. The circuity maycouple an energy source, e.g., a power supply, generator, battery, orrechargeable battery, to the plasma generation device to enable theignition of the gas for the purpose of converting the gas to a plasmacloud. The energy source may be external to the plasma generationdevice, e.g., from a wall outlet via a cable. In some embodiments theoperational unit may be energized by an internal energy source such as abattery, e.g., a rechargeable battery. The circuitry may control one ormore aspects of the energy delivered by the energy source, such as themagnitude, intensity, frequency, phase, timing, polarity, as well as avoltage associated with the energy, a current associated with theenergy, and any other attributes characterizing the energy. Thecircuitry may adapt the energy according to the requirements of theplasma generation device, e.g., for igniting a gas to generate a plasmacloud for carrying out the plasma treatment. The circuitry may thusinclude a transformer, connecting wires and contacts, and one or moreintegrated circuits (ICs), including application-specific integratedcircuits (ASICs), microchips, microcontrollers, microprocessors, all orpart of a central processing unit (CPU), graphics processing unit (GPU),accelerated processing unit (APU), digital signal processor (DSP),field-programmable gate array (FPGA), or other circuits suitable forexecuting computing instructions and/or capable of performing logicaloperations, e.g., based on a computing instruction or an input signal.The circuitry may further include one or more memory units, such asRandom-Access Memory (RAM), a cache memory, a Read-Only Memory (ROM), ahard disk, an optical disk, a magnetic medium, a flash memory, otherpermanent, fixed, or volatile memory, or any other mechanism capable ofstoring data and/or computing instructions for performing a logicaloperation. The circuitry may further include one or more communicationchannels coupling the one or more ICs to the memory, thereby enablingthe one or more ICs to receive a computing instruction and/or datastored thereon required to perform a corresponding logical operation forcontrolling energy delivered to the plasma generation device. Thecommunication channels coupling the one or more ICs to the memory mayinclude wired channels, such as one or more cables, fibers, wires,buses, and any other mechanically coupled communication channel. Thecommunication channels may additionally or alternatively includewireless channels such as short, medium, and long-wave radiocommunication channels (e.g., Wi-Fi, Bluetooth, Zigbee, cellular,satellite), optical, and acoustic communication channels.

The term “energy” may refer to an electric and/or magnetic signalcapable of inducing an electric and/or electromagnetic field. Thecircuity may control parameters of the energy such as the timing,frequency, intensity, magnitude, and phase of the electric (e.g.,voltage, current) and/or magnetic signal (e.g., direction, strength,density) to generate an electric and/or electromagnetic field capable ofconverting a gas subjected to the electric and/or electromagnetic fieldto a plasma cloud. For example, a transformer may convert a relativelylow voltage supply (e.g., tens of volts) provided from the power supplyto a high voltage supplied to the plasma generation zone to generate anelectromagnetic field capable of igniting plasma therein. For example,the electric and/or electromagnetic field may ionize the gas until thegas becomes increasingly electrically conductive to the point ofreaching a plasma state. The circuity may thus supply energy in a formthat is suitable for carrying out the plasma treatment, e.g., byadapting the energy from the energy source to a signal capable ofinducing an electric and/or electromagnetic field capable of convertinga gas to a plasma cloud. For example, circuity 106 (FIG. 1A) may supplyenergy to carry out a plasma treatment, in accordance with disclosedembodiments. Circuitry 106 may adapt electrical energy supplied by powersupply 530, (e.g., in response to one or more control operations by atleast one processor 102 or 508) to a form that is suitable forgenerating an electric and/or electromagnetic field capable ofgenerating plasma. The adapted energy may be provided to any of cathode330, anode 340, dielectric barrier 344, via any of cathode contactor352, electric conductor 354, and electric conductor 358 (FIG. 3A). Forexample, on activating power source 530, circuitry 106 may adapt (e.g.,in response to control instructions by at least one processor 102 or508) electrical energy supplied by power source 530 and deliver theadapted electrical energy to cathode 330 and anode 340 via electricconductors 354 and 358 to generate an electric and/or electromagneticfield suitable for generating plasma from a gas present therein. Asanother example, circuity 700 of FIG. 7 may supply energy to carry outthe plasma treatment.

Some embodiments may involve supplying energy to carry out a plasmatreatment for increasing hydrophilicity of the object to a desiredlevel. The term “hydrophilicity” refers to a tendency or favorability ofa molecule to be solvated by water. A hydrophilic compound may havethermodynamic properties that enable the compound to bond with watermolecules more readily than a compound that is not hydrophilic, e.g., ahydrophobic compound that does not readily bond with water (e.g., polar)molecules. An object that is hydrophilic may be wettable, enabling aliquid (e.g., water) to maintain contact with the object due tointermolecular interactions that balance adhesive and cohesive forcesbetween the liquid and the object. The term “desired level” may refer toa level of hydrophilicity that achieves a formation of a substantiallyuniform layer of a fluid on the surface of the object when the fluidcomes in contact with the object, thus deterring, inhibiting or at leastsomewhat preventing the formation of fluid droplets (e.g., fog). Thedesired level may vary depending on the particular object and theparticular intended use. The desired level of hydrophilicity may causethe layer of fluid to be sufficiently uniform to ensure a minimaloptical quality. For example, the desired level of hydrophilicity may beassociated with a minimal variable thickness of a layer of fluidcollecting on the object, or a minimal incident angle between fluidaccumulating on the surface of the object and the surface of the object,e.g., less than 30 degrees, less than 15 degrees, or less than 10degrees. For example, referring to FIG. 3A, circuitry, representedpartially by cathode 330, anode 340, dielectric barrier 344, cathodecontactor 352, electric conductor 354, and electric conductor 358, maysupply energy to carry out a plasma treatment for increasing thehydrophilicity of endoscope 380 to a level whereby visibility viaendoscope 380 is not significantly diminished by an accumulation of fogduring a medical procedure.

Some embodiments may involve the at least one processor maintaining theplasma treatment for a predefined time duration. For example, to reachthe desired level of hydrophilicity, the at least one processor mayactivate the plasma generator for a time period sufficient to cause theoptical element to become hydrophilic prior to insertion into the bodycavity. In some embodiments, the predefined time duration may be basedon a characteristic of the plasma generated for the plasma treatment,e.g., the type of gas used to generate the plasma, and the conditionsunder which the plasma is generated (e.g., pressure, temperature,electric and/or electromagnetic field, voltage, current). In someembodiments, the predefined time duration may be based on a physicalcharacteristic of the object, such as the material that the object ismade of, the shape of the object, the size of the object, the sharpnessor smoothness of the object, the optical characteristics of the object(e.g., transparency, reflectiveness). In some embodiments, thepredefined time duration is based on the desired level of hydrophilicityof the object. For example, a first object intended for a medicalprocedure requiring a high degree of accuracy may demand greaterhydrophilicity than a second object intended for a medical procedurerequiring a lesser degree of accuracy. Additionally, or alternatively,in some embodiments, the predefined time duration may be based on adesired and/or acceptable level of optical quality, the intended use ofthe object, and any other parameter (e.g., performance parameter) thatmay be affected by the hydrophilicity of the object. According to somedisclosed embodiments, the time period sufficient to cause the object tobecome hydrophilic may be less than a minute, less than 45 seconds, lessthan 30 seconds, or less than 15 seconds.

At least one processor 102 in FIG. 1A illustrates an exemplaryimplementation of a controller for maintaining a plasma treatment for apredefined time duration, e.g., via a clock internal to at least oneprocessor 102. At least one processor 102 may adapt one or more aspectsof energy supplied by power supply 104, e.g., via circuitry 106, andprovide the adapted energy to plasma generating field applicator 130 viacable 112. Processor 102 may further base the predefined time durationon a characteristic of plasma generated by plasma generating fieldapplicator 130 for the plasma treatment and/or a physical characteristicof object 200, e.g., such as may be stored in memory 104. In someembodiments, at least one processor may base the predefined timeduration on a desired level of hydrophilicity of object 200, e.g., toprevent fog from condensing on an optical element of object 200 whenobject is inserted into a body during a medical procedure. FIG. 5Badditionally illustrates an exemplary implementation of controller 508(e.g., at least one processor) for maintaining a plasma treatment byplasma generating system 500 for a predefined time duration, dependingon the desired level of hydrophilicity of an object. For example, if oneobject is required for a procedure demanding a high level of accuracy,controller 508 may apply the treatment to the object for a relativelylong period of time (e.g., 45 seconds). Whereas if another object isrequired for a procedure demanding a lesser level of accuracy,controller 508 may apply the treatment to the object for a relativelyshort period of time (e.g., 15 seconds).

In some embodiments, the at least one processor is further configured toincrease a time duration for a subsequent plasma treatment in responseto determining that that the plasma treatment is below the threshold.For example, if a first plasma treatment on an object lasting only 15seconds resulted in the object not reaching a hydrophilic state (e.g.,the plasma treatment is below the threshold such that fog can form onthe object), the at least one processor may increase a time duration fora second plasma for the object to 30 seconds. The second (e.g., longer)plasma treatment may cause the treated object to becomesuper-hydrophilic (e.g., the plasma treatment is above the threshold andfog no longer forms on the object). For example, at least one processor102 or 508 may increase a time duration for a subsequent plasmatreatment by plasma generating field applicator 130 in response todetermining that a previous plasma treatment applied to object 200 isbelow the threshold for preventing fog from forming on an opticalelement of object 200.

According to some embodiments, the desired level of hydrophilicity issuper-hydrophilic. The term “super-hydrophilic” may refer to a very highlevel of hydrophilicity, for example sufficiently hydrophilic tosubstantially decrease a contact angle between a fluid and the surfaceof the object, e.g., so as to allow the fluid to coat the surface of theobject as a substantially uniform (e.g., flat) layer. In someembodiments, after increasing the hydrophilicity of the object to thedesired level, the contact angle between the fluid and thesuper-hydrophilic surface of the object may be less than about 30°,e.g., less than about 15° or less than about 10°, e.g., when measured at20° C. and atmospheric pressure. Thus, prior to the plasma treatment,droplets may accumulate on the surface of the object to distort anoptical behavior of the object, whereas after the plasma treatment, thesurface of the object may be coated in a substantially uniform layer offluid that does not distort the optical behavior of the object in ameaningful manner. In some embodiments, increasing the hydrophilicity ofthe object to the desired level accentuates a surface charge and surfaceenergy of the object, allowing water molecules to bond to the surface ofthe object. According to some embodiments, the effect of the plasmatreatment on the hydrophilicity of the object may be limited in time,e.g., to less than 48 hours, less than 36 hours, less than 24 hours, orless than 12 hours.

In some embodiments, the desired level of hydrophilicity may relate to aquality of the plasma treatment. The “quality of the plasma treatment”may relate to the level of hydrophilicity attained after activating theelectric and/or electromagnetic field for generating the plasma for agiven time duration. For example, a high-quality plasma treatment mayachieve a relatively high level of hydrophilicity (e.g., obtaining asurface tension above that of water namely above 0.072 N/M on thetreated surface) after activating the electric and/or electromagneticfield for a relatively short time (e.g., of 5 minutes, or 1 minute or asshort as 10 seconds or even as short as 5 seconds).

In some embodiments, the plasma generation device may include at leastone sensor configured to measure at least one plasma-activationparameter during the plasma treatment. The term “sensor” may refer to adevice or element capable of detection. For example, a sensor may detectan absolute value or a change in a quantity and generate a correspondingsignal or data. A sensor may be a physical sensor configured to sensephysical (e.g., analog and/or digital) signals, a software sensorconfigured to sense digital signals (e.g., analog signals converted to adigital format, digital signals generated by the at least one processor,digital signals received from another device), or a combination of aphysical sensor and a software sensor. The term “measure” may relate todetecting, checking, assessing, estimating, or quantifying an attribute,e.g., a physical attribute. The sensor may measure the attribute as aninstantaneous characteristic, a time-dependent characteristic, or acombination thereof. The term “plasma-activation parameter” may relateto any condition within and/or proximate to the plasma activation zone.For example, the sensor may be a pressure sensor, a voltage sensor, acurrent sensor, a plasma frequency sensor, touch sensor, time sensor,optical sensor, temperature sensor, electric field sensor, magneticfield sensor, or any other detector for measuring a parameter relevantthe plasma treatment. In some embodiments, the sensor may measure anegative pressure in at least a portion of the bore (e.g., via a vacuumsensor). In some embodiments, the sensor may detect when the at least aportion of the object (e.g., the optical element) is within the bore,e.g., ready to be exposed to the plasma. For example, the sensor may besensitive to touch, pressure, weight, magnetic or electric conductivity,temperature, optical characteristics, or any other physical attributefor detecting the presence of at least a portion of the object. The term“during the plasma treatment” may refer to a time span over which theobject is exposed to a plasma cloud for the purpose of increasing thehydrophilicity of the object. The time span may relate to a range ofpossible times, a minimal time, a maximal time, or a recommended time.In some embodiments, the time span may include a time period needed togenerate the plasma cloud from gas present in the plasma-generationzone. In some embodiments, the time span may include a time periodneeded to introduce gas into the plasma-generation zone. In someembodiments, the time span may include a time period needed to evacuateother gases (e.g., air) from the plasma-generation zone. Turning toFIGS. 5 and 11, plasma generating system 500 include one or more sensorsfor measuring a plasma-activation parameter, such as pressure sensor1100 (FIG. 11) for measuring pressure, plasma frequency sensor 512 formeasuring a frequency of the plasma generated within plasma-generationzone 504, voltage sensor 514 for measuring voltage, e.g., between anode340 and cathode 330 (FIG. 4).

In some embodiments, the plasma generation device may include at leastone processor. The at least one processor may include electric circuitryfor performing logical operations on an input signal. For example, theat least one processor may include one or more integrated circuits(ICs), including ASICs, microchips, microcontrollers, microprocessors,all or part of a CPU, GPU, APU, DSP, FPGA, or other circuits suitablefor executing computing instructions and/or capable of performinglogical operations, e.g., based on a computing instruction or an inputsignal. Instructions executed by the at least one processor may bepre-loaded into a memory integrated with or embedded into a controller(e.g., processor) or may be stored in a separate memory. The memory mayinclude a RAM, a cache memory, a ROM, a hard disk, an optical disk, amagnetic medium, a flash memory, other permanent, fixed, or volatilememory, or any other mechanism capable of storing such instructions. Insome embodiments, the at least one processor may include multipleprocessors. Each processor may have a similar construction, or differentconstructions that may be electrically connected or disconnected fromeach other. The processors may be separate circuits or integrated in asingle circuit. Multiple processors may be configured to operateindependently or collaboratively. The processors may be coupledelectrically, magnetically, optically, acoustically, mechanically or byother means that permit them to interact. The processors may be physicaland/or virtual (i.e., software-based). In some embodiments, multipleprocessors may be distributed and collectively accessed remotely and/orlocally, as known in the art of cloud computing. Turning to FIG. 5B,controller 508 illustrates an exemplary implementation of at least oneprocessor, consistent with disclosed embodiments. Similarly, at leastone processor 508 illustrates another exemplary implementation of the atleast one processor.

In some embodiments, the at least on processor may be configured todetermine, based on the at least one plasma-activation parameter, thatthe plasma treatment is below a threshold for increasing thehydrophilicity of the object to the desired level. The term “determine”may relate to a measurement, comparison, estimation, or calculationperformed by the at least one processor with respect to the at least oneplasma-activation parameter and one or more additional values, e.g.,stored in memory or received from another device. For example, the atleast one processor may determine, based on the at least oneplasma-activation parameter by comparing the at least oneplasma-activation parameter to a value (e.g., a minimum, maximum, oraverage value) stored in memory in advance of the plasma treatment. Insome embodiments, the term “threshold” may relate to aspects of theplasma treatment, such as a power level, energy level, time duration,intensity, magnitude, pressure, frequency, phase, temperature, or anyother attribute that may influence the effectiveness of the plasmatreatment in increasing the hydrophilicity of the object. In someembodiments, the term “threshold” may relate to characteristics of thetreated object, such as the level of hydrophilicity attained, theincident angle of fluid coming in contact with the treated object, thesurface tension of the treated object, the surface charge of the treatedobject, the variability of fluid condensed on the surface of the treatedobject, the optical quality attained via the treated object after thetreated object comes in contact with fluid, and any other characteristicindicating the level of hydrophilicity achieved by the plasma treatment.For example, controller 508 (FIG. 5B) may determine, based on a plasmaactivation parameter (e.g., pressure sensed via pressure sensor 1100 ofFIG. 11) that the plasma treatment provided by plasma generating system500 (FIGS. 5A-5C) is not sufficient (e.g., below a threshold) toincrease the hydrophilicity of optical element 390 of endoscope 380(FIG. 2) to a desired level to prevent condensation that diminishesvisibility via a viewport of endoscope 380. Consequently, controller 508may determine failure of the plasma treatment. According to someembodiments, sensor inputs may be pressure and RF voltage measurements.A pressure measurement may be taken prior to igniting plasma, and anychange in pressure over time (e.g., above a threshold, such as 0.3 atm)may be reported. Thus, transformer 526 (FIG. 5B) may include a sensorfor RF output such that decrease in voltage below a threshold maycommunicate a failure in the plasma treatment.

In some embodiments, the at least one processor may be configured tooutput a notification indicating of plasma treatment failure. The term“output” may relate to the indicating of information via an interface.The information may be indicated (i.e., outputted) visually, e.g., via avisual display, printer, one or more light-emitting diodes or lightbulbs, dials, gauges, meters, or any other visual indicator. In someembodiments, the information may be indicated audibly, e.g., via aspeaker, or in a tactile manner, e.g., as vibrations produced by adirect current motor coupled to an eccentric rotating mass (ERM). Insome embodiments, the notification may be a binary indication revealingeither success of failure of the plasma treatment. In some embodiments,the notification may further indicate on which of the at least oneplasma-activation parameters the determination of failure is based. Insome embodiments, the notification may include a recommendation foradjusting or calibrating one or more system parameters to remedy theplasma treatment failure. In some embodiments, the notification mayinclude a recommendation for replacing or fixing one or more componentsof the plasma generation device to remedy the plasma treatment failure.In some embodiments, the notification may be a warning indicating that aplasma treatment failure is imminent. In some embodiments, the warningmay relate to one or more of the system parameters and or systemcomponents referred to above. For example, controller 508 (FIG. 5B) mayoutput a notification indicating the plasma treatment failure viadisplay 1102 (FIG. 11).

In some embodiments, the at least one sensor is configured to measurethe at least one plasma-activation parameter by detecting a pressure inthe plasma-generating zone during the plasma treatment, wherein the atleast one processor is further configured to determine that the plasmatreatment fails to meet the threshold when the pressure is outside apressure range. The term “pressure” may relate to a strain or forceapplied over an area. For example, gas contained within theplasma-generation zone may exert force on the inner walls of theplasma-generation zone. The force exerted by the gas may be measured asa plasma-activation parameter, indicating when the gas is at a suitablepressure for plasma ignition, for example after air is evacuated fromthe plasma-generating zone, or after the gas for igniting the plasma isstreamed into the plasm-generating zone. The term “pressure range” mayrelate to one or more of a pressure window, a minimal pressure, amaximal pressure, an average pressure, or a tolerance around an averagepressure. In some embodiments, a pressure suitable for plasma ignitionmay be below 0.1 Atm. The at least one processor may compare thedetected pressure to a predefined pressure range (e.g., below 0.1 Atm)stored in memory and determine that the detected pressure does not meetconditions necessary to successfully generate plasma.

Consequently, the at least one processor may determine that the plasmatreatment may fail. For example, controller 508 (FIG. 5B) may determine,based on a pressure sensed via pressure sensor 1100 (FIG. 11) that theplasma treatment provided by plasma generating system 500 (FIGS. 5A-5C)to an object is not sufficient (e.g., fails to meet a threshold) forincreasing the hydrophilicity of the object to a desired level, e.g.,that may prevent condensation diminishing visibility via the object.

In some embodiments, the at least one sensor is configured to measurethe at least one plasma-activation parameter by detecting a voltage atan electrode generating the plasma during the plasma treatment, whereinthe at least one processor is further configured to determine that theplasma treatment fails to meet the threshold when the detected voltageis outside a voltage range. The term “voltage” may relate to an electricpotential difference between two points (e.g., measure in units ofvolts), such as between two electrodes (e.g., between an anode and acathode). The term “voltage range” may relate to one or more of minimalvoltage, a maximal voltage, an average voltage, or a tolerance around anaverage voltage. For example, the voltage detected in the vicinity ofthe plasma-generation zone may determine aspects of the electric and/orelectro-magnetic field for generating the plasma. The term “electrode”may relate to an electrical contact made of a conductive material, suchas metal, a semiconductor, graphite, conductive polymers, and any othermaterial capable of conducting an electric current. An electrode may bean anode or a cathode, where electric current typically flows out of acathode and towards an anode. Thus, in some embodiments, the at leastone sensor may include a voltage sensor that measures the voltage insideor in proximity to the plasma-generation zone. The at least oneprocessor may receive the measured voltage to determine if the voltageis sufficient to drive an electric and/or electromagnetic field capableof generating plasma to increase the hydrophilicity of the object to thedesired level. The at least one processor may compare the detectedvoltage to a predefined voltage range stored in memory and determinethat the detected voltage does not meet conditions necessary tosuccessfully generate plasma. Consequently, the at least one processormay determine that the plasma treatment may fail. Turning to FIG. 5A,voltage sensor 514 may measure a voltage, e.g., between anode 340 andcathode 330 (FIG. 4). Controller 508 may receive the measurement fromvoltage sensor 514, and determine, based on the measurement if theplasma treatment fails to meet the threshold.

In some embodiments, characteristics of an electric and/orelectromagnetic field capable of generating plasma from a gas may dependon the geometry of the electrodes, such as the shape, configuration, anddistance between the electrodes provided for inducing the electricfield. Additionally, or alternatively, the electric and/orelectromagnetic field needed to generate the plasma may depend on thegas used to generate the plasma. Typically, gas at a high pressurerequires a higher electric and/or electromagnetic field (e.g., measuredas voltage per unit area) to ignite plasma in the gas. However, somegases may require lower electric and/or electromagnetic fields to igniteto form plasma than other gases. For example, plasma may be ignited inhelium gas at atmospheric pressure using a radio frequency (RF) field(e.g., in a frequency between 1 MHz and 15 MHz) of about 7 KV over adistance of 1 cm between electrodes, whereas if the helium gas is at apressure of 0.8 KPa, a voltage of about 200V may suffice. Using asimilar configuration of electrodes with similar field frequencies,plasma may be ignited in air at atmospheric pressure using a voltage ofabout 20 KV, whereas if the air is at a pressure of 0.8 KPa, a lowervoltage, e.g., 800V may be sufficient.

In some embodiments, the at least one sensor is configured to measurethe at least one plasma-activation parameter by detecting a plasmafrequency during the plasma treatment, and wherein the at least oneprocessor is configured to determine that the plasma treatment fails tomeet the threshold when the detected plasma frequency is outside aplasma frequency range. The term “plasma frequency”, e.g., “electronplasma frequency”, may relate to the frequency at which electrons (e.g.,negatively charged particles) in a plasma naturally oscillate relativeto ions (e.g., positive and negatively charged particles) present in theplasma. The plasma frequency may range between 2 and 20 MHz. Each type,e.g., species, of plasma may have a different frequency. The term“plasma frequency range” may relate to one or more of minimal plasmafrequency, a maximal plasma frequency, an average plasma frequency, or atolerance around an average plasma frequency. Turning to FIG. 5A, plasmafrequency sensor 512 may measure a frequency of the plasma generatedwithin plasma generation zone 504. Controller 508 may receive themeasurement from plasma frequency sensor 512, and determine, based onthe measurement if the plasma treatment fails to meet the threshold.

In some embodiments, the at least one sensor includes at least one of apressure sensor, a voltage sensor, or a plasma frequency sensor. Thepressure sensor may include one or more of a pressure transducer, apressure transmitter, a pressure sender, a pressure indicator, apiezometer, a manometer, or any other device capable of detecting ormeasuring pressure. The pressure sensor may be an absolute pressuresensor that measures pressure relative to a perfect vacuum, e.g., forsituations where a constant reference is required, such as to monitor avacuum pump. Alternatively, the pressure sensor may measure pressurerelative to atmospheric pressure or ambient pressure, or relative to apressure that is different than the ambient pressure. The pressuresensor may include a force collector to measure a compression, load, orstress caused by gas pushing or pressing against the pressure sensor(e.g., when the pressure sensor is located inside the plasma-generationzone). Additionally, or alternatively, the pressure sensor may includeone or more vibrating components to measure a change in resonantfrequency of a gas, such as vibrating wires, crystals (e.g., quartz),micro-electromechanical systems (MEMS), and any other vibratingcomponent sensitive to a resonant frequency. The voltage sensor maydetect a magnetic field, an electric field, or an electromagnetic fieldto calculate the amount of voltage (e.g., electric potential) in anobject. In some embodiments, the voltage sensor may be a contact sensorhaving a test probe configured to touch an electric circuit. In someembodiments, the voltage sensor may be a non-contact voltage sensorconfigured for sensing a weak electric current that is capacitivelycoupled from a circuit to the voltage sensor. The plasma frequencysensor may be a resonance frequency detector configured to measure anelectron density of the plasma. Turning to FIGS. 5 and 11, voltagesensor 514 and a plasma frequency sensor 512 (FIG. 5A) may measurevoltage and plasma frequency, respectively with respect to the plasmagenerated within plasma generation zone 504. Similarly, frequency sensor1100 (FIG. 11) may measure a frequency of the plasma generated withinplasma generation zone 504 (FIG. 5A). Controller 508 (FIG. 5B) mayreceive a measurement from one or more of voltage sensor 514, plasmafrequency sensor 512, or frequency sensor 1100, and determine, based onthe measurement if the plasma treatment fails to meet the threshold.

In some embodiments, the plasma generation device may further include agas reservoir configured to stream a gas into the plasma-generation zonefor carrying out the plasma treatment, wherein the at least oneprocessor is further configured to determine that the plasma treatmentfails to meet the threshold based on a characteristic of the gas. Theterm “gas reservoir” may refer to a sealable tank, balloon, or canisterconfigured to contain a gas, e.g., at a higher pressure or lowerpressure than atmospheric pressure. In some embodiments, the gasreservoir may be portable, e.g., for a single plasma treatment. In someembodiments, the gas reservoir is a central gas reservoir that is notportable. The gas reservoir may be configured to be fluidly coupled tothe plasma-generation zone of the plasma generation device, e.g., via ahose. The gas reservoir may be further configured to be fluidly coupledto one or more pumps and/or valves for controlling and moderating astream of gas from the gas reservoir to the plasma-generation zone.

In some embodiments, the object is an endoscope, wherein the plasmageneration device further includes a detachable sheath dimensioned toreceive a distal end of the endoscope, and wherein the plasma-generationzone is configured to apply the plasma treatment to the distal end ofthe endoscope within the sheath. The term “detachable” may refer toremoveable or capable of separation. For example, the sheath may beremoveable from the distal end of the endoscope and from the plasmageneration device. The term “sheath”, or “protecting shroud” may referto a covering or supporting structure that fits around an object. Forexample, the sheath may enclose an optical element of a medicalinstrument. In one exemplary embodiment, the sheath may be a slender,flexible, disposable tube that retains within the sheath a portion ofthe medical instrument when the medical instrument is inserted into theplasma-generation zone. In some embodiments, the sheath may include anauthentication element (e.g., an RFID tag or any other automaticallydetectable identification device) enabling the at least one processor totest the sheath prior to operating the plasma generation device with thesheath. The authentication element may enable the at least one processorto determine if the sheath is new and/or if it has been used apermissible number of times. Additionally or alternatively, theauthentication element may enable the at least one processor to test thesheath to determine if the sheath is from an approved manufacturer.Without such verification, an unauthorized sheath may be used,compromising sterility and/or effectiveness in inhibiting fog on theobject. The term “dimensioned” may refer to sized or designed (e.g.,configured or constructed) according to a measured proportion, e.g.,length, width, and/or height. For example, the sheath may be sized toaccommodate a distal end of the endoscope. The term “endoscope” mayinclude any of the medical scopes previously described. For example, anendoscope includes an elongated tubular instrument having an opticalsensor (e.g., camera) and light source disposed at a distal end. Theendoscope may be used to look inside a human body, e.g., during medicalprocedures commonly referred to as endoscopy. For example, the distalend of an endoscope may be placed inside a removeable sheath, and thesheath with the distal end of the endoscope may be placed inside theplasma-generation zone such that the distal end of the endoscope isexposed to a plasma cloud while inside the sheath, e.g., to carry outthe plasma treatment. After the plasma treatment is complete, theendoscope may be removed from the plasma-generation zone while insidethe sheath to preserve sterility, or, the endoscope may be removedcompletely from the housing while the sheath remains within the housing.Protecting shroud 110 in FIG. 1A, protecting shroud 310 in FIG. 2, andsheath 800 in FIG. 8A are some examples of sheaths, in accordance withdisclosed embodiments. As another example, protecting shroud 310 may besized (e.g., dimensioned) to receive distal end 382 of endoscope 380(FIG. 2), where distal end 382 is provided with viewport 390.Plasma-generation zone 504 (FIG. 5A) may apply the plasma treatment todistal end 382, thereby applying the plasma treatment to viewport 390,while viewport 390 is within protecting shroud 310.

In some embodiments, the plasma generation zone is configured to containa plasma cloud on a first side of a dielectric barrier while the objectis located on a second side of the dielectric barrier. Disk 344 of FIGS.3A-3B depicts an exemplary implementation for a dielectric barrierseparating anode 340, positioned on one side of disk 344, from cathode330 positioned on the other side of disk 344. A plasma cloud may beformed on the cathode side 330, exposing viewport 390 of endoscope 380while preventing arc formation.

In some embodiments, the plasma generation device further includes aplasma generator configured to be activated to cause formation of aplasma cloud in the plasma-generation zone, and wherein the at least oneprocessor is further configured to activate the plasma generator for atime period sufficient to increase the hydrophilicity of the object tothe desired level. The Plasma generator of FIGS. 5A-5C illustrates anexemplary implementation of a plasma generator in accordance withdisclosed embodiments. Plasma generator 506 may be activated, e.g., viacontroller 508, to cause a plasma cloud to be formed in plasmageneration zone 504. Controller 508 may further activate the plasmagenerator for a time period sufficient to increase the hydrophilicity ofviewport 390 of endoscope 380 (FIG. 2) to the desired level, e.g., toprevent fog from forming on viewport 390 during an endoscopy procedure.

In some embodiments, the desired level of hydrophilicity of the objectis such that at least one hour after the plasma treatment, dropletshitting a surface of the object have contact angles of less than 10degrees. In some embodiments, the contact angles of droplets hitting thesurface after at least an hour of treatment may be less than 8.5degrees, or less than 7.5 degrees.

The contact angle may indicate a degree of hydrophilicity, for example adesired, or threshold level of hydrophilicity required to use theobject, e.g., for a medical procedure. The desired contact angle (e.g.,less than 10 degrees, less than 8.5 degrees, or less than 7.5 degrees)may be associated with a desired optical quality of an optical elementof the object when the object is used for a medical procedure. Turningto FIG. 2, viewport 390 of endoscope 380 may be treated by plasma inaccordance with the present disclosure such that at least one hour afterthe plasma treatment, the surface tension of viewport 390 is greaterthan the surface tension of water, and results in a contact angle ofless than 10 degrees for water droplets hitting the surface of viewport390. Consequently, at least one an hour of the plasma treatment viewport390 may be substantially immunized from an accumulation of fog, andendoscope 380 may be used for a medical procedure and provide a highoptical quality.

FIG. 16 is a block diagram of an example process 1600 for generatingplasma to treat an object, consistent with embodiments of the presentdisclosure. While the block diagram may be described below in connectionwith certain implementation embodiments presented in other figures,those implementations are provided for illustrative purposes only, andare not intended to serve as a limitation on the block diagram of FIG.16. As examples of the process are described throughout this disclosure,those aspects are not repeated or are simply summarized in connectionwith FIG. 16. In some embodiments, the process 1600 may be performed byat least one processor (e.g., controller 508 of FIG. 5B) to performoperations or functions described herein. In some embodiments, someaspects of the process 1600 may be implemented as software (e.g.,program codes or instructions) that are stored in a memory provided withthe at least one processor, or a non-transitory computer readablemedium. In some embodiments, some aspects of the process 1600 may beimplemented as hardware (e.g., a specific-purpose circuit). In someembodiments, the process 1600 may be implemented as a combination ofsoftware and hardware.

FIG. 16 includes process blocks 1602 to 1610. At block 1602, entry of anobject into a plasma-generation zone is identified. This may occur, forexample, via a processing means (e.g., controller 508 of FIG. 5B). Forexample, controller 508 may identify entry of distal end 382 disposedwith viewport 390 of endoscope 380 (FIG. 2), into plasma-generation zone504 of plasma generating system 500.

At block 1604, circuitry may be activated for supplying energy togenerate plasma in the plasma-generation zone to carry out a plasmatreatment for increasing hydrophilicity of the object to a desiredlevel. For example, at least one processor 508 may activate circuitry106 for supply energy from power supply 104 to device 130 to generateplasma in a plasma-generation zone of device 130 to carry out a plasmatreatment on object 200. Circuit activation may alternatively occur viaa switch or sensor that determines entry of the object. The plasmatreatment may be controlled by at least one processor 508 to increasehydrophilicity of object 200 to the desired level, e.g., to preventfluid from condensing as droplets on an optical surface of object 200.As another example, controller 508 (FIG. 5B) may activate circuitry,e.g., (circuitry 700 of FIG. 7) for supplying energy (e.g., via cable112 of FIG. 1A) to cathode 330 and anode 340 via electric conductor 354,and electric conductor 358 (FIG. 3A) to generate plasma inplasma-generation zone 504 of plasma generating system 500. The plasmatreatment may increase hydrophilicity of viewport 390 (FIG. 3A) ofendoscope 380 to a desired level. The desired level may be associatedwith a desired optical quality when subsequently using endoscope 380 ina medical procedure.

At block 1606, at least one plasma-activation parameter is measuredduring the plasma treatment. As used in this context, “measuring” mayrefer to one or more of detecting, sensing, determining, or obtaining avalue indicative of a plasma-activation parameter. For example,controller 508 (FIG. 5B) may measure a pressure parameter associatedwith the plasma treatment via pressure sensor 1100 (FIG. 11).Additionally, or alternatively, controller 508 may measure a voltageparameter associated with the plasma treatment via voltage sensor 514.Similarly, controller 508 may measure a plasma frequency parameterassociated with the plasma treatment via plasma frequency sensor 514.

At block 1608, a determination is made that the plasma treatment isbelow a threshold for increasing the hydrophilicity of the object to thedesired level. For example, controller 508 (FIG. 5B) may determine,based on the pressure parameter measured via pressure sensor 1100 (FIG.11) that the plasma treatment provided by plasma generating system 500is below a threshold for increasing the hydrophilicity of viewport 390of endoscope 380 to the desired level (e.g., to ensure the desiredoptical quality when endoscope 380 is subsequently used for a medicalprocedure. In a similar manner, controller 508 may make determine, basedon a voltage parameter measured via voltage sensor 514, and/or a plasmafrequency parameter measured via plasma frequency sensor 512 that theplasma treatment provided by plasma generating system 500 is below thethreshold.

At block 1610, a notification may be output indicating plasma treatmentfailure. For example, controller 508 (FIG. 5B) may display anotification via display 1102 (FIG. 11) indicating that the plasmatreatment has failed.

To facilitate treating an object with plasma, a plasma generation devicemay automatically trigger the generation of plasma upon detecting theinsertion of the object, i.e., within a bore of a housing of the plasmageneration device. The bore may be provided with one or more sensors fordetecting the insertion of the object. The one or more sensors maycommunicate information associated with the detection to at least oneprocessor configured to trigger, e.g., automatically, a plasma treatmentfor the object. When plasma generation occurs in a vacuum (e.g., apartial vacuum), a signal may be received from a vacuum sensor anddetermination may be made that there is a sufficient negative pressurefor plasma generation. Once a sufficient negative pressure determinationis made, energy may be supplied to an electrode to cause plasmageneration and to expose the object to plasma. In the case of medicalscopes where a premium is placed on speed, efficiency, and sterility, anability to treat optics with plasma and with limited human interventionmay provide a significant benefit.

In some embodiments, at least one processor may trigger a plasmatreatment to correspond to the object type, e.g., based on theinformation received from the one or more sensors. For example, a firstobject may be of a type requiring a shorter plasma treatment than asecond object requiring a longer plasma treatment. Alternatively, thefirst object may have a different hydrophilicity threshold than thesecond object (e.g., corresponding to preventing fogging for differentapplications and uses). The at least one processor may thus trigger adifferent plasma treatment for each of the first and second objects,corresponding to the different hydrophilicity thresholds.

In some embodiments, a device for treating an elongated tool with plasmamay be provided. The term “device” may include any apparatus orcombination of components capable of treating an object with plasma,e.g., by converting (e.g., igniting) a gas to transform the gas to aplasma state or plasma cloud and exposing the object to the plasmacloud. Plasma generating systems 100 (FIG. 1A) and 500 (FIGS. 5A-5C), aswell as plasma applicator 348 (FIG. 3A) illustrate exemplaryimplementations of a plasma generation device in accordance withdisclosed embodiments. The term “elongated tool” may refer to an objecthaving a length that is substantially longer than the width of theobject. Object 200 (FIG. 1B), endoscope 380 (FIG. 2), and endoscope 802(FIG. 8A) illustrate exemplary implementations of an elongated tool. Theterm “plasma” may refer to a state of matter containing an abundance ofcharged particles, e.g., electrons and ions. Consequently, plasma may behighly electrically conductive and sensitive to electric and/orelectromagnetic fields.

In some embodiments, the device may include a bore within the housing,the bore having an open end on a surface of the housing for insertion ofthe elongated tool therein. The term “bore” may refer to may refer to acavity, chamber, crevice, or pit capable of containing an object. Thebore may accommodate at least a portion of an object inside aplasma-generation zone to expose the at least portion of the object tothe plasma cloud. For example, the bore may accommodate an opticalelement of an endoscope to expose the optical element to a plasma cloudgenerated by igniting a gas streamed into the bore. Consequently, thehydrophilicity of the optical element may increase to prevent fog fromforming when the optical element is subsequently inserted into a body.In some embodiments, the bore may have an elongated shape, such as toaccommodate the elongated tool. The surface of the housing may includean opening, exposing an entrance into the elongated bore. The openingmay enable insertion of the elongated tool within the bore. Examples ofa bore disposed within the housing for the plasma generation device maybe illustrated by slot 132 (FIGS. 1A and 1C), bore 350 (FIG. 3A), bore450 (FIG. 3C), cavity 502 (FIGS. 5A-5C) and bore 900 (FIG. 9). Proximalopenings 142 (FIG. 1D) and 314 (FIG. 2) illustrate exemplaryimplementations of an open end of the bore, on the surface of thehousing, consistent with disclosed embodiments.

In some embodiments, a device includes at least one vacuum pump forcausing a vacuum in at least a portion of the bore. The term “vacuum”may refer to a region having a gaseous pressure that is substantiallylower than atmospheric or ambient pressure. As used herein, the term“vacuum” is intended to include partial vacuums. That is, in the contextof this disclosure, a vacuum encompasses an enclosed space where atleast some of the air or other gas is removed. The term “vacuum pump”may refer to a device that draws or suctions particles from a sealedvolume in order to cause a vacuum in the volume. Examples of vacuumpumps for causing a vacuum may be seen in FIG. 10A, which depicts aplurality of vacuum pumps (e.g., vacuum pumps 1000A, 1000B, 1000C, and1000D). One or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D maybe configured to cause a vacuum in at least a portion of a bore, such asin a portion of any of slot 132 (FIGS. 1A and 10), bore 350 (FIG. 3A),bore 450 (FIG. 3C), cavity 502 (FIGS. 5A-5C) and bore 900 (FIG. 9).

In some embodiments, a device includes an insertion detector fordetermining when the elongated tool is inserted within the bore. An“insertion detector” may refer to any sensor capable of detecting theinsertion of an object within the bore, such as a touch (contact) sensordetecting contact with the object, an optical sensor, e.g., capable ofdetecting the obstruction of a line of sight by the object within thebore or a reflection of light by the object within the bore, a pressuresensor capable of detecting pressure exerted by the object, a weightsensor capable of sensing the weight of the object, a voltage and/orcurrent sensor capable of detecting a change in potential and/or currentcaused by insertion of the object into the bore, and any other sensorcapable of sensing the object. In some embodiments, the insertiondetector may include a radio receiver for detecting an identifying tagassociated with the object, such as an RFID tag (e.g., authenticatingtag), such as may be included with a sheath provided to retain theobject within the bore. In some embodiments, the insertion detector mayinclude a mechanical sensor such as to detect the tearing of a hermeticseal covering the entrance to the bore. Non-limiting examples of aninsertion detector include one or both of the transmitter 24650 andtransponder 24654 depicted in FIGS. 25A through 25E.

For example, electrodes 704A and 704B (FIG. 7), configured to come inphysical contact with the object, illustrate an exemplary implementationof a sensor (e.g., voltage sensor) for detecting the insertion of theobject within the bore. Electrodes 704A and 704B may be configured toelectrically couple the inserted object with a cathode and/or anodeassociated with the bore, and thereby facilitate detecting when objectis inserted within the bore As another example, a sensor (not shown)associated with breakable hermetic screen 518 (FIG. 4) and configured toemit a signal when breakable hermetic screen 518 breaks upon insertionof the elongated object within the bore, may illustrate anotherexemplary implementation for detecting when the object is inserted intothe bore. As another example, pressure sensor 1100 (FIG. 11) mayillustrate another exemplary implementation for the insertion sensor, inaccordance with disclosed embodiments. A signal sensed by the insertionsensor may be provided to at least one processor (e.g., at least oneprocessor 102 of FIG. 1A and/or controller 508 of FIG. 5B) using wiredand/or wireless communications means. Based on the insertion signal, theat least one processor may determine the insertion of an object (e.g.,object 200 of FIG. 1B, endoscope 380 of FIG. 2, or endoscope 802 of FIG.8A) within the bore (e.g., slot 132 of FIG. 1A, bore 350 of FIG. 3A,bore 450 of FIG. 3C cavity 502 of FIGS. 5A-5C, or bore 900 of FIG. 9).

In some embodiments, a device includes a vacuum sensor associated withthe housing for determining an extent of negative pressure in the atleast a portion of the bore. In some embodiments, the vacuum sensor mayinclude a pressure transducer, e.g., for measuring pressure andconverting the pressure to an electrical signal via one or more straingauges. In some embodiments, the vacuum sensor may detect pressurerelative to a threshold and output a binary signal indicating that thepressure is above or below the threshold. In some embodiments, thevacuum sensor may output an electric signal proportional to the measuredpressure. The vacuum sensor may be positioned in proximity to the bore,e.g., while being in fluid communication with the bore, to determine theextent of the negative pressure inside the bore. Pressure sensor 1100(FIG. 11) illustrates an exemplary implementation for a vacuum sensor inaccordance with disclosed embodiments. Pressure sensor 1100 may beenclosed within (e.g., associated with) housing 510 (FIGS. 5A-5C) andmay determine the extent of negative pressure within cavity (e.g., bore)502.

In some embodiments, the device may include a plasma generator forgenerating plasma within the bore. The term “plasma generator” may referto a device configured to generate plasma, e.g., inside a plasmageneration zone The term “plasma generation zone” may refer to aphysical volume or space in which a plasma cloud may be formed, e.g., byigniting a gas introduced therein. The plasma generation zone may be ofany size. For example, the plasma generation zone may be less than 15cm³, less than 10 cm³, or less than 5 cm³. The plasma generator maygenerate an electromagnetic field within the plasma generation zone,such that exposing a gas to the electromagnetic field ignites the gas togenerate plasma. Plasma applicators 130 (FIG. 1A) and 348 (FIG. 3A), andthe plasma generator of FIGS. 5A-5C, (e.g., including at least a firstelectrical contact 522 , a second electrical contact 524, an energysource such as a battery 530, and a transformer 526) illustrateexemplary implementations of a plasma generator in accordance withdisclosed embodiments. Plasma applicators 130 and 348, and the plasmagenerator of FIGS. 5A-5C may be configured to generate plasma withinslot 132, bore 350, and cavity 502, respectively.

In some embodiments, a device includes at least one processor. In someembodiments, the at least one processor is configured to receive aninsertion signal from the insertion detector indicating that theelongated tool is within the bore. The term “insertion signal” may referto any signal indicating a presence of the elongated tool in the bore.For example, outputs of any of the insertion detectors described abovemay constitute insertion signals. In some embodiments, the insertionsignal may be an analog signal (e.g., as an analog value or signalreceived from an analog insertion detector). In some embodiments, theinsertion signal may be a digital signal (e.g., received by a digitaldevice such as a digital processor, digital filter, diode, and any otherdevice capable of providing a digital signal). In some embodiments, theinsertion signal may be a binary signal indicating whether the elongatedtool has been inserted within the bore. In some embodiments, theinsertion signal may be a value that is comparable (e.g., via the atleast one processor) to one or more threshold values (e.g., store inmemory) to determine if the elongated tool has been inserted within thebore. In some embodiments, the insertion signal may include one or moreof: a touch signal by a touch (contact) sensor indicating physicalcontact between the elongated tool (or a sheath enclosing the elongatedtool) and the bore, an optical signal by an optical sensor indicating anobstruction of a line of sight or a reflection of light by the elongatedobject within the bore, a pressure signal by a pressure sensorindicating pressure exerted by the elongated object within the bore, aweight signal by a weight sensor indication weight exerted by theelongated object within the bore, a voltage (and/or current) signal by avoltage (and/or current) sensor indicating a voltage (and/or current)level caused by inserting the elongated object into the bore, a radiosignal by a radio receiver indicating insertion of the elongated objectinto the bore (e.g., in association with an authenticating tag such asan RFID tag), or any other measure indicating the insertion of theelongated object into the bore. For example, an identification signalfrom transponder 24654, as discussed herein in reference to FIGS. 24 and25A through 25E, may correspond to an insertion signal from an insertiondetector.

In some embodiments, the insertion signal may be associated with aninsertion detector configured with a sheath encasing the elongated tool.For example, the sheath may be provided with at least one electrode andat least one sheath electric contact configured to electrically contacta corresponding contact in the plasma generation device when the sheathis inserted into the bore. As another example, the sheath may beprovided with an authenticating tag, such as an RFID tag, that sends aradio signal receivable by a radio receiver associated with the bore. Insome embodiments, the insertion signal may be mechanical in nature,e.g., in association with the tearing of a hermetic seal covering theentrance to the bore. In some embodiments, the insertion signal mayrelate to a portion of the elongated tool, such as the distal end of theelongated tool. For example, the insertion detector may emit aninsertion signal when the distal end of the elongated tool is insertedinto the bore.

An exemplary implementation of an insertion sensor configured to send aninsertion signal may be seen in FIG. 7. For example, on insertingmedical instrument 708 (e.g., an elongated tool) into bore 712,electrodes 702A and 702B may become electrically coupled to medicalinstrument 708 via electrodes 704A and 704B, e.g., thereby electricallycoupling medical instrument 708 or 200 (FIG. 1A) to power supply 530.Consequently, any of electrodes 702A and 702B or 704A and 704B maytransmit a voltage signal as an insertion signal

Attorney Docket No. 15608.0006-00000 indication insertion of the objectwithin the bore. Similarly, detecting breakage of hermetic screen 518(FIG. 4) by endoscope 380 (e.g., an elongated tool) when endoscope 380is inserted within sheath 510 (e.g., with sheath 510 fitted inside thebore of the device) may be another exemplary implementation of aninsertion signal for detecting when the object is inserted into thebore. As another example, pressure sensed by pressure sensor 1100 (FIG.11) when endoscope 810 (FIG. 8) is inserted into sheath 800, (e.g., withsheath 800 fitted inside the bore of the device) may constitute anadditional exemplary implementation for the insertion signal receivedfrom the insertion detector, in accordance with disclosed embodiments.The insertion sensor may transmit an insertion signal indication theinsertion to at least one processor (e.g., at least one processor 102 ofFIG. 1A and/or controller 508 (FIG. 5B) using wired and/or wirelesscommunications means. A least one processor 102 and/or controller 508may determine, based on the insertion signal, that the elongated object(e.g., object 200 of FIG. 1B, endoscope 380 of FIG. 2, medicalinstrument 708 (FIG. 7), or endoscope 802 of FIG. 8A) has been insertedwithin the bore (e.g., slot 132 of FIG. 1A, bore 350 of FIG. 3A, bore450 of FIG. 3C, cavity 502 of FIGS. 5A-5C, and bore 900 of FIG. 9).

In some embodiments, at least one processor may be further configuredto, in response to the insertion signal, activate the at least onevacuum pump to generate a negative pressure in the at least a portion ofthe bore. The term “activate” may refer to trigger, turn or switch on(e.g., by emitting an electric signal), or perform any other action forinitiating pumping by the vacuum pump. The term “negative pressure” mayrefer to air or gas pressure that is smaller or lower relative to areference pressure, such as atmospheric or ambient pressure. In someembodiments, the pressure may be less than 0.3 atm, or less than 0.2atm, or less than 0.1 atm. In some embodiments, the effective pressurerange may be between 0.300 to 0.001 atm. In some embodiments, theeffective pressure range may be between 0.1 to 0.01 atm. The term “atleast a portion of the bore” may refer to a section or region of thebore that is in proximity to the elongated tool such that the negativepressure is at least partially exerted in the region of the elongatedtool within the bore. On activation by the at least one processor and inresponse to receiving the insertion signal, the vacuum pump may generatea relatively low pressure (e.g., negative pressure) to draw out (e.g.,suction) air and/or gas present within the bore, such that the pressureof air and/or gas within the bore, at least in the region surroundingthe elongated tool, is lower relative to the reference pressure.

For example, at least one processor 102 (FIG. 1A) or controller 508(FIG. 5B) may receive the insertion signal from the insertion detector,e.g., a pressure signal from pressure sensor 1100 (FIG. 11), a voltagesignal from one or more of electrodes 704A and 704B (FIG. 7), a signalindicating breakage of hermetic screen 518 (FIG. 4), and any of theother pressure sensing implementations described above. In response tothe insertion signal, at least one processor 102 and/or controller 508may activate the at least one vacuum pump (e.g., vacuum pumps 1000A,1000B, 1000C, and 1000D of FIG. 10A) to generate a negative pressure(e.g., suction) in at least a portion of the bore (e.g., slot 132 ofFIGS. 1A and 10, bore 350 of FIG. 3A, bore 450 of FIG. 3C, cavity 502 ofFIG. 5A, or bore 900 of FIG. 9). In some embodiments, the at leastportion of the bore may be in the vicinity of the elongated object.Thus, the negative pressure may be generated in proximity to theelongated tool (e.g., object 200 of FIG. 1B, endoscope 380 of FIG. 2, orendoscope 802 of FIG. 8A) within the bore.

In some embodiments, at least one processor is configured to receive asignal from the vacuum sensor and determine therefrom that a negativepressure in at least a portion of the bore is sufficient for plasmageneration. The term “sufficient for plasma generation” may refer to agas pressure that is low enough to allow any gas remaining, or any gasintroduced after generating the negative pressure in the bore, to ionizeand generate plasma. Additionally, or alternatively, the negativepressure generated by the vacuum pump may be sufficiently low such thata proportion or percentage of a specific type of gas (e.g., helium,argon, or nitrogen) introduced into the bore after the negative pressureis generated (e.g., drawing out air from the bore) meets a gasconcentration threshold needed to produce a specific type of plasmacorresponding to the specific type of gas.

For example, at least one processor 102 (FIG. 1A), and/or controller 508(FIG. 5B) may receive a signal from one or more of vacuum pumps 1000A,1000B, 1000C, and 1000D (FIG. 10A), and determine from the signal thatthe pressure in at least a portion of the bore, e.g., a portion of slot132 (FIGS. 1A and 10), bore 350 (FIG. 3A), bore 450 (FIG. 3C), cavity502 (FIGS. 5A-5C), bore 712 (FIG. 7), and bore 90 0 (FIG. 9) is lowenough to generate plasma, such as via plasma applicator 130 (FIG. 1A),plasma applicator 348 (FIG. 3A), or the plasma generator of FIGS. 5A-5C.In some embodiments, the negative pressure may be facilitated by hose364 (FIG. 3A) fluidly coupling the bore to the vacuum pump. In someembodiments, the negative pressure may be maintained by a seal, such asvacuum seal 370 (FIG. 3A). In some embodiments, low pressure (e.g.,negative relative to the reference pressure) that is sufficient forplasma generation may be less than 0.3 atm, or less than 0.2 atm, orless than 0.1 atm. In some embodiments, the effective pressure range maybe between 0.300 to 0.001 atm. In some embodiments, the effectivepressure range may be between 0.1 to 0.01 atm.

In some embodiments, generating of the negative pressure and theactivating of the plasma generator occur automatically in response todetecting that the elongated tool is within the bore. The term“automatically” may refer to directly, spontaneously, or consequent to,e.g., without intervention or necessitating an action external to theplasma generating system, such as by a human operator. Thus, the plasmagenerator may be activated automatically, e.g., directly and consequentto detecting that the elongated tool is inserted within the bore,without intervention by an agent and/or component external to the plasmagenerating device. For example, in response to detecting, via theinsertion sensor, that the elongated tool, (e.g., object 200 of FIG. 1B,endoscope 380 of FIG. 3A, medical instrument 708 of FIG. 7, or endoscope802 of FIG. 8A is within the bore, (e.g., slot 132 of FIGS. 1A, bore 350of FIG. 3A, bore 450 of FIG. 3C, cavity 502 of FIGS. 5A-5C, bore 712 ofFIG. 7, and bore 900 of FIG. 9), at least one processor (e.g., processor102 or controller 508) may automatically, e.g., without intervention byan agent or component external to the plasma generating device (such asplasma applicator 130 of FIG. 1A, plasma applicator 348 of FIG. 3A, orthe plasma generator of FIGS. 5A-5C, activate one or more of vacuumpumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) to generate the negativepressure within the bore, and additionally activate the plasmagenerator, e.g., the plasma generator of FIGS. 5A-5C or plasmaapplicator 130.

In some embodiments, the at least one processor is configured toactivate the plasma generator after the determination is made thatnegative pressure in the at least a portion of bore is sufficient forplasma generation, thereby exposing a distal end region of the elongatedtool to plasma. The term “activate” may refer to trigger, turn or switchon (e.g., by emitting an electric signal), or perform any other actionthat initiates the generation of plasma by the plasma generator, e.g.,by initiating the generation of an electric and/or electromagnetic fieldby the plasma generator capable of igniting plasma within the bore. Forexample, after determining that the pressure within the bore, e.g., anyone of slot 132 (FIGS. 1A and 10), bore 350 (FIG. 3A), bore 450 (FIG.3C), cavity 502 (FIGS. 5A-5C) and bore 900 (FIG. 9), is low enough togenerate plasma, at least one processor (e.g., processor 102 orcontroller 508) may send an activation signal to any of plasmaapplicator 130, plasma applicator 348 (FIG. 3A), or the plasma generatorof FIGS. 5A-5C to initiate the generation of plasma within at least aportion of the bore, e.g., in proximity to distal end 210 of object 200(FIG. 1B), distal end 382 with optical element 392 of endoscope 380(FIG. 2), or optical surface 706 of medical instrument 708 (FIG. 7),thereby exposing the distal end of the elongated object to plasma.

According to some embodiments, the bore is configured to receive asheath therein, the sheath being sized to receive the elongated tool,and wherein the device is further configured to cause plasma generationwithin the sheath. The term “sheath” or “protecting shroud” maysynonymously refer to a covering or supporting structure that containsan object or a portion thereof. For example, the sheath may enclose anoptical element of a medical instrument. In one exemplary embodiment,the sheath may be a slender, disposable tube for containing a portion ofthe medical instrument when the medical instrument is inserted into theplasma-generation zone. In some embodiments, the sheath may include anauthentication element (e.g., an RFID tag or any other automaticallydetectable identification device) enabling at least one processor totest the sheath prior to operating the plasma generation device with thesheath. The authentication element may enable the at least one processorto determine if the sheath is new and/or if it has been used apermissible number of times. Additionally, or alternatively, theauthentication element may enable the at least one processor to test thesheath to determine if the sheath is from an approved manufacturer toprevent an unauthorized sheath to be used, compromising sterility and/oreffectiveness in inhibiting fog on the object. The term “sized toreceive the elongated tool” may refer to formed, constructed, or shapedto accommodate an object having dimensions corresponding to theelongated tool. The sheath may thus be formed to enable inserting theelongated tool therein. Similarly, the bore may be shaped and/or sizedto accommodate the sheath with the elongated tool inserted therein. Thesheath may be further configured to enable the distal end of theelongated tool to be exposed to a plasma cloud while the distal end isencased within the sheath.

For example, protecting shrouds (a/k/a sheaths) 310 (FIGS. 2) and 310 a(FIG. 3A), and 410 (FIG. 3C) and 800 (FIG. 9) are exemplaryimplementations of a sheath sized to receive an elongated tool, such asendoscope 380, consistent with disclosed embodiments. In someembodiments, the distal end of the elongated tool may be introduced intothe sheath first. Plasma applicator 130 (FIG. 1A), plasma applicator348, or the plasma generator of FIGS. 5A-5C may be provided with a bore,such as slot 132, bore 350, or cavity 502, respectively, which may beconfigured to receive therein the sheath referred to above. In addition,the sheath may be provided with one or more electrodes (e.g., cathode330 and anode 340 of FIGS. 3A and 3C) configured to electrically coupleto a power supply (e.g., power supply 104 and/or 530), such as viaconductors 354 and 356, respectively. Cathode 330 and anode 340 maymaintain a voltage potential for generating a plasma-generating anelectric and/or electromagnetic field in the vicinity of the distal end(e.g., viewport 390) of endoscope 380, positioned therein inside thesheath. A gas for generating the plasma (e.g., helium, argon, nitrogen)may be streamed, e.g., via hose 364 into sheath 410 in the vicinity ofviewport 390 at the distal end of endoscope 380. The electric and/orelectromagnetic field thus generated may ignite the gas streamed intothe sheath to form the plasma cloud in the vicinity of viewport 390,thereby exposing viewport 390 at the distal end of endoscope 380 toplasma.

In some embodiments, the insertion detector is configured to senseinsertion of the elongated tool within the sheath in the bore and toautomatically initiate a plasma generation process upon sensed insertionof the elongated tool within the sheath. The term “automatically” mayrefer to directly consequent to, without requiring intervention externalto the plasma generation device, as described above. According to someembodiments, the term “automatically initiate a plasma generationprocess” may refer to generating the plasma independent of (e.g., bycircumventing) a controller such that the detector directly triggers theplasma generation. Thus, the plasma generation process may be triggeredautomatically on inserting the elongated tool within the sheathpositioned within the bore of the plasma generation device. For example,FIGS. 1A, 3C and 5A, taken together, illustrates an exemplaryimplementation for an insertion detector configured to sense insertionof the elongated tool within the sheath in the bore and automaticallyinitiate plasma generation, consistent with disclosed embodiments.Sheath 410 (FIG. 3C) includes cathode 330 configured to contact metallicsurface 384 for example at the distal end of endoscope 380. On insertingendoscope 380 into sheath 410 positioned within bore 450, cathode 330may become electrically coupled to endoscope 380 via metallic surface384. Cathode 330 may additionally be electrically coupled to powersupply 530, thereby electrically coupling endoscope 380 to power supply530 on inserting endoscope 380 into sheath 410 within bore 450.Electrically coupled thus, the insertion of endoscope 380 within sheath410 inside bore 450 may be detected, such as by at least one processor102 (FIG. 1A), or controller 508 (FIG. 5B) receiving an electric signalfrom cathode 330, e.g., via circuitry 106 or 700. On receiving theelectric signal (e.g., the insertion signal), the at least one processormay automatically activate the plasma generator, e.g., plasma applicator130 (FIG. 1A), plasma applicator 348 (FIG. 3A), or the plasma generatorof FIGS. 5A-5C.

According to some embodiments, the bore includes an electrical contacttherein configured to engage a contact on the sheath, to thereby enableplasma generation within the sheath. The term “electrical contact” mayrefer to an electrical circuit component having an electricallyconductive section (e.g., made from metal or semiconductor) that allowsan electrical current to pass through when the electrical contact iselectrically coupled to (e.g., physically touches) another electricalcontact. The term “engage” may refer to couple, attach, or connect forthe purpose of interacting. Thus, electrically coupling the electriccontact of the bore to the electrical contact of the sheath, therebyengaging the electrical contact of the bore with the contact on thesheath, may allow passage of an electric current from an external powersupply into the interior of the sheath, for example for the purpose ofgenerating an electromagnetic field within the sheath to generateplasma.

FIG. 3A illustrates an exemplary implementation of a bore including anelectrical contact therein configured to engage a contact on the sheath,consistent with disclosed embodiments. Bore 350 may include cathodecontactor 352 configured to be coupled to an external power source(e.g., power supply 104 and/or 530) via electric conductor 354. Cathodecontactor 352 may additionally be configured to be electrically coupledto, and thus engage with cathode 330 of protecting shroud 310 a (e.g., asheath), thereby electrically coupling cathode 330 of protecting shroud310 a to the external power supply. Bore 350 may additionally includeanode contactor 356 configured to be electrically coupled to, and thusengage with anode 340 of protecting shroud 310 a while protecting shroud310 a is positioned within bore 350. Consequently, a voltage potentialmay be generated within protecting shroud 310 a, e.g., between cathode330 (electrically coupled to the power supply) and anode 340. Thevoltage potential may enable generating a plasma-generatingelectromagnetic field within protecting shroud 310 a. Theelectromagnetic field may ignite a gas present within protecting shroud310 a to generate a plasma cloud within.

In some embodiments, the sheath includes a vacuum port and a vacuum sealtherein, the vacuum port being flow-connectable to the at least onevacuum pump to enable causation of the negative pressure within thesheath when located within the bore, and wherein the vacuum seal isconfigured to engage with the elongated tool upon insertion of theelongated tool into the sheath to maintain the negative pressure on adistal side of the elongated tool (i.e., proximate the distal end of theelongated tool when inserted in the sheath within the bore). The term“vacuum port” may refer to an opening configured to be fluidly coupledto a vacuum source or pump, e.g., via a hose, to enable suctioning ofgas or fluid, e.g., from the sheath. The term “vacuum seal” may refer toa plug, closure, ring, flap, engagement, or fastening that issubstantially immune to leakage of gas or fluid when the system is usedwithin normal operating parameters. The term “flow-connectable” mayrefer to fluidly coupled, e.g., joined or attached in a manner thatallows streaming a fluid (e.g., including gas) there through. The sheathmay thus be fluidly coupled (e.g., flow-connectable) to the at least onevacuum pump via the vacuum port and vacuum seal. This configuration mayallow the suctioning of gas and/or air present within the sheath togenerate a low-pressure zone within the sheath (e.g., relative vacuumwith respect to a reference pressure) for the purpose of generatingplasma. In some embodiments, one or more vacuum seals may be providedwith the sheath encasing the elongated tool. The one or more vacuumseals may be adapted to fit an external diameter of the elongated tool,such that inserting the elongated tool into the sheath may engage theelongated tool with the one or more vacuum seals, thereby sealing theinterior of the sheath from the exterior of the sheath (e.g., via theelongated tool surrounded by the vacuum seal). Such sealing may allowmaintaining a pressure difference (e.g., gas concentration difference)between the interior and exterior of the sheath, which may assist ingenerating plasma for the plasma treatment.

FIG. 3C and FIG. 10A, taken together, illustrates an exemplaryimplementation of a sheath including a vacuum port and vacuum seal, thevacuum port being flow-connectable to the at least one vacuum pump,consistent with disclosed embodiments. Sheath 410 may be configured withsheath gas port 404 (e.g., a vacuum port) and vacuum seal 408. Sheathgas port 404 may fluidly connect to applicator gas port 402 of plasmaapplicator 448, which may be fluidly connected via hose 364 to a vacuumsource, such as one or vacuum pumps 1000A, 1000B, 1000C, and 1000D ofFIG. 10A, thereby fluidly coupling the vacuum source to the interior ofsheath 410. Vacuum seal 408, e.g., an O-ring, may prevent leakage of gasor air flowing through hose 364, e.g., from the inside of sheath 410,into the space of bore 450 outside of sheath 410. Consequently, gas(e.g., air), may be pumped out of sheath 410 via hose 364, to create alow-pressure zone within sheath 410 relative to the ambient pressure.Additionally, vacuum seals 320 may engage with endoscope 380 to seal theinterior of sheath 410 (e.g., encasing the distal end of endoscope 380therein) from the exterior of sheath 410 (e.g., the space between sheath410 and bore 450). Sealing sheath 410 thus may facilitate in maintainingnegative pressure (e.g., relative to the ambient pressure) inside sheath410.

In some embodiments, the elongated tool is a scope having an opticalelement located in the distal end region. The term “scope” may refer toa medical instrument, such as an arthroscope, endoscope (as definedearlier), laparascope, stethoscope, or microscope, configure to enableexamination or observation. The term “optical element” may refer to acomponent through which light passes or is reflected, as describedabove. The scope may be configured with an optical element to enableexamination by viewing. The optical element may be disposed at thedistal end region of the scope, such that when the scope is insertedinto the bore, e.g., starting from the distal end region, the opticalelement may be immersed within the bore, e.g., in proximity to a plasmageneration zone associated with the bore. The optical element may thusbe exposed to a plasma cloud after activating the plasma generator. FIG.3A illustrates an exemplary implementation of a scope having an opticalelement located in the distal end region, consistent with disclosedembodiments. Optical element 392 may be configured with viewport 390located at the distal end of endoscope 380. When endoscope 380 isinserted distal-end-first into protecting shroud 310 a inside bore 450,viewport 390 with optical element 392 may be immersed within protectingshroud 310 a between cathode 330 and anode 340. Positioned thus, opticalelement 392, located at the distal end region of endoscope 380, may beexposed to a plasma cloud, e.g., produced by an electromagnetic fieldgenerated via a voltage potential between cathode 330 and anode.

In some embodiments, the at least one processor is configured tomaintain activation of the plasma generator for a period sufficient tocause an external surface of the optical element to become hydrophilic.The term “hydrophilic” may refer to a tendency or favorability of amolecule to be solvated by water. A hydrophilic compound may havethermodynamic properties that enable the compound to bond with watermolecules more readily than a compound that is not hydrophilic, e.g., ahydrophobic compound that does not readily bond with water (e.g., polar)molecules. An object that is hydrophilic may be wettable, enabling aliquid (e.g., water) to maintain contact with the object due tointermolecular interactions that balance adhesive and cohesive forcesbetween the liquid and the object. The plasma generator of FIGS. 5A, 5B,and 5C illustrate an exemplary implementation of a plasma generator inaccordance with disclosed embodiments. At least one processor 102 (FIG.1A) or controller 508 may maintain activation of plasma applicator 130or the plasma generator of FIGS. 5A, 5B, respectively, for a sufficientlength of time to cause the external surface of optical element 392 ofviewport 390 to become hydrophilic, such as prevent fog from forming onviewport 390 during an endoscopy procedure. According to some disclosedembodiments, the time period sufficient to cause optical element 392 tobecome hydrophilic may be less than a minute, less than 45 seconds, lessthan 30 seconds, or less than 15 seconds.

In some embodiments at least one processor is further configured tooutput a signal to a display indicating a status of a plasma generatortreatment. The term “display” may refer to an output device thatvisually presents information. A display may include one or more LEDs,e.g., configured with a screen, or light bulbs, dials, gauges, meters,or any other means for rendering data visually. FIGS. 5A and 11, takentogether, illustrate an exemplary embodiment of display 1102 in FIG. 11outputting a signal (e.g., “Warning”) indicating a status of a plasmagenerator treatment, consistent with disclosed embodiments. Controller508 (FIG. 5B) may output a signal to display 1102 indicating the statusof a plasma treatment by the plasma generator of FIGS. 5A-5C.

In some embodiments, at least one processor is further configured tocalculate a number of plasma treatments remaining before requiredmaintenance. The term “maintenance” may refer to fixing, repairing,restoring, or otherwise ensuring continued functionality. For example,required maintenance of a plasma generator may relate to any of:recharging a battery, replacing a power supply, replacing a seal,replacing or cleaning an electrical contact, replacing or cleaning afilter, refilling a gas canister, replacing a hose, fixing a wire, orperforming any other action affecting the plasma treatment by the plasmagenerator. At least one processor 102 (FIG. 1A) or controller 508 (FIG.5B) illustrate exemplary implementations of at least one processorconfigured to calculate a number of remaining plasma treatments beforemaintenance is required for the device, according to disclosedembodiments. For example, at least one processor 102 may monitor one ormore factors affecting subsequent plasma treatments by plasma applicator130, such as by recording the number of plasma treatments alreadyperformed, monitoring a state of power supply (e.g., battery) 530,monitoring the duration of the plasma treatments, monitoring an amountof gas remaining in the gas reservoir, monitoring the pressure withinthe plasma generation zone, monitoring a state (e.g., conductivity) ofcathode 330 and anode 340, monitoring the pressure maintained within thebore indicating a broken seal, and monitoring any other measure that mayaffect the plasma treatment by the plasma applicator. Based on the oneor more factors, at least one processor 102 may determine how many moretreatments may be performed by plasma applicator 130 before amaintenance is required. Controller 508 may similarly monitor one ormore factors affecting subsequent plasma treatments by plasma generatingsystem 500 to determine how many plasma treatments remain before amaintenance is required.

In some embodiments, at least one processor is further configured todetect a malfunction of at least one of the plasma generator or the atleast one vacuum pump and to output a malfunction indicator. The term“malfunction” may refer to an impairment or defect that negativelyaffects performance. The term “output a malfunction indicator” may referto indicating a malfunction via a user interface, such as visually(e.g., via a display screen, warning light, gauge, or dial), audibly(e.g., via a speaker emitting a beep), as a vibration produced using anERM, and the like. At least one processor 102 (FIG. 1A) and controller508 (FIG. 5B) illustrate exemplary implementations of at least oneprocessor configured to detect a malfunction of the plasma generator orvacuum pump and output a malfunction indicator, according to disclosedembodiments. For example, controller 508 may detect a malfunction ofplasma generating system 500 (e.g., by detecting insufficient powerstored in power supply 530, insufficient gas retained within the gasreservoir, an insufficiently low pressure within plasma generation zone502, a malfunctioning seal, a malfunctioning wire or electrical contact,an insufficient electromagnetic field generated in plasma generationzone 502, and any other factor affecting the performance of plasmagenerating system 500). Similarly, controller 508 may detect amalfunction of one or more of vacuum pumps 1000A, 1000B, 1000C, and1000D, e.g., by detecting insufficiently low pressure within plasmageneration zone 502 or detecting insufficient plasma-generating gasstreamed into plasma generation zone 502. Consequently, controller 508may output a malfunction indicator (e.g., “warning”) via display 1102(FIG. 11). In a similar manner, at least one processor 102 may detect amalfunction of plasma applicator 130 and any of vacuum pumps 1000A,1000B, 1000C, and 1000D, and output a malfunction indicator via display1102.

In some embodiments, at least one processor is further configured tooutput a warning signal when the optical element is insufficientlytreated to achieve a predetermined level of hydrophilicity. The term“predetermined level of hydrophilicity” may refer to a level ofhydrophilicity that enables a sufficient level of performance (e.g.,optical quality) when the elongated object is used for a procedure, suchas a medical procedure. For example, if the elongated tool is anendoscope, the predetermined level of hydrophilicity may correspond to alevel of hydrophilicity to allow sufficiently unobstructed viewing(e.g., due to fog) through the endoscope throughout the duration of acolonoscopy, e.g., 1 hour. However, if the elongated tool is a dentalmirror, the predetermined level of hydrophilicity may correspond to anunobstructed viewing via the mirror of several minutes. In someembodiments, the predetermined level of hydrophilicity may be stored inmemory corresponding to one or more system parameters needed to achievethe predetermined level of hydrophilicity. Such system parameters mayinclude time, temperature, pressure level, electromagnetic fieldparameters, gas type, gas level, battery level, and any other parameteraffect the plasma treatment. The at least one processor may identify theelongated tool, e.g., based on an RFID tag, and may retrieve the one ormore system parameters required to achieve the predetermined level ofhydrophilicity corresponding to the elongated tool. The at least oneprocessor may measure the one or more system parameters to determine ifthe optical element is insufficiently treated and output the warningsignal accordingly.

FIG. 11 illustrates an exemplary embodiment of display 1102 outputting awarning signal to indicate that an optical element, e.g., opticalelement 392 of FIG. 3A, is insufficiently treated to achieve apredetermined level of hydrophilicity. For example, at least oneprocessor 102 (FIG. 1A), or controller 508 (FIGS. 5A-5C) may retrievethe predetermined hydrophilicity level, e.g., from memory 108 afteridentifying the elongated tool based on an RFID tag, and determine thatthe plasma treatment applied to optical element 392 of endoscope 380 byplasma applicator 130 or the plasma generator of FIGS. 5A-5C is notsufficient to achieve the predetermined level of hydrophilicity, e.g.,based on the timing of the treatment, type of gas used, type of materialtreated, expected use, pressure level, electromagnetic field properties,or any other parameter affecting the plasma treatment.

In some embodiments, a warning signal is outputted if the opticalelement is insufficiently treated to achieve sufficient hydrophilicity.The term “sufficient hydrophilicity” may refer to a level ofhydrophilicity that enables a threshold optical quality for viewing,such as during a medical procedure. For example, if the elongated toolis an endoscope, sufficient hydrophilicity may correspond to enablingunobstructed viewing (e.g., due to fog) through a viewport of theendoscope throughout a colonoscopy procedure. As another example, if theelongated tool is configured for a procedure where the viewport of theelongated tool is to be immersed in air, such as a laparoscopicprocedure, sufficient hydrophilicity may correspond to enablingunobstructed viewing through the viewport throughout the procedure dueto fogging or condensation. FIGS. 5A, 5B, and 5C and 11, taken together,illustrate an exemplary embodiment of display 1102 outputting a warningsignal to indicate that an optical element, e.g., optical element 392 ofFIG. 3A, is insufficiently treated to achieve sufficient hydrophilicity,e.g., a level of hydrophilicity to enable viewing through opticalelement 392 when using endoscope 380 to perform a colonoscopy.

In some embodiments, the elongated tool includes a lens and at least oneprocessor is configured to activate the plasma generator for a periodsufficient to cause the lens to become super-hydrophilic. The term“lens” may refer to an optical element through which light istransmitted. The lens may be made of glass, plastic, or other crystalwith refraction properties. A lens may also include a protectivetransparent covering with minimal or no refractive properties. The term“super-hydrophilic” may refer to a very high level of hydrophilicity,for example sufficiently hydrophilic to substantially decrease a contactangle between a fluid and the surface of the object, e.g., so as toallow the fluid to coat the surface of the object as a substantiallyuniform (e.g., flat) layer. In some embodiments, after increasing thehydrophilicity of the object to the desired level, the contact anglebetween the fluid and the super-hydrophilic surface of the object may beless than about 5°, e.g., less than about 4°, less than about 3°, lessthan about 2°, less than about 1°, or may be about 0°, e.g., whenmeasured at 20° C. and atmospheric pressure. For example, the at leastone processor may detect insertion of the lens (or an element associatedwith the lens), and based on that detection, activate the plasmagenerator to expose the lens to plasma for a period that causes the lensto become super-hydrophilic. FIG. 3A illustrates an exemplary embodimentof an elongated tool (e.g., endoscope 380) including a lens (e.g.,optical element 392 of viewport 390). At least one processor 102 (FIG.1A) or controller 508 (FIG. 5B) may, on detecting optical element 392(e.g., via an RFID tag disposed with endoscope 380), activate plasmagenerator 130 or the plasma generator of FIGS. 5A-5C fora sufficientlylong period of time (e.g., between 15 seconds and 1 minute) to causeoptical element 392 to become super-hydrophilic.

In some embodiments, the time period sufficient to cause a surface ofthe optical element to become hydrophilic is a time period sufficient tocause the surface of the optical element to become super-hydrophilic.For example, when processor 102 (FIG. 1A) or controller 508 (FIG. 5B)activates plasma generator 130 or the plasma generator of FIGS. 5A-5C,respectively, to cause the surface of optical element 392 of endoscope380 to become hydrophilic, the surface of optical element 392 ofendoscope 380 may become super-hydrophilic. The processor may determinethat super-hydrophilicity is reached based on one or more of duration ofplasma exposure, pressure, temperature and identity of the object beingtreated.

In some embodiments, the plasma generator is configured for causing adielectric barrier discharge. The term “dielectric barrier discharge”may refer to the electrical discharge between two electrodes when theelectrodes are separated by an insulating dielectric barrier. FIGS.3A-3B illustrate a plasma generator that when activated, may cause adielectric barrier discharge, consistent with disclosed embodiments.Cathode 330 and anode 340 of plasma applicator 348 are separated bydielectric barrier 344. Generating an electric potential between cathode330 and anode 340, when separated by dielectric barrier 344, may causeor result in a dielectric barrier discharge. Cathode 330 separated fromanode 440 by dielectric barrier 444 of FIG. 3C illustrate anotherexemplary implementation of a plasma generator that when activated,results, and thereby causes, a dielectric barrier discharge, consistentwith disclosed embodiments.

In some embodiments, the at least one processor is configured to controlthe plasma generator in a manner causing a voltage drop of at least 1000volts. The term “voltage drop” may refer to the difference in voltage,or potential, between two electrodes, such as between a cathode andanode. At least one processor 102 (FIG. 1A) or controller 508 (FIG. 5B)illustrate exemplary implementations of at least one processorconfigured to control the plasma generator (e.g., plasma generators 130and the plasma generator of FIGS. 5A-5C, or plasma applicator 348). Forexample, the at least one processor may cause a voltage drop of at least1000 volts between cathode 330 and any one of anode 340 or anode 440 bymodifying, via circuitry 106 or 700, an electric signal provided tocathode 330 from power supply 530.

FIG. 17 is a block diagram of an example process 1700 for treating anelongated tool with plasma, consistent with embodiments of the presentdisclosure. While the block diagram may be described below in connectionwith certain implementation embodiments presented in other figures,those implementations are provided for illustrative purposes only, andare not intended to serve as a limitation on the block diagram. Asexamples of the process are described throughout this disclosure, thoseaspects are not repeated or are simply summarized in connection withFIG. 17. In some embodiments, the process 1700 may be performed by atleast one processor (e.g., at least one processor 102 of FIG. 1A orcontroller 508 of FIG. 5B) to perform operations or functions describedherein. In some embodiments, some aspects of the process 1700 may beimplemented as software (e.g., program codes or instructions) that arestored in a memory (e.g., memory 108) provided with the at least oneprocessor, or a non-transitory computer readable medium. In someembodiments, some aspects of the process 1700 may be implemented ashardware (e.g., a specific-purpose circuit). In some embodiments, theprocess 1700 may be implemented as a combination of software andhardware. Unless otherwise indicated, the sequence of the process blocksmay be arbitrary and the order for performing one or more process blocksmay be changed. Similarly, one or more process blocks may be omitted.

FIG. 17 includes process blocks 1702 to 1710. At block 1702, anelongated tool is detected within a bore of a housing, wherein theelongated tool includes an optical element on a distal end thereof.Detecting may involve determining, sensing, or identifying an elongatedtool within the bore. The detecting may further involve detecting theelongated tool within a sheath contained in the bore. For example,controller 508 (FIG. 5B) may identify that endoscope 380 (FIG. 3A) iswithin bore 502 of housing 510. Endoscope 380 may include opticalelement 392 configured with viewport 390 positioned at a distal end ofendoscope 380. When endoscope 380 is inserted into bore 502, opticalelement 392 may be located in plasma generation zone 504 of bore 502.The detecting may also involve determining that a protective sheath(e.g., 310 or 410) surrounding the elongated tool 380, is also withinthe bore 450.

At block 1704, upon detecting of the tool within the bore, a negativepressure is generated in at least a portion of the bore in a region ofthe optical element. The generation of a negative pressure may involveremoval or gas or air so that in at least some area of the bore (e.g.,an area within a sheath in the bore), the pressure is caused to besub-atmospheric. For example, upon detecting that endoscope 380 (FIG. 2)is inserted within bore 502 of housing 510 (FIG. 5A), controller 508 mayactivate one or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D(FIG. 10A). This may generate a negative pressure in plasma generationzone 504 of bore 502, e.g., in the region of optical element 392 ofendoscope 380.

At block 1706, a plasma generator is activated during a period of thenegative pressure to thereby expose the optical element to plasma for atime period sufficient to cause a surface of the optical element tobecome hydrophilic. The activation of the plasma generator may occur inany of the ways described earlier. For example, controller 508 (FIG. 5B)may activate the plasma generator of FIGS. 5A-5C during the period whenone or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A)cause a negative pressure inside plasma generation zone 504. This mayexpose optical element 392 of endoscope 380 to plasma for a time period(e.g., ranging from 15 seconds to 1 minute) to cause the surface ofoptical element 392 to become hydrophilic, thereby preventing anaccumulation of fog on optical element 392 during a subsequentendoscopy.

At block 1708, the generating of the negative pressure and theactivating of the plasma generator occur automatically in response todetecting that the elongated tool is within the bore. These automaticoccurrences may occur in any of the ways described earlier. For example,in response to detecting that endoscope 380 (FIG. 3A) is within cavity502 (FIG. 5A), controller 508 may automatically, e.g., withoutintervention external to system 500, activate one or more of vacuumpumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) to generate the negativepressure within cavity 502, and activate the plasma generator (e.g.,plasma generator of FIGS. 5A-5C).

At block 1710, the distal end region of the elongated tool is exposed toplasma within the sheath, wherein the bore is configured to receive asheath therein, the sheath being sized to receive the elongated tool.The foregoing can occur in any of the manners described earlier. Forexample, sheath 410 (FIG. 3C) may be sized to receive (e.g.,accommodate) endoscope 380. Additionally, bore 350 may be configured toreceive sheath 410 therein, such as by being sized to accommodate sheath410 and by being configured to electrically couple cathode 330 of sheath410 with power supply 530, e.g., via cathode contactor 352 and electricconductor 354. Electrically coupling cathode 330 of sheath 410 thus mayallow generating an electromagnetic field within sheath 410 to generateplasma in proximity to the distal end region (e.g., optical element 392)of endoscope 380. This may allow exposing the distal end region ofendoscope 380 to plasma within sheath 410.

At block 1712, a warning signal is outputted if the optical element isinsufficiently treated to achieve sufficient hydrophilicity. The warningsignal and the insufficiency determination may occur in any of the waysdescribed earlier. For example, controller 508 (FIG. 5B) may determine atool type corresponding to optical element 392 of endoscope 380 (FIG.3C), such as via an RFID tag or camera provided with sheath 410.Controller 508 may obtain one or more parameters, e.g., from memory 108(FIG. 1A) for performing a treatment to achieve sufficienthydrophilicity for optical element 392. For example, the one or moreparameters may relate to an amount of power available via power supply530, a level of negative pressure generated by any of vacuum pumps1000A, 1000B, 1000C, and 1000D (FIG. 10A), a type of gas streamed intoplasma generating zone 504, a pressure of gas or air within plasmagenerating zone 504, properties of the electromagnetic field generatedbetween cathode 330 and any of anode 340 or 440, a timing parameter, atemperature parameter, and any other parameter affecting plasmatreatment by system 100 or 500. Controller 508 may obtain one or moremeasurements relating to the plasma treatment applied to optical element392 (e.g., via one or more sensors), and determine, based on the one ormore measurements and the one or more parameters, that thehydrophilicity of optical element 392 is insufficient. Controller 508may thus output a warning, such as via display 1102 (FIG. 11).

Some disclosed embodiments involve inhibiting condensation distortion onan optical element of a medical instrument configured for insertion intoa body cavity. Condensation may include moisture, dampness, wetness,beading, or any other manifestation of water or other fluid collectingon a surface. For example, condensation may include the formation ofwater droplets on a surface, such as glass. Condensation distortion mayinclude an exaggeration, blurring, misrepresentation, contortion, or anyother change, caused by condensation, that makes something appeardifferent from an actual appearance. For example, condensationdistortion may include a foggy image visualized through a glass surfacewhen the glass surface is covered with water droplets. In surgicalprocedures, condensation distortion poses various problems, includinglens fogging, which limits clear visualization during such procedures.Thus, it is desirable to inhibit condensation distortion. Inhibitingcondensation distortion may include constraining, curbing, discouraging,hindering, obstructing, suppressing, preventing, minimizing, or anyother manner of restraining condensation distortion. For example,inhibiting condensation distortion on a glass surface may includereducing fogging on the surface by limiting the number or size of waterdroplets that accumulate on the surface. Some disclosed embodimentsinvolve the use of a device. A device may include any individual orcombination of one or more of an accessory, apparatus, appliance,equipment, machine, mechanism, or arrangement configured to achieve anyof the functions disclosed herein.

An optical element may include a lens, prism, mirror, or any other partof an optical instrument which either reflects light or permits thepassage of light. It may be desirable to inhibit condensation distortionon an optical element because the characteristics of light passingthrough an optical element may be distorted by water collected on asurface of the optical element. For example, an optical element mayinclude a lens of medical instrument, such as an endoscope. A medicalinstrument may include a scope, catheter, tube, or any other device usedon the inner or outer part of the body for diagnosis or treatment of amedical condition. A body cavity may include a peritoneum, dorsalcavity, back body cavity, cranial cavity, spinal cavity, ventral cavity,thoracic cavity, abdominopelvic cavity, abdominal cavity, pelvic cavity,bowel, stomach, esophagus, lung, blood vessel, organ, or any other spaceor compartment in a body. In some examples, a body cavity may include aspace housing multiple organs, such as a thoracic cavity. In otherexamples, a body cavity may include a single organ, such as a heart. Inyet other examples, a body cavity may include a blood vessel, such as anaorta. Insertion into a body cavity may include introducing, injecting,entering, embedding, implanting, or any other manner of placement into abody cavity. In one example, insertion into a body cavity may includeintroducing an endoscope into a blood vessel by guiding the endoscopeinto the blood vessel.

Some disclosed embodiments involve a housing. A housing may include anysupporting structure, frame, cage, enclosure, encompassment capable ofaccommodating any component of any devices or methods disclosed herein.The housing may be made of any suitable material, such as plastic,metal, glass, wood, or any other material capable of encasing a plasmageneration device. In some embodiments, the housing may include one ormore insulating materials to insulate a plasma generation device encasedtherein from one or more environmental conditions, such as an electricand/or electromagnetic field, light, humidity, temperature, impact,mechanical and/or acoustic vibrations, and any other environmentalattribute that may affect the generation of plasma by the plasmagenerating device.

Some disclosed embodiments involve a cavity within the housing, thecavity being sized to removably retain at least a portion of the medicalinstrument therein, wherein the portion includes the optical element. Acavity may include a chamber, depression, hap, hole, pocket, bore,sinus, socket, or any other type of empty space within the housing.Removably retaining at least a portion of the medical instrument withinthe housing may include containing, keeping, maintaining, detaining,collecting, reserving, or in any other way holding any piece, section,segment, component, element, factor, unit, or any other part of thewhole medical instrument within the housing. The portion including theoptical element may include an entirety of the portion including theoptical element or a part of the portion including the optical element.For example, the cavity may include a bore formed within the housing,and the portion of the medical instrument may include a distal end of anendoscope including a lens that is configured to slide in and out of thebore.

Some disclosed embodiments involve a plasma activation zone within thecavity and arranged such that when the at least a portion of the medicalinstrument is retained within the cavity, the optical element is locatedwithin the plasma activation zone. A plasma activation zone may includea physical volume or space in which a plasma cloud may be formed, e.g.,by igniting a gas introduced therein. The plasma activation zone may beof any size. For example, the plasma activation zone may be less than 15cm³, less than 10 cm³, less than 5 cm³, less than 3 cm³, less than 2cm³, or less than 1.4 cm³. In some examples, an electromagnetic fieldmay be generated within the plasma activation zone, such that exposing agas to the electromagnetic field ignites the gas to generate plasma. Theterm “plasma” may refer to a state of matter containing an abundance ofcharged particles, e.g., electrons and ions. Consequently, plasma may behighly electrically conductive and sensitive to electric and/orelectromagnetic fields. In some examples, the plasma is cold plasma,i.e., the plasma contains electrons which have much higher energy thanions. Cold plasma may be especially advantageous in applicationsinvolving frequent use of medical devices which may be sensitive toharsh treatment. It may be desirable to expose the optical surface toplasma in order to improve the hydrophilicity of the optical element.Specifically, during a hydrophilic treatment, a surface undergoesoxidation and the bombarding plasma ions form hydroxyl groups on thesurface. These hydroxyl groups are polar, and since water is polar, itis attracted to the hydroxyl groups.

Ultimately, this is what enhances the surface's wettability andadhesion, which in turn makes it more hydrophilic.

Some disclosed embodiments involve a plasma generator configured to beactivated to cause formation of a plasma cloud in the plasma activationzone in a vicinity of the optical element. A plasma generator mayinclude a device configured to generate plasma, e.g., inside a plasmaactivation zone. In some examples, plasma is formed inside a plasmagenerator by creating a vacuum inside a chamber. In some embodiments, asmall amount of gas may be channeled into the chamber and changes phasesfrom gas to plasma when its molecules become ionized. Inside the chamberof a plasma generator, surfaces get bombarded by plasma ions modifyingthe surface on a very small scale. These plasma processes may change thesurface by enhancing their adhesion capabilities, such as making thesurface hydrophilic or even super-hydrophilic. In other examples, theplasma may be created within a nozzle and then expelled out in a streamof compressed air. A plasma cloud may include any volume of plasmacreated by the plasma generator. The plasma generator may causeformation of the plasma cloud in the plasma activation zone through anymanner of creating or activating plasma, including arc discharge, orcorona discharge.

In some embodiments, the plasma generator causes formation of the plasmacloud through Dielectric Barrier Discharge. Dielectric barrier dischargeoccurs between two electrodes separated by a dielectric. Due to thepresence of the dielectric barrier, such plasma sources may operate withsine-wave or pulsed high voltages. The discharge may consist of multiplemicro-discharges, although in some cases uniform discharges may becreated as well. To increase the uniformity and the discharge gap, apre-ionization system may be used. In a Dielectric Barrier Dischargeembodiment, air (as opposed to another gas stream) may serve as a basisfor plasma formation. A vicinity of the optical element may include arange within the optical element, an environment of the optical element,or any area near or surrounding the optical element. In one example, aplasma cloud in the vicinity of the optical element may include a plasmacloud surrounding the optical element. In another example, a plasmacloud in the vicinity of the optical element may include a plasma cloudnear one portion of the optical element.

Some disclosed embodiments include a controller configured to activatethe plasma generator for a time period sufficient to cause the opticalelement to become hydrophilic prior to insertion into the body cavity. Acontroller may be configured to enable a user of device to operate andcontrol the device in order to activate the plasma generator. Thecontroller may thus include one or more command switches and one or morecontrollers, such as physical or virtual switches, buttons andcontrollers. The controller may further include indicators for providinga user with required data and information for operating the device, suchas indication LEDs, displays and possibly an operating softwareexecutable by at least one processor for providing a user with operatingand command screens to allow a user to operate and command the device inorder to activate the plasma generator. The controller (e.g., at leastone processor) may include electric circuitry for performing logicaloperations on an input signal. For example, the controller may includeone or more integrated circuits (ICs), including ASICs, microchips,microcontrollers, microprocessors, all or part of a CPU, GPU, APU, DSP,FPGA, or other circuits suitable for executing computing instructionsand/or capable of performing logical operations, e.g., based on acomputing instruction or an input signal. Instructions executed bycontroller may be pre-loaded into a memory integrated with or embeddedinto a processor or may be stored in a separate memory. The memory maycomprise a RAM, a cache memory, a ROM, a hard disk, an optical disk, amagnetic medium, a flash memory, other permanent, fixed, or volatilememory, or any other mechanism capable of storing such instructions. Thememory may additionally store data, which may include one or more inputsfor executing the one or more program code instructions, and one or moreoutputs produced by executing the one or more program code instructions.In some embodiments, the controller may include multiple processors.Each processor may have a similar construction, or differentconstructions that may be electrically connected or disconnected fromeach other. The processors may be separate circuits or integrated in asingle circuit. Multiple processors may be configured to operateindependently or collaboratively. The processors may be coupledelectrically, magnetically, optically, acoustically, mechanically or byother means that permit them to interact. The processors may be physicaland/or virtual (i.e., software-based).

FIGS. 5A-5C illustrate three views of a plasma generating system 500, inaccordance with some embodiments of the present disclosure. Asillustrated in the figure, plasma generating system 500 may include ahousing 510 having, a cavity 502 and accommodating, a plasma activationzone 504, a plasma generator 506, and a controller 508. Plasmagenerating system 500 may include a plasma activation zone 504 withinthe cavity 502, and arranged such that when at least a portion of amedical instrument having an optical element (e.g., an endoscope havinga viewport) is retained within the cavity 502, the optical element islocated within the plasma plasma-activation activation zone 504. Plasmagenerator 506 may generate plasma for treating an object (e.g., amedical instrument) within plasma activation zone 504 in accordance withembodiments disclosed herein. Cavity 502 may provide access to plasmaactivation zone 504, e.g., to enable inserting an object into plasmaactivation zone 504 for carrying out a plasma treatment to increase thehydrophilicity of the object. Controller 508 may control one or moreaspects of plasma generator 506, such as the influx and/or outflow ofgas into plasma activation zone 504 for the purpose of generatingplasma, the generation of an electric and/or electromagnetic field forgenerating plasma, and any other parameter relevant to the generation ofplasma via plasma generator 506. Plasma generating system 500 mayfurther include one or more sensors, such as a pressure sensor, avoltage sensor 514 and a plasma frequency sensor 512.

A time period sufficient to cause the optical element to becomehydrophilic prior to insertion into the body cavity may include anyamount of time required for a desired level of hydrophilicity of theoptical element to occur for any desired procedure associated with theoptical element. In some examples, a time period sufficient to cause theoptical element to become hydrophilic prior to insertion into the bodycavity may be less than a minute, less than 45 seconds, less than 30seconds, or less than 15 seconds.

In some embodiments, the medical instrument includes a scope having anelongated shaft, the cavity includes an elongated channel for receivingthe elongated shaft, and the plasma activation zone is located proximatea distal end of the elongated channel. A scope may include anyinstrument, as described in greater detail herein, for viewing orexamining any part of a body. An elongated shaft may include any long,narrow part or section of the scope. An elongated channel may includeany open or closed passage. In some examples, the elongated channel maybe tubular. A distal end of the elongated channel may include any sitelocated away from a specific area of the elongated channel, includingthe center of the elongated channel. In some examples, a distal end mayinclude parts of the elongated channel further away from the center ofthe elongated channel. In some examples, a distal end of the elongatedchannel may include either end of the elongated channel.

In some embodiments, the scope includes a laparoscope or an endoscope.As used herein, “endoscope” may include any scope that has a distal endconfigured to be inserted into a patient's body, and a proximal endconfigured to remain outside the patient's body during the procedure. Insome embodiments, the optical element includes a lens element on adistal end of the elongated shaft. A lens element may include anytransmissive optical device which focuses or disperses a light beam bymeans of refraction. A lens element may consist of a single piece oftransparent material, or several lenses, usually arranged along a commonaxis. A lens element may be made from materials such as glass orplastic. Typically, the distal end includes a viewport such as a lens ora window or a bare end of an optical fiber or even a mirror (such as adentist mirror for example). Through the viewport, the scope enablescollecting an image of the surrounding of the viewport, e.g., using alight-sensitive device such as a CCD. The viewport may be aimed tocollect light from in front of the device (namely from a regioncoinciding with the longitudinal axis of the device), or the viewportmay be slanted in an angle relative to the longitudinal axis or may befacing perpendicular to the longitudinal axis of the device (as isdemonstrated for example in colonoscopies). The proximal end typicallyincludes or is connected to a handle to be held by a medicalpractitioner, possibly including user interface components such asswitches, navigating sticks, touch screens and touch pads. Endoscopesinclude a vast range of scopes, for example bronchoscopes, colonoscopes,cystoscopes and laparoscopes. A laparoscope—as a specificexample—includes a rigid or relatively rigid rod or shaft having aviewport, possibly including an objective lens, at the distal end, andan eyepiece and/or an integrated visual display at the proximal end. Thescope may also be connected to a remote visual display device or a videocamera to record surgical procedures.

In some embodiments, the elongated channel is sized to receive a sheathsurrounding a portion of the elongated shaft including the opticalelement. A sheath may include any covering or supporting structure thatfits around an object. For example, the sheath may enclose an opticalelement of a medical instrument. In one exemplary embodiment, the sheathmay be a slender, flexible, disposable tube that retains within thesheath a portion of the medical instrument when the medical instrumentis inserted into the plasma activation zone. The term “sized to receivethe sheath” may refer to formed, constructed, or shaped to accommodatean object having dimensions corresponding to the sheath. The elongatedmay thus be formed to enable inserting the sheath therein.

In some embodiments, the sheath is formed of a dielectric material. Adielectric material may include any electrical insulator that can bepolarized by an applied electric field. A dielectric material mayinclude glass, quartz, ceramics, or polymers. The dielectric material beof any thickness required to achieve a desired dielectric effect. Insome examples, a dielectric material may make up the entirety of thesheath. In other examples, a dielectric material may make up only aportion of the sheath.

In some embodiments, the housing is configured such that the sheathsurrounds the optical element when the optical element is in the plasmaactivation zone. The sheath surrounding the optical element when theoptical element is in the plasma activation zone may include the sheathenclosing, encircling, encompassing, or in any other way being locatedat any of the surroundings of the optical element when the opticalelement is in the plasma activation zone. In some examples, the sheathmay surround the entirety of the optical element when the opticalelement is in the plasma activation zone. In other examples, the sheathmay surround only a portion of the optical element when the opticalelement is in the plasma activation zone.

In some embodiments, the device is further configured to cause theplasma cloud to occur within the sheath. Causing the plasma cloud tooccur within the sheath may include causing the generation, activation,extension, or any form of presence of the plasma cloud within thesheath. In some examples, the plasma cloud may be generated within thesheath. In other examples, the plasma cloud may be generated outside ofthe sheath and then transported within the sheath. In some examples, theentirety of the plasma cloud may occur within the sheath. In otherexamples, only a portion of the plasma cloud may occur within thesheath.

In some embodiments, the cavity is configured to receive a sheath havinga sheath electrode therein and having an external electrical contact,and wherein the cavity includes an internal contact configured to forman electrical connection with the external contact when the sheath islocated within the cavity, to thereby enable a supply of energy to thesheath electrode. A sheath may include any covering or supportingstructure that fits around an object, as mentioned earlier. A sheathelectrode may include any electrical conductor used to make anelectrical connection. For example, the electrical connection may bewith a nonmetallic part of a circuit that is associated with the sheath.An electrical contact may include any electrical circuit componenthaving an electrically conductive section (e.g., made from metal orsemiconductor) that allows an electrical current to pass through whenthe electrical contact is electrically coupled to (e.g., physicallytouches or enables circuity completion without physically touching)another electrical circuit component. An external electrical contact mayinclude any electrical contact that may be located on an outer surfaceof the sheath. An internal contact may include any electrical contactthat may be located on an inner surface of the cavity. An electricalconnection may include any structure that allows electricity to flowthrough it. A supply of energy may include any source of electricalenergy, such as a battery. Creating an electrical connection between theinternal contact of the cavity and the external contact of the sheathmay allow passage of an electric current from an external power supplyinto the interior of the sheath, for example for the purpose ofgenerating an electromagnetic field within the sheath to generateplasma.

In some embodiments, at least a partial vacuum is established in aregion containing the plasma activation zone. A vacuum (referred tosynonymously herein as at least a partial vacuum) may include any regionhaving a gaseous pressure that is substantially lower than atmosphericor ambient pressure. In some examples, a vacuum includes any free spacesufficiently devoid of particle obstruction to enable formation ofplasma.

Some embodiments involve at least one pump configured to establish atleast a partial vacuum within the sheath in an area of the sheathelectrode. A pump configured to establish at least a partial vacuumwithin the sheath in an area of the sheath electrode may include anydevice that draws or suctions particles from a sealed volume in order tocause sub-ambient pressure in the volume. In some examples, the pump mayestablish at least a partial vacuum by exerting a negative pressurebetween 0.1 atm and about 0.01 atm. An area of the sheath electrode mayinclude any region within a desired range of the sheath electrode. Insome examples, the pump may establish a partial vacuum within the sheathdirectly on the sheath electrode. In other examples, the pump mayestablish a partial vacuum within the sheath electrode at a smalldistance away from the sheath electrode.

In some embodiments, the housing includes a housing electrode therein. Ahousing electrode may include any electrical conductor used to makeelectrical connection with another part of the circuit. For example, itmay contact or otherwise electrically connect with a metallic ornonmetallic part of a circuit that is associated with the sheath. Thehousing electrode may be positioned at any location on the housing. Insome examples, the housing electrode may be connected to the housing. Inother examples, the housing electrode may be incorporated into either aninterior or an exterior of the body of the housing.

In some embodiments, the housing electrode is configured to form anelectrical circuit with the sheath electrode when the sheath is insertedin the elongated channel. An electrical circuit may include any closedloop network which provides a return path for the flow of current. Insome examples, the housing electrode may form an electrical circuit withthe sheath electrode when the entirety of the sheath is inserted in theelongated channel. In other examples, the housing electrode may form anelectrical circuit with the sheath electrode when a portion of thesheath is inserted in the elongated channel. In certain examples,partial contact between the sheath electrode and the housing electrodemay be sufficient to form an electrical circuit. In other examples, thesheath electrode and the housing electrode may be spaced apart and theclosed loop may occur when current passes through a gap between thehousing electrode and the sheath electrode. Such a gap may coincide, atleast partially with the plasma generation zone.

Some embodiments further involve a circuit for electrically transferringpower to the sheath electrode. A circuit may include any closed loopnetwork which provides a return path for the flow of current, asdescribed herein. Electrically transferring power to the sheathelectrode may include any manner of providing power to the sheathelectrode from a power supply, such as a battery. For example, creatingan electrical connection between the internal contact of the cavity andthe external contact of the sheath may allow passage of an electriccurrent from a battery into the interior of the sheath, therebytransferring power from the battery to the sheath electrode. Asmentioned previously, a closed loop includes loops where gaps existbetween electrodes, so long as current may flow through the gap, such asoccurs when plasma is formed in the gap.

In some embodiments, at least one pump includes a plurality ofinterconnected pumps. A plurality of interconnected pumps may includetwo or more pumps, as described herein, that are connected to oneanother. In some instances, it may be desirable to use a plurality ofinterconnected pumps instead of a single pump, in order to achieve ahigher vacuum level than the vacuum level possible using a single pump.In other instances, it may be desirable to use a plurality ofinterconnected pumps instead of a single pump, in order to reduce theload or strain on a single pump. In yet other instances, it may bedesirable to use a plurality of interconnected pumps instead of a singlepump, in order to provide a back-up source of negative pressure, in caseone of the pumps fails during plasma generation. For example, the atleast one pump may include two interconnected pumps. In the case of thefailure of the first pump, the second pump may be activated to continueplasma generation without significant interruption.

In some embodiments, the plasma cloud is maintained for a time periodsufficient to cause the optical element to become super-hydrophilicprior to insertion into the body cavity. The term “super-hydrophilic”may refer to a very high level of hydrophilicity, for examplesufficiently hydrophilic to substantially decrease a contact anglebetween a fluid and the surface of the object, e.g., so as to allow thefluid to coat the surface of the object as a substantially uniform(e.g., flat) layer. In some embodiments, after increasing thehydrophilicity of the object to the desired level, the contact anglebetween the fluid and the super-hydrophilic surface of the object may beless than about 10° or less than 5°, e.g., less than about 4°, less thanabout 3°, less than about 2°, less than about 1°, or may be about 0°,e.g., when measured at 20° C. and atmospheric pressure. A time periodsufficient to cause the optical element to become super-hydrophilicprior to insertion into the body cavity may include any amount of timerequired for a desired level of super-hydrophilicity of the opticalelement to occur for any desired procedure associated with the opticalelement. In some examples, a time period sufficient to cause the opticalelement to become super-hydrophilic prior to insertion into the bodycavity may be less than a minute, less than 45 seconds, less than 30seconds, or less than 15 seconds.

In some embodiments, the controller activates the plasma generator for atime period sufficient to cause the optical element to becomesuper-hydrophilic prior to insertion into the body cavity. The term“activate” may refer to triggering, turning or switching on (e.g., byemitting an electric signal), or performing any other action thatinitiates the generation of plasma by the plasma generator, e.g., byinitiating the generation of an electric and/or electromagnetic field bythe plasma generator capable of igniting plasma within the cavity. Thecontroller may activate the plasma generator for a time periodsufficient to cause the optical element to become super-hydrophilicprior to insertion into the body cavity either automatically or uponinput by a user of the device. In one example, the controller mayautomatically activate the plasma generator for 30 seconds upon acertain threshold condition being met. In another example, thecontroller may activate the plasma generator for 45 seconds in responseto user input in the form of the user pressing of a button on thecontroller.

Disclosed embodiments may involve methods for inhibiting condensationdistortion on an optical element of a medical instrument configured forinsertion into a body cavity. FIG. 18 illustrates an exemplary method1800 for inhibiting condensation distortion on an optical element of amedical instrument configured for insertion into a body cavity,consistent with some embodiments of the present disclosure. As shown instep 1810, the method 1800 may involve removably inserting, within acavity, at least a portion of the medical instrument, wherein theportion includes an optical element. The method 1800 may also involvelocating the optical element within a plasma activation zone inside thecavity, when the at least a portion of the medical instrument isretained within the cavity, as shown in step 1812. Step 1814 shows thatthe method 1800 may also involve generating plasma to cause formation ofa plasma cloud in the plasma activation zone in a vicinity of theoptical element. Step 1816 shows that the method 1800 may furtherinvolve maintaining the plasma cloud for a time period sufficient tocause the optical element to become hydrophilic. Method 1800 mayadditionally involve inserting the hydrophilic optical element in a bodycavity, as shown in step 1818.

As noted, a Dielectric Barrier Discharge (DBD) mode of operation mayprovide one or more advantages, such as ensuring uniformity of anelectric and/or electromagnetic field during plasma treatment in thevicinity of a view port thereby enhancing plasma treatment quality. Thismay be useful for treating optical surfaces where a high level ofhydrophilicity may be desirable. Systems and methods are describedherein below that may provide a plasma treatment in a DBD mode ofoperation. Moreover, when, in some embodiments, air plasma may be usedin a DBD mode, the DBD mode of operation described herein below maysimplify the plasma generator, for example by avoiding the need forcostly gas cannisters requiring periodic refilling or replacement.

Some embodiments involve inhibiting condensation distortion on anoptical element. The term “inhibiting” may refer to curbing, impeding,limiting, or otherwise hindering an event from occurring. The term“distortion” may refer to an altered, skewed, or otherwise impreciserepresentation. The term “optical element” may refer to any component ofan optical system designed to manipulate light, such as a window or alens, a mirror reflecting light, or viewport (e.g., of a medical scope).The optical element may be made of material such as glass, quartz, orplastic such as Perspex allowing some or most visible light to passthrough. In some embodiments, the optical element may be made of areflective or semi-reflective material such as metal or a semiconductor.Moisture may accumulate as droplets on the surface of the opticalelement (e.g., as condensation or fog), causing an object viewed via theoptical element to appear different (e.g., distorted) compared with howthe object would appear if viewed via the optical element withoutcondensation accumulated thereon. Some disclosed embodiments may hinderan accumulation of droplets on the optical element by providing a plasmatreatment that achieves a relatively high level of hydrophilicity toimmunize the optical element against fogging, or to significantly reducefogging that might otherwise occur in an absence of a plasma treatment.In other words, by applying the plasma treatment to the optical element,condensation distortion may be inhibited when using the optical element,for example during a medical procedure. Plasma applicator 130 of FIG. 1Aillustrates an exemplary implementation of a device for inhibitingcondensation distortion on an optical element. Plasma applicator 130 mayimmunize viewport 222 of medical device 200 against fogging (or at leastsignificantly reduce fogging) by exposing viewport 222 to plasma. Theexposure to plasma may increase the hydrophilicity of viewport 222 toprevent or limit droplets from accumulating thereon. In other words,plasma applicator 130 may inhibit condensation distortion of viewport22.

Some embodiments involve a chamber within the housing. The term“chamber” may refer to a slot, cavity, crevice, or pit capable ofcontaining an object. The chamber within the plasma-generation zone maybe sized to accommodate at least a portion of an object inside theplasma-generation zone together with a plasma cloud (e.g., generated byigniting a gas streamed therein), thereby exposing the at least portionof the object to the plasma cloud. For example, the chamber mayaccommodate a viewport of an endoscope within the plasma-generationzone, to expose the viewport to a plasma cloud generated inside theplasma activation zone after a gas has been ignited. Consequently, thehydrophilicity of the viewport may increase to limit or prevent fog fromforming when the viewport is subsequently inserted into a body.According to some embodiments, a protecting shroud may form a chamber,and the insertion of an object into the protecting shroud may seal theinside of the protecting shroud containing the object, thereby defininga closed plasma chamber therein. For example, slot 132 exposing anopening on the external surface of plasma applicator 130 of FIG. 1A mayillustrate an exemplary implementation of a chamber (i.e., slot) withinthe housing (i.e., external surface) of a device inhibiting condensationdistortion on an optical element, consistent with disclosed embodiments.While, in some embodiments a removable shroud may serve as a chamber, inother embodiments, the shroud may be omitted, and the slot or concavityin the housing may itself constitute a chamber.

According to some embodiments, the chamber is configured to receive anelongated tool with the optical element proximate a distal end of theelongated tool. The term “elongated tool” may refer to an object havinga length that is substantially longer that the width of the object.Examples of elongated tools, include cannulas, probes, or tubes for usein medical procedure. Thus, the optical element undergoing the plasmatreatment may be positioned towards a distal end of an elongated tool,such as an optical element integrated with a camera positioned thedistal end of an endoscope, or a dental mirror positioned at the distalend of a handle. The chamber may have an elongated shape to accommodatethe elongated tool. The surface of the housing may include a slot oropening, exposing an entrance into the elongated chamber. The slot oropening may enable insertion of the elongated tool within the chamber.For example, FIG. 3A illustrates an exemplary implementation of achamber configured to receive an elongated tool with the optical elementproximal proximate to a distal end of the elongated tool, consistentwith disclosed embodiments. Endoscope 380 (e.g., an elongated tool) maybe provided with viewport 390 (e.g., an optical element) having externalsurface 392 (FIG. 2). Viewport 390 may be positioned proximate to thedistal end of endoscope 380. Slot 350 may expose an entrance into thechamber (e.g. or may form at least a portion of the chamber) and may beconfigured with an elongated shape to allow placing the distal end ofendoscope 380 with viewport 390 affixed thereto into the chamber.

Some embodiments involve electrical circuitry in the housing . Theelectric circuity may include one or more electronic components, such aswires, virtual and/or physical switches, and/or controllers configuredto electrically associate a plasma generating field applicator with anelectric power source used to supply electric power. The circuitry mayadditionally be facilitated by one or more software instructions forcontrolling the device. In other words, the term “electric circuitry”may include any combination of electronic componentry (e.g., conductors,memory units, switches, gates, wires, and/or other electroniccomponentry) for conveying electrical energy or signals. Depending onthe embodiment, the electrical circuitry may facilitate performance ofone or more operations (e.g., logical and/or arithmetic operations) inresponse to receiving an electric signal (e.g., from a processoroperating as a controller) as an input. The circuity may couple anenergy source, e.g., a power supply, generator, battery, or rechargeablebattery, to the plasma generation device to enable the ignition of thegas for the purpose of converting the gas to a plasma cloud. The energysource may be external to the plasma generation device, e.g., from awall outlet via a cable. In some embodiments the operational unit may beenergized by an internal energy source such as a battery, e.g., arechargeable battery. The circuitry may control one or more aspects ofthe energy delivered by the energy source, such as the magnitude,intensity, frequency, phase, timing, polarity, as well as a voltageassociated with the energy, a current associated with the energy, andany other attributes characterizing the energy. The circuitry may adaptthe energy according to the requirements of the plasma generationdevice, e.g., for igniting a gas to generate a plasma cloud for carryingout the plasma treatment. The circuitry may thus include one or moreintegrated circuits (ICs), including application-specific integratedcircuits (ASICs), microchips, microcontrollers, microprocessors, all orpart of a central processing unit (CPU), graphics processing unit (GPU),accelerated processing unit (APU), digital signal processor (DSP),field-programmable gate array (FPGA), or other circuits suitable forexecuting computing instructions and/or capable of performing logicaloperations, e.g., based on a computing instruction or an input signal.The circuitry may further include one or more memory units, such asRandom-Access Memory (RAM), a cache memory, a Read-Only Memory (ROM), ahard disk, an optical disk, a magnetic medium, a flash memory, otherpermanent, fixed, or volatile memory, or any other mechanism capable ofstoring data and/or computing instructions for performing a logicaloperation. The circuitry may further include one or more communicationchannels coupling the one or more ICs to the memory, thereby enablingthe one or more ICs to receive a computing instruction and/or datastored thereon required to perform a corresponding logical operation forcontrolling energy delivered to the plasma generation device. Thecommunication channels coupling the one or more ICs to the memory mayinclude wired channels, such as one or more cables, fibers, wires,buses, and any other mechanically coupled communication channel. Thecommunication channels may additionally or alternatively includewireless channels such as short, medium, and long-wave radiocommunication channels (e.g., Wi-Fi, Bluetooth, Zigbee, cellular,satellite), optical, and acoustic communication channels.

In some embodiments a plasma activation region is associated with thechamber. The term “plasma activation region” may refer to a physicalvolume, space, or zone where plasma may be generated. In someembodiments, the region may be an electrically isolated space or volumewithin the chamber conducive to generation plasma in a DBD mode. Theelectrically isolated region may be realized by a dielectric layer,thereby associating the region with the chamber. For example, turning toFIGS. 3A-3B, vicinity 322 around viewport 390 illustrates an exemplaryimplementation of a plasma activation region associated with thechamber, consistent with disclosed embodiments. Vicinity 322 is locatedinside (e.g., associated with) protecting shroud 310 a (e.g., achamber). Disk 344 may form a dielectric barrier interrupting aline-of-sight between anode 340 and cathode 330, electrically isolatinganode 340 from gas flowing into vicinity 322. Vicinity 322 is thus aplasma activation region associated with the chamber.

Some embodiments involve the plasma activation region associated withthe chamber and being configured to retain the optical element in amanner exposing an optical surface of the optical element thereof to theplasma activation region. The term “retain” may refer to contain, house,hold, or otherwise position in place. For example, the optical element(e.g., viewport) may be housed (e.g., retained) inside the closedchamber where a plasma-generating electromagnetic field is applied. Theterm “exposing” may refer to revealing, uncovering, causing acoincidence, or otherwise baring an object such that the objectinterfaces with the surrounding environment, e.g., a plasm cloud. Theterm “optical surface” may refer to an exterior or outer portion of anoptical element, such as the surface of the viewport of a medicalinstrument, or a surface of a lens, mirror, or pane. Thus, the viewportsurface (e.g., optical surface) may be housed (e.g., retained) within achamber where a plasma-generating electromagnetic field is applied,thereby exposing the viewport surface to the plasma activation region.For example, turning to FIGS. 3A-3B, viewport 390 (e.g., an opticalelement) of endoscope 380 may be housed (e.g., retained) in vicinity 322(e.g., a plasma activation region), thereby exposing surface 392 (e.g.,an optical surface) of viewport 390 to the plasma activation region ofprotecting shroud 310 a.

According to some embodiments, the optical element includes a lens, andthe optical surface is a surface of the lens. The term “lens” mayinclude one or more optical components capable of transmitting,focusing, refracting, dispersing, filtering, magnifying, miniaturizing,or otherwise manipulating the transmission of light waves therethrough.For example, an endoscope may be provided with one or more lenses tocollect and focus lights waves for capturing images during an endoscopy.To prevent the surface of the lens from fogging up during an endoscopy,the surface lens of the endoscope may be treated with plasma using thetechniques described herein. Surface 222 of viewport 220 of FIG. 1Aillustrates an exemplary implementation of an optical surface of a lens,consistent with disclosed embodiments. Surface 222 may be treated withplasma according to any of the techniques described herein to increasethe hydrophilicity of surface 222 and prevent fogging when usingviewport 222, e.g., for a medical procedure.

Some embodiments involve wherein the plasma-activation region isconfigured to contain gas on a first side of a dielectric barrier. Theterm “contain” may refer to enclose, store, or otherwise hold within aconfined or closed space. For example, a plasma-generating gas may beenclosed within the plasma-activation region. The term “dielectricbarrier” may refer to a layer made of a dielectric (e.g., insulating)material that may interrupt a line-of-sight between two electrodesbetween which the plasma-generating field is applied. Plasma generationin a DBD mode may be effected, for example, by electrically isolatingone of the electrodes used for applying the field. Such isolation may berealized by a dielectric layer that isolates the electrode from the gasin the region where plasma is generated. In other words, one electrodemay be located on a first side of the dielectric barrier, and the otherelectrode may be located on a second side of the dielectric barrier.Thus, the dielectric barrier may divide a space into two sides with thefirst electrode positioned in the first side, and the second electrodepositioned in the second side. For example, the two electrodes may be acathode and anode. The cathode may be positioned one side of thedielectric barrier (e.g., the first side), and the anode may bepositioned on the other side of the dielectric barrier (e.g., the secondside). According to some embodiments, the plasma-activation region mayenclose or store gas on the cathode side (e.g., first side) of adielectric barrier. FIGS. 3A-3B illustrate an exemplary implementationof a plasma-activation region configured to contain gas on a first sideof a dielectric barrier, consistent with disclosed embodiments. Disk 344may form a dielectric barrier between anode 340 and cathode 330 byinterrupting a line-of-sight there between. Plasma applicator 348 maystream gas into slot. Protecting shroud may be penetrable to gas flow,enabling the gas to flow into protecting shroud 310 a towards viewport390, e.g., in vicinity 322 of cathode 330. Alternatively, air may becontained in protecting shroud 310 a. Either way, vicinity 322 (e.g.,the plasma-activation region) is configured to contain gas on the sideof disk 344 (e.g., a dielectric barrier) where cathode 330 is positioned(e.g., the first side).

According to some embodiments, the gas that the plasma-activation regionis configured to contain is air. While gases such as argon or helium arecommonly used for igniting a plasma cloud, these gases may prove costlyand inconvenient for multiple, repeated uses. Thus, disclosedembodiments provide a plasma generating field applicator that is capableof igniting a plasma cloud from air encased within the chamber orprotecting shroud 310 a. For example, depending on the volume of thechamber, plasma may be ignited in air (e.g., without using gas from anexternal source) at atmospheric pressure using a voltage of about 10-20KV. When the air pressure is reduced to about 0.8 KPa, a plasma cloudmay be ignited from air using a voltage of about 800V. FIG. 3Aillustrates an exemplary implementation of a plasma-activationconfigured to contain air, consistent with disclosed embodiments. Hose364 may pump some air out of protecting shroud 310 a (e.g., a chamber)to reduce the air pressure therein, such that the voltage differentialmaintained between cathode 330 and anode 340 induces an electric fieldcapable of igniting a plasma cloud from the remaining low-pressure air.

According to some embodiments, the gas that the plasma-activation regionis configured to contain is inert. Inert, or noble gases made fromelements such as Helium or Argon may be used in plasma technology sincethey do not form radicals that can react with other atoms or molecules,such as the surface of an optical element. For this reason, inert gassuch as Helium or Argon may be streamed into the plasma-activationregion via a tube or hose. FIG. 3C illustrates an exemplaryimplementation of a plasma activation region configured to contain aninert gas, consistent with disclosed embodiments. Hose 364 may befluidly associated with a reservoir containing an inert gas, such asHelium or Argon. Hose 364 may stream the inert gas into protectingshroud 310 a to vicinity 322 (FIG. 3A) near viewport 390 via applicatorgas port 402 and shroud gas port 404. A vacuum seal 408 may establishfluid connectivity between hose 364 and the vicinity 322 of protectingshroud 310 a to stream the inert gas directly into protecting shroud 310a via hose.

Some embodiments involve at least one pump for causing at least apartial vacuum in the plasma activation region. The term “vacuum” mayrefer to a region having a gaseous pressure that is lower thanatmospheric or ambient pressure. As used herein, the term “vacuum” isintended to include partial vacuums. That is, in the context of thisdisclosure, a vacuum encompasses an enclosed space where at least someof the air or other gas is removed. The term “pump” may refer to adevice that draws or suctions particles from a sealed volume in order tocause a vacuum or partial vacuum in the volume. For example, a hosefluidly connected to the interior of the device may remove air to causea partial vacuum therein. The partial vacuum may facilitate thegeneration of plasma, e.g., by allowing the gas to ionize to formplasma. FIG. 3A illustrates an exemplary implementation of a deviceincluding a pump for causing at least a partial vacuum in the plasmaactivation region, consistent with disclosed embodiments. Hose 364 maypump gas (air) from protecting shroud 310 a in vicinity 322 of viewport390 through openings 368. Air may be pumped through hose 364 by a vacuumpump fluidly associated with hose 364.

In some embodiments a gas pressure associated with the partial vacuum isbelow 0.3 Atm or below 0.1 Atm. As noted, a lower pressure (e.g.,partial vacuum) may facilitate in generating plasma by enabling aplasma-generating gas to ionize. Thus, after pumping out air or gas asdescribed above, the pressure inside the plasma activation region may beconsiderably lower than atmospheric pressure. Turning to FIG. 3A, vacuumseal 370 may enable generating a partial vacuum near viewport 390 bymaintaining a pressure difference between the interior and exterior ofprotecting shroud 310 a below 0.1 Atm.

Some embodiments involve the plasma-activation region containing gas ona first side of a dielectric barrier and the electrical circuitry isconfigured to form an electrical connection with a first electrodelocated on the first side of the dielectric barrier. The term“electrode” refers to a conductor through which electricity enters orleaves an object, substance, or region. Electrodes are typicallyconfigured in pairs, with one electrode being the cathode (e.g., a sinkfor a conventional current, and source for an electron flow) and theother electrode being the anode (e.g., a source for a conventionalcurrent, and sink for an electron flow). Thus, the cathode may be thefirst electrode of the pair, and the anode may be the second electrodeof the pair. For example, the electric circuity delivering electriccurrent to a device may be electrically coupled to the cathode (e.g.,first electrode positioned on the first side of the dielectric barrier)via one or more wires. FIGS. 1A taken with 3A illustrates an exemplaryimplementation of electrical circuitry configured to form an electricalconnection with a first electrode located on the first side of thedielectric barrier, consistent with disclosed embodiments. Plasmagenerating field applicator 348 (FIG. 3A) may be electrically associatedwith an electrical power source, such as via operating unit 120 (FIG.1A) containing electrical circuity. An electric conductor 354 such as anelectric wire, electrically associated with cathode contactor 352, maysupply electric power from the power source to cathode contactor 352 andto cathode 330, e.g., on the cathode side of disk 344. In other words,the electrical circuitry of operating unit 120 may form an electricalconnection with cathode 330, which is located on the first (e.g.,cathode) side of the dielectric barrier formed by disk 344.

Some embodiments involve a second electrode connected to the electricalcircuitry, The term “second electrode” may refer to the second electrodeof the cathode-anode pair described above. Thus, the second electrodemay correspond to the anode electrode which may be connected to theelectrical circuity via one or more contactors or wires. FIGS. 1A takenwith 3A illustrates an exemplary implementation of a second electrodeconnected to the electrical circuitry, consistent with some disclosedembodiments. Plasma generating field applicator 348 (FIG. 3A) may beelectrically associated with an electrical power source, such as viaoperating unit 120 (FIG. 1A) containing electrical circuity. Anodecontactor 356 may be in contact with anode 340 while protecting shroud310 a is inside slot 350. Electric conductor 358 may be electricallyconnect anode contactor 356 with a supply of electric power (e.g., viathe electrical circuitry of operating unit 120), thereby connectinganode 340 (e.g., the second electrode) to the electrical circuitry. Inother words, anode 340 may be connected to the electric circuity ofoperating unit 120 via electrical conductor 358 and anode contactor 356.

According to some embodiments, the second electrode is connected to theelectric circuity and is located on a second side of the dielectricbarrier, opposite the plasma activation region. The term “second side ofthe dielectric barrier” may refer to the side opposite the first side ofthe dielectric barrier described above. Thus, if the first sidecorresponds to the side of the barrier where the cathode is positioned,the second side may correspond to the side of the barrier where theanode is positioned. The term “opposite the plasma activation region”may refer to the zone or area that is on the side of the dielectricbarrier opposite the zone where the plasma is activated. Thus, if theplasma is activated on the cathode side (e.g., first side) of thedielectric barrier, the anode (e.g., second electrode) may be positionedon the other (e.g., opposite) side of the dielectric barrier. FIG. 3Aillustrates an exemplary implementation of the second electrode beinglocated on a second side of the dielectric barrier, opposite the plasmaactivation region, consistent with some disclosed embodiments. Anode 340may be mounted on disk 344 forming a dielectric barrier between anode340 and cathode 330. Thus, anode 340 is located on the other (e.g.,second side) of disk 344 to cathode 330, which is located on the firstside of disk 344. Moreover, the side of disk 344 where anode 340 islocated is opposite to the side of disk 344 of vicinity 322 of viewport390 corresponding to the plasma activation region.

According to some embodiments, the dielectric barrier and the firstelectrode are removable from the housing. The term “removable” may referto detachable, separable, or transferrable. For example, the dielectricbarrier may be detached (e.g., removed) from the housing, for example tochange the mode of operation from a DBD to a non-DBD mode of operation.As another example, the first electrode may be detached from the housingto allow replacing or cleaning the electrode, e.g., from a build-up ofsediment. FIGS. 3A-3B illustrate an exemplary implementation of adielectric barrier and first electrode that may be removable from thehousing, consistent with disclosed embodiments. Cathode 330 (FIG. 3A)and disk 344 (FIG. 3B) may be removable from the housing of application348.

According to some embodiment, the dielectric barrier is configured toisolate the second electrode from gas in the chamber. The term “isolate”may refer to insulate, sequester, or otherwise prevent something frominteracting with nearby matter or energy. For example, the anode (e.g.,second electrode), positioned on one side of a dielectric barrier, maybe insulated by the dielectric barrier from interacting with gas presenton the other side of the dielectric barrier. FIGS. 3A-3B illustrates anexemplary embodiment of a dielectric barrier configured to isolate thesecond electrode from gas in the chamber, consistent with disclosedtechniques. Disk 344 may form a dielectric barrier between anode 340 andcathode 330. Disk 344 may be an electric barrier that electricallyisolates anode 340 from gas present in vicinity 322 of viewport 390.

According to some embodiments, a thickness of the dielectric barrier isbetween about 0.3 mm to about 3 mm. The thickness of the dielectricbarrier may affect the quality of the plasma treatment, which may bemeasured by the level of hydrophilicity attained, and the time toactivate the electric field to reach that hydrophilicity. In otherwords, a high-quality plasma treatment may correspond to a relativelyhigh level of hydrophilicity. The thickness of the dielectric barriermay be sufficiently low to facilitate plasma ignition, yet sufficientlythick to prevent breakdown and arcing, e.g., between the anode andcathode. Exemplary thicknesses for dielectric materials such as PET orpolycarbonate may range between 0.3 mm to about 3 mm for RF electricfield at frequencies in the MHz range (e.g., about 2 MHz).

Some embodiments include a stopper for maintaining a gap between theoptical element and the second electrode, the stopper acting as thedielectric barrier between the first electrode and the second electrode.The term “stopper” may refer to any type of barrier that may bepositioned inside a container to isolate or separate one portion of thecontainer from another portion of the container. For example, a stopperor barrier may be positioned inside the plasma activation region tocontrol the advancement of the optical element, e.g., to ensure apredetermined gap between the optical element and the anode forgenerating the plasma. The stopper may additionally function as adielectric barrier between the cathode and anode by interrupting theline of sight there between, such as to enable a DBD mode of operation.FIG. 3C illustrates an exemplary implementation of a plasma generatingdevice further including a stopper for maintaining a gap between theoptical element and the second electrode, the stopper acting as thedielectric barrier between the first electrode and the second electrode,consistent with disclosed embodiments. Protecting shroud 410 may beprovided with stopper 442. Stopper 442 may limit the advancement ofviewport 390 into protecting shroud 410 to ensure a predetermined gapbetween surface 392 (FIG. 3A) of viewport 390 and ring anode 440. Thepredetermined gap may facilitate the generation of plasma therein. Inaddition, stopper 442 may interrupt a line-of-sight between cathode 330and anode 440, functioning as a dielectric barrier there between, e.g.,to enable a DBD mode of operation.

Some embodiments involve at least one processor. The at least oneprocessor may include electric circuitry for performing logicaloperations on an input signal. For example, the at least one processormay include one or more controllers, integrated circuits (ICs),including ASICs, microchips, microcontrollers, microprocessors, all orpart of a CPU, GPU, APU, DSP, FPGA, or other circuits suitable forexecuting computing instructions and/or capable of performing logicaloperations, e.g., based on a computing instruction or an input signal.Instructions executed by the at least one processor may be pre-loadedinto a memory integrated with or embedded into a controller (e.g.,processor) or may be stored in a separate memory. The memory maycomprise a RAM, a cache memory, a ROM, a hard disk, an optical disk, amagnetic medium, a flash memory, other permanent, fixed, or volatilememory, or any other mechanism capable of storing such instructions. Thememory may additionally store data, which may include one or more inputsfor executing the one or more program code instructions, and one or moreoutputs produced by executing the one or more program code instructions.In some embodiments, the at least one processor may include multipleprocessors. Each processor may have a similar construction, or differentconstructions that may be electrically connected or disconnected fromeach other. The processors may be separate circuits or integrated in asingle circuit. Multiple processors may be configured to operateindependently or collaboratively. The processors may be coupledelectrically, magnetically, optically, acoustically, mechanically or byother means that permit them to interact. The processors may be physicaland/or virtual (i.e., software-based). Operating unit 120 of FIG. 1A mayillustrate an exemplary implementation of at least one processor,consistent with disclosed embodiments. Operating unit 120 includes oneor more command switches and controller (e.g., processors).

Some embodiments are configured to control electricity flow through thecircuitry. The term “control” may refer to administering, governing, orotherwise regulating. For example, the at least one processor mayregulate the electricity flowing through the circuity, and therebyregulate (e.g., control) a voltage difference between the cathode andanode. The voltage difference may affect the electromagnetic fieldgenerated in the plasma activation region, and thereby influence thegeneration of plasma therein. Since characteristics of the gas andelectrodes may determine the attributes of the electromagnetic fieldneeded to ignite the plasma, the at least one processor may regulate theelectricity flow through the circuity to generate an electromagneticfield suitable for the type of gas and electrode characteristics. Forexample, plasma may be ignited in helium gas at atmospheric pressureusing an RF field of about 7 KV over a distance of 1 cm between thecathode and anode, and at a voltage of about 200V if the gas is at apressure of 0.8 KPa. Operating unit 120 of FIG. 1A may illustrate anexemplary implementation of at least one processor configured to controlelectricity through the circuitry, consistent with disclosedembodiments. Operating unit 120 includes one or more command switchesand controller (e.g., processors) that may regulate the flow ofelectricity throughout apparatus 100.

Some embodiments involve controlling the electricity flowing thecircuity to cause an electric and/or electromagnetic field associatedwith a voltage drop between the first electrode and a second electrode.The term “voltage drop” may refer to an electrical potential differenceor a gap between the voltage levels of the two electrodes. The voltagedrop, or potential difference, may define an electric and/orelectromagnetic field between the two electrodes that may induce chargedparticles to move. Thus, the at least one processor may controlparameters of the electricity such as the timing, frequency, intensity,magnitude, and phase of the electric (e.g., voltage, current) and/ormagnetic signal (e.g., direction, strength, density). By controlling theelectricity flowing through the circuitry, the at least one processormay control a voltage potential difference between the two electrodes,and thereby control an electric field therebetween. Operating unit 120of FIG. 1A illustrates an exemplary implementation of at least oneprocessor (e.g., controller) that may control electricity flowingthrough the circuitry of plasma generating system 100, consistent withdisclosed embodiments. Turning to FIG. 3A, controlling the electricity(e.g., via operating unit 120 of FIG. 1A) may cause a voltage drop(e.g., potential difference) between cathode 330 and anode 340. Thevoltage drop may be associated with an electric field between cathode330 and anode 340.

According to some embodiments, the electrical circuitry in the housingincludes a plasma generating field applicator configured to cause thevoltage drop to be at least 800 V. According to some embodiments, theelectrical circuitry in the housing includes a plasma generating fieldapplicator configured to cause the voltage drop to be at least 1000V.Characteristics of the gas (e.g., type, pressure, temperature) maydetermine one or more aspects of an electric field suitable forgenerating plasma from the gas. This in turn may determine a voltagelevel corresponding to the electric field. For example, when electrodesare approximately 1 cm apart, plasma may be ignited in air (e.g., a gas)at a voltage of about 800V in 0.8 KPa for RF frequencies ranging between1 MHz and 15 MHz. Similarly, plasma may be ignited at a voltage of about1000V. Thus, causing a voltage potential difference (e.g., voltage drop)between the two electrodes of at least 800V, or at least 1000V mayfacilitate plasma ignition inside the plasma generating fieldapplicator. FIG. 3A illustrates an exemplary implementation of a plasmagenerating field applicator configured to cause a voltage drop, (e.g.,potential difference) to be at least 800V, or at least 1000V, consistentwith disclosed embodiments. The foregoing are provided as examples only,as there is an interrelationship between parameters impacting plasmaignition, and thus parameters can be variably altered depending ondesign constraints so long as plasma is ignited and maintained for aperiod sufficient to achieve a desired level of hydrophilicity.

In some embodiments an electric field is caused between the firstelectrode and a second electrode to thereby generate plasma within theplasma-activation region. The term “plasma” may refer to a state ofmatter containing an abundance of charged particles, e.g., electrons andions. Consequently, plasma may be highly electrically conductive andsensitive to electric and/or electromagnetic fields. Thus, the at leastone processor may control the electricity to generate an electric and/orelectromagnetic field inside the plasma-activation region capable ofconverting a gas subjected to the electric and/or electromagnetic fieldto a plasma cloud. For example, the electric and/or electromagneticfield may ionize the gas until the gas becomes increasingly electricallyconductive to the point of reaching a plasma state. The circuity maythus control the electricity to be suitable for carrying out the plasmatreatment, e.g., by adapting the electricity from the power source to asignal capable of inducing an electric and/or electromagnetic fieldcapable of converting a gas to a plasma cloud. Operating unit 120 (FIG.1A) illustrates an exemplary implementation of at least one processorcontrolling electricity to carry out a plasma treatment, in accordancewith disclosed embodiments. Operating unit 120 may adapt (e.g., control)electricity supplied by the power supply to be suitable for generatingan electric and/or electromagnetic field capable of generating plasma.The electricity may be provided to any of cathode 330, anode 340,dielectric barrier 344, via any of cathode contactor 352, electricconductor 354, and electric conductor 358 (FIG. 3A). For example,electricity controlled by operating unit 120 may be delivered to cathode330 and anode 340 via electric conductors 354 and 358 to generate anelectric and/or electromagnetic field suitable for converting a gaspresent therein to a plasma cloud.

Some embodiments involve maintaining the generated plasma in theplasma-generating region for time period sufficient to cause the opticalsurface to become hydrophilic. As noted, the “quality” of the plasmatreatment may correspond to the level of hydrophilicity attained due tothe plasma treatment. The duration (e.g., time period) during which theelectric field is activated, and thus capable of igniting plasma fortreating an optical surface, may correspond to the level ofhydrophilicity (e.g., the quality) required for a given application. Forexample, different applications (short versus long) and optical elements(e.g., varying shapes, sizes, and materials) may require varyingqualities of treatment (e.g., levels of hydrophilicity). Some opticalelements may require a very high level of hydrophilicity (e.g.,corresponding to a lengthier treatment) and other optical elements maysuffice with a lower level of hydrophilicity (e.g., corresponding to ashorter treatment). In a similar manner, to attain the same level ofhydrophilicity, different materials, shapes, or sizes of opticalelements may require different durations (e.g., time periods) of plasmatreatment. Thus, the “time period sufficient to cause the opticalsurface to become hydrophilic” may depend on the material being treated(e.g., plastic, glass, metal), the shape of the optical element (e.g.,flat or rounded), the use type and duration (e.g., a short dentalprocedure versus lengthy abdominal surgery) the type of gas used (e.g.,Helium, Argon, or air), the pressure of the gas (e.g., atmosphericpressure or lower pressure generated via a vacuum pump), the ambienttemperature, and any other factor that may affect the hydrophilicity ofthe optical element. The at least one processor may thus control theelectricity in the circuitry to maintain plasma within theplasma-generating region for a time duration that meets thehydrophilicity requirements for a given optical element. A user mayenter the hydrophilicity requirements for a specific optical element viaa user interface of a control unit. Operating unit 120 (FIG. 1A)illustrates an exemplary implementation of at least one processor formaintaining the generated plasma in the plasma-generating region fortime period sufficient to cause the optical surface to becomehydrophilic, consistent with disclosed embodiments. Operating unit 120may include a user interface (e.g., switches, controllers, buttons,indications, displays) allowing the user to enter one or more criterionfor a plasma treatment for object 200, e.g., an optical element. Forexample, the user may provide one or more criterion to operating unit120, such as a target treatment quality level, the type of material tobe treated, the size and shape of the optical element to be treated, andany other criterion relevant to the plasma treatment for the opticalelement. At least one processor of operating unit 120 may controlcharacteristics of the electricity flowing through the circuitry togenerate plasma in any of plasma generating field applicator (130, 348,448) based on the criterion, for example by controlling the duration(e.g., time period) for the treatment. In other words, operating unit120 (e.g., at least one processor) may maintain the generated plasma inthe plasma-generating region (e.g., vicinity 322 of FIG. 3A) for timeperiod sufficient to cause optical surface 392 of optical element 390 tobecome hydrophilic.

FIG. 19 is a block diagram of an example process 1900 for inhibitingcondensation distortion on an optical element, consistent withembodiments of the present disclosure. While the block diagram may bedescribed below in connection with certain implementation embodimentspresented in other figures, those implementations are provided forillustrative purposes only, and are not intended to serve as alimitation on the block diagram. As examples of the process aredescribed throughout this disclosure, those aspects are not repeated orare simply summarized in connection with FIG. 19. In some embodiments,the process 1900 may be performed by at least one processor (e.g., atleast one processor operating unit 120 of FIG. 1A) to perform operationsor functions described herein. In some embodiments, some aspects of theprocess 1900 may be implemented as software (e.g., program codes orinstructions) that are stored in a memory provided with the at least oneprocessor, or a non-transitory computer readable medium. In someembodiments, some aspects of the process 1900 may be implemented ashardware (e.g., a specific-purpose circuit). In some embodiments, theprocess 1900 may be implemented as a combination of software andhardware.

FIG. 19 includes process block 1902 to 1908. At block 1902 the methodmay involve, detecting an optical element inserted into aplasma-generation region within a housing, wherein the plasma-activationregion is configured to contain gas on a first side of a dielectricbarrier. The term “detecting” may refer to determining, sensing, oridentifying, for example sensing the insertion of an optical element ina plasma-generation region. The detecting may further involve sensingthe insertion of the optical element within a sheath that contains theplasma-generation region. The sheath may be contained within a housingencasing component of the plasma generating device. The plasmagenerating device may include a dielectric barrier that divides theplasma-activation region from other internal regions of the plasmagenerating. In this manner, the plasma-activation region may contain gason only one side of the dielectric barrier. For example, cathode 330(FIG. 3A) may come into physical contact with a metallic surface 384 ofendoscope 380. The electrical contact may allow detecting the insertionof endoscope 380 into protecting shroud 310 a, and thereby detect theinsertion of optical surface 392 of viewport 390 (e.g., an opticalelement) within vicinity 322 (e.g., a plasma-generation zone) within thehousing (e.g., applicator 130 of FIG. 1A). Vicinity 322 may contain gason one side (e.g., of cathode 330) of disk 344 (e.g., a dielectricbarrier).

In some embodiments, the optical element is part of a medical instrumenthaving an elongated shaft and the optical element includes a lens on adistal end of the elongated shaft. For example, the medical instrumentmay be configured for insertion into a body, the insertion facilitatedby an elongated cannula or handle (e.g., shaft), the distal end of whichmay be suited for insertion into the body, and the proximal end may besuited for control, external to the body, by a medical practitioner. Thedistal end may include a camera configured with an optical elementincluding one or more lenses. The cannula may include one or more wires,fibers, or cables to enable controlling (e.g., maneuvering) the distalend of the medical instrument within the body, and to enablecommunicating information to and from the distal end, such as totransfer images collected by the camera (e.g., at the distal end) to amemory (e.g., at the proximal end). FIG. 2 illustrates the opticalelement being part of a medical instrument having an elongated shaft andincluding a lens on a distal end of the elongated shaft, consistent withdisclosed embodiments. Endoscope 380 (e.g., a medical instrument)includes an elongated shaft, such as may be suited for inserting into abody. The distal end of the elongated shaft of endoscope 380 includes aviewport 390 (e.g., an optical element). External surface 392 which maybe subject to a plasma treatment may be an external surface of a lens.

In some embodiments, the medical instrument is a laparoscope or anendoscope. For example, medical instruments such as laparoscopes andendoscopes may benefit from undergoing a plasma treatment to immunize aviewport of these instruments from fogging during use. FIG. 3Aillustrates an exemplary implementation of endoscope 380 for undergoinga plasma treatment consistent with disclosed embodiments. The distal endof endoscope 380 includes a viewport 390. Protective shroud 310 a issized to accommodate the elongated shape of endoscope 380, or any otherelongated medical instrument, such as a laparoscope.

At block 1904, the process may involve electrically connecting a firstelectrode located on the first side of the dielectric barrier with asecond electrode located on a second side of the dielectric barrier,opposite the plasma activation region. Electrically connecting may referto the inclusion of components within a circuit, and may not necessarilyrequire a physical connection. For example, while two electrodes may notphysically connect, their spaced apart proximity to each other mayenable a voltage drop to occur within a common circuit, and in suchinstance, the two spaced apart electrodes are considered to beelectrically connected. By electrically connecting the electrodeslocated at opposite sides of a dielectric barrier, plasma may begenerated in the plasma-activation region in a DBD mode of operation,which may result in a more uniform generation of plasma and preventarcing and other non-predictable and/or undesirable electrictransmissions between the first and second electrodes. FIG. 3A,illustrates an exemplary implementation of electrically connected firstand second electrodes, where the first electrode is located on a firstside of a dielectric barrier and the second electrode located on theother (e.g., second) side of the dielectric barrier, opposite the plasmaactivation region, consistent with disclosed embodiments. Disk 344(e.g., a dielectric barrier) separates cathode 330 (e.g., a firstelectrode) and anode 340 (e.g., a second electrode). Cathode 330 iselectrically connected to protecting shroud 310 a in proximity tovicinity 322 (e.g., the plasma activation region), whereas anode 340 islocated on the opposite (e.g., second) side of disk 344, oppositevicinity 322.

At block 1906, an electric field associated with a potential drop ofgreater than 1000 V is applied between the first electrode and a secondelectrode to thereby generate plasma within the plasma-activationregion. As noted above, the voltage suitable for generating an electricfield capable of igniting a plasma cloud may depend on multiple factors,such as the type of gas used (e.g., Argon, Helium, or air), the pressureof the gas, and the geometry of the electrodes, with examples given forapplying voltages of 7 KV and 20 KV to generate plasma. In other words,in some embodiments, a voltage of greater than 1000V may be appliedbetween the first and second electrodes to generate plasma within theplasma-activation region. FIG. 3A illustrates an exemplaryimplementation for applying an electric field associated with apotential drop of greater than 1000 V between the first electrode and asecond electrode to thereby generate plasma within the plasma-activationregion, consistent with disclosed embodiments. A voltage of greater than1000V may be applied between cathode 330 (e.g., first electrode) andanode 340 (e.g., second electrode) via conductors 354 and 358 togenerate an electric field capable of generating plasma in vicinity 322(e.g., the plasma-activation region).

At block 1908, the process may involve maintaining the generated plasmain the plasma-generating region for time period sufficient to cause theoptical surface to become hydrophilic. As noted, the quality of a plasmatreatment may correspond to the level of hydrophilicity attained. Forexample, certain materials, devices or applications may be associatedwith one or more hydrophilicity thresholds. The electric field may bemaintained in the plasma-generating region for a long enough (e.g.,sufficient) duration to ensure that the level of hydrophilicity attainedmeets the threshold. For example, operating unit 120 (FIG. 1A) mayinclude one or more processors, controllers and switches that maintainthe plasma inside the plasma-generation region for a sufficient durationto cause optical surface 390 (FIG. 3A) to become hydrophilic. Operatingunit 120 may achieve this by controlling the electricity delivered tocathode 330 and anode 340 via conductors 354 and 358, respectively, andcontactors 352 and 356, respectively, thereby controlling the electricfield there between. For example, for one set of applications and/orconfigurations of the plasma-generation region, the time periodsufficient to cause the optical surface to become hydrophilic is lessthan 1 minute of activated electric field. For a second set ofapplications and/or configurations of the plasma-generation region, thetime period sufficient to cause the optical surface to becomehydrophilic is less than 10 seconds of activated electric field. For athird set of applications and/or configurations of the plasma-generationregion, the time period sufficient to cause the optical surface tobecome hydrophilic is less than 5 seconds of activated electric field.The time periods may be based on the type of material treated (e.g.,metal, glass or plastic), the type and length of treatment the opticalsurface is slated to be used for (e.g., a mirror for quick dentalprocedure versus an endoscope for a lengthy abdominal surgery), the sizeand shape of the optical surface (flat dental mirror versus roundedcamera lens), and any other factor that may affect the condensation ofdroplets on the optical surface.

Embodiments of the present disclosure may relate to systems, devices,methods, and computer readable media for generating plasma and fortreating objects with plasma. For ease of discussion, in some instancesrelated embodiments are described below in connection with a system ormethod with the understanding that the disclosed aspects of the systemand method apply equally to each other as well as devices and computerreadable media. Some aspects of a related method may occurelectronically over a network that is either wired, wireless, or both.Other aspects of such a method may occur using non-electronic means. Inthe broadest sense, the systems, methods, and computer readable mediadisclosed herein are not limited to particular physical and/orelectronic instrumentalities, but rather may be accomplished using manydiffering instrumentalities.

Some disclosed embodiments include a plasma generation device. Asdiscussed elsewhere in the present disclosure, a plasma generationdevice may include any apparatus or combination of components capable ofgenerating plasma, e.g., by converting a gas to transform the gas to aplasma state or plasma cloud. In some embodiments, the plasma generationdevice may include a mechanism for supplying gas such as helium orargon, and two electrodes (e.g., an anode and a cathode) or any othersuitable means for applying an electric or electromagnetic field to thesupplied gas. The electric or electromagnetic field may ionize the gasto the point that the gas becomes an electrically conductive plasmacloud.

In some embodiments, the plasma generation device is configured fortreating objects. For example, plasma generated by the plasma generationdevice may be applied to an object, such that the plasma may react withmolecules on the object's surface. In some embodiments, plasma may beapplied to modify properties of the object's surface, such as byrendering the surface hydrophilic or hydrophobic or by altering thesurface's electrical conductivity. Additionally, or alternatively,plasma may be applied to clean the object's surface by breaking down andremoving organic residues. For example, plasma generation system 500depicted in FIGS. 5 and 7 illustrates an exemplary implementation of aplasma generation device, in accordance with disclosed embodiments. Asshown in FIG. 7, plasma generating system 500 may be configured togenerate plasma to treat a surface of an object, such as an opticalsurface 706 of an endoscope 708 or another medical instrument. In someembodiments, plasma generating system 500 may be configured to applyplasma to an object (e.g., optical surface 706) to modify a hydrophilicproperty and/or another surface property of the object.

Some disclosed embodiments include a housing. In some embodiments, ahousing may include any structure, casing, frame, enclosure, or supportthat covers and/or protects other components of the plasma generationdevice. For example, the housing may cover and protect the components ofthe plasma generation device that are configured to cause the reactionthat creates the plasma (e.g., a vacuum chamber, one or more electrodepairs, and a mechanism for supplying reaction gas). As discussedelsewhere in the present disclosure, the housing may be made of anysuitable material, such as plastic, metal, glass, wood, or any othermaterial capable of encasing the plasma generation device, or anycombination thereof. In some embodiments, the housing may be hollow sothat the housing may hold or accommodate one or more other components.For example, the housing may include at least one bore, cavity, orhollow internal chamber that may hold or accommodate at least a portionof the object to be treated with plasma, and may optionally also hold oraccommodate at least a portion of a protective sheath or shroudsurrounding the object to be treated.

As an example, FIG. 7 illustrates an exemplary plasma generation device500 including a housing 710, which may cover the outer surface of theplasma generation device and which may enclose other components of theplasma generation device. Housing 710 may include an opening 712 throughwhich a sheath 718 (also referred to as a protecting shroud sheath 718)and an object to be treated (e.g., object 708) may be introduced into aninner cavity 714 of the housing (also referred to as a bore 714). Cavity714 may be sized and configured to removably retain at least a portionof sheath 718 which may, in turn, accommodate at least a portion ofobject 708.

Some disclosed embodiments include a plasma generation zone within thehousing. As discussed elsewhere in the present disclosure, the term“plasma generation zone” may refer to a physical volume or space withinthe housing in which a plasma cloud may be formed, e.g., by igniting agas introduced therein. For example, the plasma generation zone mayinclude a volume or space within the housing within which a reaction mayoccur for generating plasma. In some embodiments, the plasma generationzone may be located between an electrode pair configured to apply anelectric or electromagnetic field to ionize gas within the plasmageneration zone, thus generating plasma. In some embodiments, the plasmageneration zone may be fluidly connected to a mechanism (e.g., areservoir and/or pump) for supplying the reaction gas for generating theplasma, so that the gas may be delivered into the plasma generationzone.

In some disclosed embodiments, the plasma generation zone is configuredto enable accommodation of an object, such as an object to be treatedwith plasma. As disclosed elsewhere in the present disclosure, the term“accommodation” may refer to a capability for holding, enclosing,supporting, or otherwise containing an object, e.g., within the plasmageneration zone. For example, the object may be supported within theplasma generation zone to expose at least a portion of the object to aplasma cloud. In some embodiments, the plasma generation zone may besized and configured to accommodate the entire object. Additionally, oralternatively, the plasma generation zone may be sized and configured toaccommodate a portion of the object, such as a distal end of the object,while another portion of the object remains outside of the plasmageneration zone (and, optionally, outside of the plasma generationdevice). In some embodiments, the object may be removable from theplasma generation zone. For example, the object may be delivered into,and accommodated within, the plasma generation zone for treatment withplasma, after which the object may be removed from the plasma generationzone.

In some embodiments, the plasma generation zone may be completely sealedfrom the external environment while the object is accommodated withinthe plasma generation zone. As a result, the plasma generation zone maybe airtight. For example, one or more seals may be provided in thehousing and/or in the sheath to form a vacuum seal about the externaldiameter of the object to be treated. The vacuum seal may be configuredto hold a pressure differential between the plasma generation zone andthe external environment, while the distal end of the object (or anyother desired portion) is accommodated within the plasma generationzone. Accordingly, the internal pressure and/or the contents of theplasma generation zone may be controlled (e.g., by at least oneprocessor of the plasma generation device). In alternative embodiments,the plasma generation zone may be open to the outer environment.

As an example, FIG. 7 illustrates a plasma generation device 500including a plasma generation zone 716 located within housing 710. Insome embodiments, plasma generation zone 716 may include an inner volumeof sheath 718 at or near the distal end of sheath 718, such that plasmageneration zone 716 may be configured to accommodate at least a portionof object 708 (including optical surface 706) during plasma treatment.Since sheath 718 may be accommodated within housing cavity 714, plasmageneration zone 716 may also be located within cavity 714, at or nearthe end of the cavity that is opposite from opening 712. In someembodiments, plasma generation zone 716 may be located between anelectrode pair configured to ionize gas within plasma generation zone716 to generate plasma. As a non-limiting example, the anode 722A, 722Bmay be located within housing 710 and may include one electrode, twoelectrodes, or any other suitable number of electrodes or electricalcontacts. Additionally, or alternatively, sheath 718 may include firstelectrode pair 702A, 702B and second electrode pair 704A, 704B, one orboth of which may be configured as the cathode. For example, in someembodiments the first electrode pair 702A, 702B may be configured as thecathode. Electric power may be supplied between the anode and cathode togenerate the electric or electromagnetic field for plasma generation.

In some embodiments, plasma generation zone 716 may be fluidly connectedto a hose 720, which may be fluidly connected to a gas reservoir orcontainer (not shown) containing a gas suitable for plasma generation,such as helium, argon, or nitrogen. Thus, hose 720 may stream thereaction gas from the gas reservoir into cavity 714 and plasmageneration zone 716. Additionally, or alternatively, hose 720 may befluidly connected to at least one vacuum pump configured to remove gasfrom plasma generation zone 716 in order to control the pressure withinthe plasma generation zone 716.

In some disclosed embodiments, the object to be treated with plasmaincludes a medical device or instrument configured to be inserted into,or implanted within, the body of a patient. For example, the object mayinclude an optical surface of an endoscope. As used herein, an endoscopemay refer to an instrument configured to be inserted into a body opening(such as a surgical opening or a preexisting opening such as the mouthor anus) in order to visualize an interior body cavity or organ or toassist with a medical procedure. The endoscope may include at least oneimaging mechanism (e.g., a small camera) at or near the distal end ofthe endoscope. As also used herein, an optical surface of an endoscopemay include a component positioned on the endoscope, or connected to theendoscope, through which light passes and/or is reflected. The opticalsurface may include one or more of a lens, polarizer, diffractiongrating, prism, reflector, filter, viewing window, mirror, protectivewindow, or any other component through which light passes or isreflected. In some embodiments, the optical surface may be part of acamera or other imaging mechanism of the endoscope, such that theoptical surface may be configured to focus light in order to captureimages of a body cavity or internal organ. The optical surface may besituated at the distal end of the endoscope or at any other locationalong the length of the endoscope from which it may be advantageous tocapture images.

The optical surface of the endoscope may be treated with plasma to alterone or more characteristics of the optical surface. In some embodiments,the plasma treatment may minimize, inhibit, or prevent fogging of theoptical surface that is caused by water droplets formed on the opticalsurface. Specifically, treatment with plasma may elevate the surfaceenergy of the optical surface, thus rendering the surfacesuper-hydrophilic (i.e., attracted to water). As a result, the waterdroplets may consolidate into a thin water layer on the optical surfaceso that light passing through the optical surface is not distorted byindividual water droplets. Thus, fogging on the optical surface may beminimized or eliminated because the thin water layer formed on thehydrophilic optical surface does not distort light the way that waterdroplets do.

In some disclosed embodiments, the plasma generation zone is configuredto enable accommodation of the optical surface of the endoscopesurrounded by a dielectric barrier. As used herein, a dielectric barriermay refer to an insulating material structure located in the dischargepath between an electrode pair. In some embodiments, a dielectricbarrier may be provided in the plasma generating device between theelectrodes used to apply an electric or electromagnetic field forgenerating plasma. The presence of the dielectric barrier may suppressexcessive and rapid discharge between the electrodes, thus preventingsparks and arc formation during plasma generation. In some embodiments,the plasma generation zone enables accommodation of the optical surfacesurrounded by a dielectric barrier (i.e., the protective sheath) becausethe plasma generation zone may be formed when the object to be treatedand the protective sheath are accommodated within the internal cavity ofthe housing.

The dielectric barrier may be made from one or more dielectric materialssuch as glass, quartz, ceramics, enamel, mica, plastics, silicon rubber,or Teflon. In some embodiments, the dielectric barrier may be a planarstructure provided in the gap between the electrodes, such as a plate orsheet of insulating material. Additionally, or alternatively, thedielectric barrier may partially or entirely surround or encircle theoptical surface of the electrode. For example, the protective sheath orshroud provided around the optical surface (or another object to betreated with plasma) may be constructed from a dielectric material, suchthat the sheath may be configured as a dielectric barrier between theplasma-generating electrode pair. In some embodiments, the protectivesheath may have a cylindrical side wall encircling the optical surface,as well as a cap or end wall that may form a dielectric barrier inbetween the electrodes. Alternatively, the protective sheath may haveanother shape or configuration that may enable the sheath to surroundthe optical surface.

By way of example, FIG. 1B shows an object 200 (e.g., an endoscope)including an optical surface 222 of an optical element 220 such as awindow or lens of an imaging mechanism, which may be situated at thedistal end 210 of the object. As another example, FIG. 7 depicts anoptical surface 706 of an object 708, such as an endoscope. Opticalsurface 706 may be a lens of an imaging mechanism configured to captureimages of a hollow body organ or cavity. In some embodiments, opticalsurfaces 222 and 706 may be treated with plasma (e.g., plasma generatedby the exemplary plasma generating device) to render the surfaceshydrophilic and to thereby prevent fogging of the surfaces. In someembodiments, optical element 706 may be surrounded by protective sheath718 while the optical element is positioned in the plasma generationzone 716 (see FIG. 7). Protective sheath 718 may be constructed from adielectric material and may be situated in between the plasma-generatingelectrode pair of plasma generation device 500; thus, protective sheath718 may be configured as a dielectric barrier.

Some disclosed embodiments include a plasma generator. As used herein, aplasma generator may include a mechanism configured to ionize gas inorder to produce plasma. In some embodiments, a plasma generator may apower source, and circuitry connecting at least two electrodes so that apotential difference is established between the electrodes. Theelectrodes may be configured to subject gas to a strong electromagneticfield that ionizes the gas to the point that the gas becomes anelectrically conductive plasma cloud. Additionally, or alternatively, aplasma generator may include any other mechanism configured to ionizegas particles to generate plasma. In some embodiments, the plasmagenerator may enable formation of plasma within the plasma generationzone. For example, the plasma generator may be configured to subject gascontained within the plasma generation zone to an electromagnetic fieldthat ionizes the gas, thus producing plasma within the plasma generationzone.

As an example, FIG. 7 illustrates a plasma generation device 500including a plasma generation zone 716 and a plasma generator that mayinclude at least one high-voltage electrode 722A, 722B (which may beconfigured as the anode in device 500), a first electrode pair 702A,702B, a second electrode pair 704A, 704B, a ground electrode (notpictured), a power supply (e.g., power supply 530), and electricalcircuitry 700. In some embodiments, the at least one high-voltageelectrode 722A, 722B may be configured as the anode and may include anysuitable structure, such as a metal ring or a pair of metal ringsprovided in the housing 710. In some embodiments, the first electrodepair 702A, 702B and the second electrode pair 704A, 704B may beassociated with (e.g., connected to or mounted upon) the protectivesheath 718 and may be configured to establish electrical feedthroughbetween object 708 and electrical circuitry 700 located outside of thesheath. For example, second electrode pair 704A, 704B may extend inwardfrom sheath 718 to contact object 708. First electrode pair 702A, 702Bmay electrically couple circuitry 700 and the power supply to sheath 718(and to object 708 via second electrode pair 704A, 704B), thus closingthe circuit and driving current between the electrodes to produce theionizing field.

Some disclosed embodiments include a plurality of vacuum pumps withinthe housing. As used herein, a vacuum pump may refer to a deviceconfigured to draw fluid (e.g., gas such as air) from a sealed volume inorder to produce a partial vacuum within the sealed volume. In someembodiments, the vacuum pumps may be fluidly connected with the plasmageneration zone and may be configured to remove fluid (e.g., air orother gas) from the plasma generation zone to create a partial vacuum.The plurality of vacuum pumps may include at least one of a centrifugalpump, positive displacement pump, diaphragm pump, gear pump, screw pump,peristaltic pump, lobe pump, piston pump, or any other kind of pumpsuitable for removing air from the plasma generation zone to create apartial vacuum, or any combination thereof. In some disclosedembodiments, each pump may have a vacuum inlet (i.e., a suction inlet)through which fluid (e.g., air) that was removed from the plasmageneration zone may flow into the vacuum pump body. Each pump may alsohave an outlet from which fluid may be discharged from the pump body ata higher pressure.

The vacuum pumps may be contained (partially or entirely) within thehousing and may include two or more vacuum pumps. In some embodiments,the plurality of vacuum pumps may include at least three vacuum pumps.Alternatively, the plurality of vacuum pumps may include at least fourvacuum pumps. Alternatively, the plurality of vacuum pumps may includeat least five vacuum pumps. Alternatively, the plurality of vacuum pumpsmay include any other number of pumps suitable for creating a vacuumwithin the plasma generation zone. In some embodiments, the plurality ofvacuum pumps may be controlled by at least one processor of the plasmageneration device (as discussed in further detail herein). For example,the at least one processor may be configured to control the vacuum pumpsbased on sensor feedback, a predetermined program or schedule, and/orinput received from a user. Additionally, or alternatively, the plasmageneration device may include a user interface (e.g., buttons or a touchscreen) which a user may operate to control operations of the vacuumpumps.

Some disclosed embodiments also include a plurality of conduits withinthe housing connecting the plurality of vacuum pumps. For example, oneor more conduits may fluidly connect the plasma generation zone and theplurality of vacuum pumps. The conduits may include fluid control valvesthat may be controlled, e.g., by a processor. Additionally, oralternatively, conduits may be provided within the housing to fluidlyconnect some or all of the vacuum pumps, so that fluid may be conveyedbetween individual pumps. These conduits may also include flow controlvalves that may be controlled, e.g., by a processor.

As an example, FIG. 10A illustrates a vacuum pump assembly 1050 ofplasma generation device 500 that includes a plurality of vacuum pumps1000A, 1000B, 1000C, and 1000D. In the embodiment shown, vacuum pumpassembly 1050 may include four pumps; however, the vacuum pump assembly1050 may alternatively include any other suitable number of pumps.Vacuum pumps 1000A-1000D may be fluidly connected to plasma generationzone 716 (e.g., via hose 720 of FIG. 7) and may be configured to removeair from plasma generation zone 716 to create a vacuum for thegeneration of cold plasma. Vacuum pump assembly 1050 may also includepump manifold 1060 (see FIGS. 10B and 100), which may include anarrangement of conduits and valves configured to direct air from plasmageneration zone 716 to the pump assembly 1050 and between some or all ofthe individual pumps of pump assembly 1050. As shown in FIG. 11, vacuumpump assembly 1050 (including the plurality of vacuum pumps and theplurality of conduits) may be contained within housing 710 of plasmageneration device 500.

In some disclosed embodiments, the plurality of conduits connects theplurality of vacuum pumps in series. As used herein, a connection “inseries” may refer to an arrangement in which the vacuum pumps arefluidly connected along a single line, such that fluid (e.g., air)removed from the plasma generation zone flows through each vacuum pumpconsecutively. Thus, the discharge or outlet pressure of a first pump inthe series is equal to the suction or inlet pressure of a second pump inthe series, the discharge or outlet pressure of the second pump is equalto the suction or inlet pressure of a third pump in the series, etc.Connecting the pumps in series may have an additive effect on the headfrom each pump, thus enabling the series of pumps to create a largedifferential pressure between the inlet of the first pump and the outletof the final pump. As a result, when the vacuum pumps are activated, thepumps may be configured to cause a vacuum within the plasma generationzone due to the large differential pressure allowing the removal of mostor all air from the plasma generation zone.

In some disclosed embodiments, the series of pumps may be configured tocause a vacuum of between 0.1 atm and 0.01 atm, such as within theplasma generation zone. For example, the series of pumps may beconfigured to remove air from the plasma generation zone until a vacuumof between 0.1 atm and 0.01 atm is achieved. Then, the reaction gas maybe introduced into the plasma generation zone until a desired vacuumpressure suitable for plasma generation is achieved. In someembodiments, the desired vacuum pressure for plasma generation may be apressure within the range of between 0.1 atm and 0.01 atm. As the gas isexcited to a plasma state, the series of pumps may remove air from theplasma generation zone as required to maintain a vacuum pressure withinthe desired range for generating plasma.

Because a vacuum (significantly below atmospheric pressure) may becreated within the plasma generation zone, the plasma generation devicemay be configured to produce non-thermal or cold plasma withtemperatures close to ambient temperature. Advantageously, treatment ofa device with cold plasma (rather than high temperature, atmosphericplasma) is less likely to cause surface defects or damage the quality ofthe surface being treated, allowing the same device to be treated withplasma multiple times without the plasma damaging or otherwisenegatively affecting the device. Further, a plurality of vacuum pumps inseries is lower cost, requires less power, and is smaller than a single,larger pump that produces the same head as the vacuum pumps connected inseries. Thus, the plasma generation device may be configured to producecold plasma in a vacuum, while also being smaller, lighter, lessexpensive to produce, and more portable than a device that uses asingle, larger pump to create a vacuum.

As an example, FIG. 100 depicts an exemplary pump manifold 1060including conduits fluidly connecting vacuum pumps 1000A-1000D inseries. For example, a first conduit 1062 may connect a discharge fromthe plasma generation zone (“IN”) to an inlet (“IN 1”) of a first vacuumpump in the series, such as pump 1000C of FIG. 10A. The pump manifoldmay additionally include a second conduit 1064 connecting an outlet(“OUT 1”) of the first pump with the inlet (“IN 2”) of a second vacuumpump in the series, such as pump 1000B of FIG. 10A. A third conduit 1066may similarly connect the second pump with the third pump in the series(e.g., pump 1000D), and a fourth conduit 1068 may similarly connect thethird pump with the fourth pump in the series (e.g., pump 1000A). Afifth conduit 1070 may be provided between the outlet (“OUT 4”) of thefourth pump and an assembly outlet (“OUT”), from which the fluid (e.g.,air) may exit the plasma generation device.

Some disclosed embodiments involve at least one processor. Consistentwith disclosed embodiments, “at least one processor” may include anyphysical device or group of devices having electric circuitry thatperforms a logic operation on an input or inputs. For example, the atleast one processor may include one or more integrated circuits (IC),including application-specific integrated circuit (ASIC), microchips,microcontrollers, microprocessors, all or part of a central processingunit (CPU), graphics processing unit (GPU), digital signal processor(DSP), field-programmable gate array (FPGA), server, virtual server, orother circuits suitable for executing instructions or performing logicoperations. The instructions executed by at least one processor may, forexample, be pre-loaded into a memory integrated with or embedded intothe controller or may be stored in a separate memory. The memory mayinclude a Random-Access Memory (RAM), a Read-Only Memory (ROM), a harddisk, an optical disk, a magnetic medium, a flash memory, otherpermanent, fixed, or volatile memory, or any other mechanism capable ofstoring instructions. In some embodiments, the at least one processormay include more than one processor. Each processor may have a similarconstruction, or the processors may be of differing constructions thatare electrically connected or disconnected from each other. For example,the processors may be separate circuits or integrated in a singlecircuit. When more than one processor is used, the processors may beconfigured to operate independently or collaboratively. The processorsmay be coupled electrically, magnetically, optically, acoustically,mechanically or by other means that permit them to interact. As anon-limiting example, the at least one processor may include processor102 of FIG. 1A.

The at least one processor may be configured to individually controleach of the vacuum pumps of the plasma generation device. For example,the at least one processor may send control signals to each of thevacuum pumps to activate the pump, deactivate the pump, or control oneor more operational parameters of the pump (e.g., the pump speed). Insome disclosed embodiments, the at least one processor may be configuredto simultaneously operate the plurality of vacuum pumps. For example,the at least one processor may cause some or all of the vacuum pumps inthe series to operate (i.e., perform a pumping operation) at the sametime while the object to be treated is in a region of the plasmageneration zone. The simultaneous operation of the pumps may create avacuum in the plasma generation zone so that plasma (e.g., cold plasma)may be generated for treating the object. As a non-limiting example,processor 102 of FIG. 1A may be configured to cause each of the vacuumpumps 1000A-1000D to operate (i.e., perform a pumping operation)simultaneously, while optical surface 706 is accommodated within plasmageneration zone 716. The simultaneous operation of vacuum pumps1000A-1000D may produce a vacuum of between 0.1 atm and 0.01 atm withinplasma generation zone 716. After reaction gas is introduced into theplasma generation zone, the electrode pair may be controlled to deliveran ionizing electromagnetic field to the gas (e.g., for 10 seconds) toproduce plasma for treating optical surface 706.

In some disclosed embodiments, the at least one processor is configuredto activate the plasma generator after the vacuum is caused by theseries of pumps. For example, the at least one processor may beconfigured to activate the series of vacuum pumps (e.g., simultaneouslyactivate) to remove air from the plasma generation zone in order toproduce a vacuum. Then, the at least one processor may cause a gasdelivery mechanism to deliver the reaction gas into the plasmageneration zone and may activate the plasma generator to ionize the gasand produce plasma.

In some disclosed embodiments, the at least one processor is configuredto cause plasma to be generated for a period of time sufficient to causea portion of the object to become hydrophilic. As discussed elsewhere inthe present disclosure, the term “hydrophilic” may refer to a tendencyor favorability of a molecule to be solvated by water. The at least oneprocessor may be configured to maintain activation of the plasmagenerator for a sufficient length of time to cause the external surface,or any other desired portion, of the object to become hydrophilic. Insome embodiments, the length of time may vary depending on the shape,size, and other properties of the object that is to be treated withplasma; accordingly, the at least one processor may be configured toalter the activation time of the plasma generator as required for theparticular object. As a non-limiting example, the at least one processor102 (FIG. 1A) may maintain activation of the plasma generator for asufficient length of time to cause the external surface of opticalelement 392 of viewport 390 to become hydrophilic, such as prevent fogfrom forming on viewport 390 during an endoscopy procedure. According tosome disclosed embodiments, the time period sufficient to cause opticalelement 392 to become hydrophilic may be less than a minute, less than45 seconds, less than 30 seconds, less than 15 seconds, or any othersuitable length of time.

In some disclosed embodiments, the at least one processor is configuredto receive an insertion signal indicating that the object is within theregion of the plasma generation zone. As discussed elsewhere in thepresent disclosure, an “insertion signal” may refer to any signalreceived from an insertion detector, for example any of the insertiondetectors described herein, which may indicate that the object to betreated is accommodated within the region of the plasma generation zone.Once the insertion signal is received, the at least one processor maydetermine that plasma generation may begin. Accordingly, the at leastone processor may be configured to activate the series of pumps to causethe vacuum within the plasma generation zone in response to theinsertion signal. Once the desired pressure is achieved within theplasma generation zone, the at least one processor may activate theplasma generator to ionize the reaction gas in order to generate plasma.

In some disclosed embodiments, the at least one processor is configuredto determine that the vacuum in the plasma generation zone is sufficientfor plasma generation. As discussed elsewhere in the present disclosure,the term “sufficient for plasma generation” may refer to a gas pressurethat is low enough to allow any gas remaining within the plasmageneration zone, or any reaction gas introduced after emptying theplasma generation zone, to ionize and generate plasma. In someembodiments, and as also discussed elsewhere in the present disclosure,the at least one processor may be configured to determine that thevacuum is sufficient for plasma generation based on pressure sensor dataobtained from within the plasma generation zone and/or another areawithin the housing. In some disclosed embodiments, the at least oneprocessor is configured to activate the plasma generator after thedetermination is made that the vacuum in the plasma generation zone issufficient for plasma generation, thereby exposing at least a portion ofthe object to plasma. In some embodiments, due to the vacuum in theplasma generation zone, cold plasma may be generated for treating theobject.

Some disclosed embodiments may include at least one filter configured tofilter air pumped from the plasma generation zone. As used herein, anair filter may refer to a device configured to remove particles such asdust, pollen, bacteria, and/or other impurities from the air. In someembodiments, the at least one air filter may be composed of a fibrous orporous material through which air may pass to be filtered. In someembodiments, the at least one filter may be a high efficiencyparticulate air (HEPA) filter, that is, a pleated mechanical air filterconfigured to remove at least 99.97% of dust, pollen, mold, bacteria,and any airborne particles with a size of 0.3 microns. The at least onefilter may be situated at any suitable location within the housing,including and not limited to a location within hose 720, an inlet ofvacuum pump assembly 1050, at one or more locations within pump manifold1060, at an outlet of vacuum pump assembly 1050, or at a fluid dischargeport of housing 710.

In some disclosed embodiments, the plasma generation zone is configuredto enable accommodation of the object surrounded by a dielectric casing.As used herein, a dielectric casing may refer to a dielectric barrier(discussed in detail elsewhere in the present disclosure) that is shapedand configured to at least partially surround an object, such as anobject to be treated with plasma. In some embodiments, the protectivesheath or shroud provided around the object to be treated (e.g., sheath718 of FIG. 7) may be constructed from a dielectric material, such thatthe sheath may be configured as a dielectric casing that may surroundthe object to be treated. The plasma generation zone may be configuredto enable accommodation of the object surrounded by the dielectriccasing since the plasma generation zone may be formed when the object tobe treated and the protective sheath (i.e., the dielectric casing) areaccommodated within the internal cavity of the housing. In somedisclosed embodiments, the plasma generator is configured to enableformation of plasma within the plasma generation zone to treat theobject when the object and the dielectric casing are inserted into thehousing. As a non-limiting example, FIG. 7 depicts a configuration ofplasma generating device 500 in which endoscope 708 (including opticalsurface 706) and protective sheath 718 (i.e., the dielectric casing) areinserted into cavity 714 of housing 710. In this configuration, anairtight plasma generation zone 716 may be formed within sheath 718,such that optical surface 706 may be exposed to the gas within theplasma generation zone. The at least one processor may activate theplasma generator to ionize the gas within plasma generation zone 716 inorder to treat optical surface 706.

In some disclosed embodiments, the dielectric casing includes a one-wayvalve for enabling vacuum formation within the casing. As used herein, aone-way valve may include a check valve, or a fluid-control deviceconfigured to only allow fluid flow in one direction. In someembodiments, the one-way valve may include a stop-check valve, swingcheck valve, ball check valve, or any other structure configured tolimit fluid flow to a single direction. In some embodiments, and asdiscussed above, the dielectric casing may include a protective sheathor shroud provided around the object to be treated with plasma. Theprotective sheath (i.e., the dielectric casing) may include a one-wayvalve permitting fluid to pass from inside of the plasma generation zoneto an area outside, but not to pass in the opposite direction. As aresult, an airtight seal of the plasma generation zone may be maintainedso that a vacuum may be formed. As a non-limiting example, FIG. 8Adepicts an example of a protective sheath 800 that is provided around anendoscope 802 and which may include a one-way valve 808 at or near aclosed end of the sheath 800. One-way valve 808 may be configured toallow fluid to pass from the interior of the sheath to an area outsideof the sheath but may prevent fluid from passing in the oppositedirection.

In some disclosed embodiments, the series of pumps may be configured tocause at least a partial vacuum within a portion of the dielectriccasing. As discussed herein, the series of pumps may be configured tocause a vacuum within the plasma generation zone, which may be locatedwithin the protective sheath (i.e., the dielectric casing) near theobject that is to be treated with plasma. For example, the series ofpumps may be configured to cause a vacuum of between 0.1 atm and 0.01atm within a portion of the dielectric casing (i.e., within the plasmageneration zone).

FIG. 20 is a block diagram illustrating a method 2010 consistent with adisclosed embodiment. The method 2010 of FIG. 20 may be implementedthrough software and/or using the hardware previously described.

At block 2012, an object is inserted into a plasma generation zone. Theobject may, for example, be a medical instrument as described earlier.At block 2014, while the object is in a region of the plasma generationzone, a plurality of vacuum pumps is simultaneously operated to cause avacuum within the plasma generation zone. As described earlier, thevacuum pumps may be connected in series. At block 2016, while the vacuumis caused within the plasma generation zone, plasma is activated therebyexposing the object to plasma. The plasma activation may occur asdescribed earlier.

Disclosed embodiments may involve inhibiting condensation distortion onan optical element of a medical instrument configured for insertion intoa body cavity. Condensation may include moisture, dampness, wetness,beading, or any other manifestation of water or other fluid collectingon a surface. For example, condensation may include the formation ofwater droplets on a surface, such as glass. Condensation distortion mayinclude an exaggeration, blurring, misrepresentation, contortion, or anyother change, caused by condensation, that makes something appeardifferent from an actual appearance. For example, condensationdistortion may include a foggy image visualized through a glass surfacewhen the glass surface is covered with water droplets. In surgicalprocedures, condensation distortion poses various problems, includinglens fogging, which limits clear visualization during such procedures.Thus, it is desirable to inhibit condensation distortion. Inhibitingcondensation distortion may include constraining, curbing, discouraging,hindering, obstructing, suppressing, preventing, minimizing, or anyother manner of restraining condensation distortion. For example,inhibiting condensation distortion on a glass surface may includereducing fogging on the surface by limiting the number or size of waterdroplets that accumulate on the surface.

An optical element may include a lens, prism, mirror, or any other partof an optical instrument which either reflects light or permits thepassage of light. It may be desirable to inhibit condensation distortionon an optical element because the characteristics of light passingthrough an optical element may be distorted by water collected on asurface of the optical element. For example, an optical element mayinclude a lens of medical instrument, such as an endoscope. A medicalinstrument may include a scope, catheter, tube, or any other device usedon the inner or outer part of the body for diagnosis or treatment of amedical condition. In some embodiments, the medical instrument isexposed to air which is greater than room temperature such as airlocated in the inner orifice of a human during a medical procedure. Insome embodiments, the medical instrument includes a scope and theoptical element may be located on a distal end of the scope. A scope mayinclude any instrument for viewing or examining any part of a body. Adistal end of the scope may include any site located away from aspecific area of the scope (i.e., located a distance from the endcontrolled or handled by medical personnel or robot controlled bymedical personnel), including the center of the scope. In some examples,a distal end may include parts of the scope further away from the centerof the scope. In some embodiments, the scope may be at least one of anendoscope, duodenoscope, or a laparoscope. In other examples, the scopemay include a laparoscope, fiberscope, bronchoscope, arthroscope,cystoscope, anoscope, gastroscope, sigmoidoscope, or any other medicaldevice used to look inside a body cavity or organ.

As used herein, “endoscope” may include any scope that has a distal endconfigured to be inserted into a patient's body, and a proximal endconfigured to remain outside the patient's body during the procedure.Typically, the distal end includes a viewport such as a lens or a windowor a bare end of an optical fiber or even a mirror (such as a dentistmirror for example). Through the viewport, the scope enables collectingan image of the surrounding of the viewport, e.g., using alight-sensitive device such as a CCD. The viewport may be aimed tocollect light from in front of the device (namely from a regioncoinciding with the longitudinal axis of the device), or the viewportmay be slanted in an angle relative to the longitudinal axis or may befacing perpendicular to the longitudinal axis of the device (as isdemonstrated for example in colonoscopies). The proximal end typicallyincludes or is connected to a handle to be held by a medicalpractitioner, possibly including user interface components such asswitches, navigating sticks, touch screens and touch pads. Endoscopesinclude a vast range of scopes, for example bronchoscopes, colonoscopes,cystoscopes and laparoscopes. A laparoscope—as a specificexample—comprises a rigid or relatively rigid rod or shaft having aviewport, possibly including an objective lens, at the distal end, andan eyepiece and/or an integrated visual display at the proximal end. Thescope may also be connected to a remote visual display device or a videocamera to record surgical procedures. A body cavity may include aperitoneum, dorsal cavity, back body cavity, cranial cavity, spinalcavity, ventral cavity, thoracic cavity, abdominopelvic cavity,abdominal cavity, pelvic cavity, bowel, stomach, esophagus, lung, bloodvessel, organ, or any other space or compartment in a body. In someexamples, a body cavity may include a space housing multiple organs,such as a thoracic cavity. In other examples, a body cavity may includea single organ, such as a heart. In yet other examples, a body cavitymay include a blood vessel, such as an aorta. Insertion into a bodycavity may include introducing, injecting, entering, embedding,implanting, or any other manner of placement into a body cavity. In oneexample, insertion into a body cavity may include introducing anendoscope into a blood vessel by guiding the endoscope into the bloodvessel. In some embodiments, the body cavity may be a surgical cavity ornatural orifice. It may be desirable to inhibit condensation distortionwhen a medical instrument is used within a surgical cavity in order tovisually examine an organ during surgery without having to make a largeincision. It may also be desirable to inhibit condensation distortionwhen a medical instrument is used with a natural orifice in order tovisually examine an organ during incisionless surgery or fornon-surgical procedures such as diagnosis based on organ visualization.A surgical cavity may include a hollow area or hole created for or aspart of a procedure in which a part of the body is cut, usually toexpose internal parts such as organs. For example, a surgical cavity mayinclude a hole in an abdomen created when a surgeon makes an incisionthrough the skin and muscle of the abdomen, so that the underlyingorgans can be viewed. A natural orifice may include a hollow area orhole that exists in a body from birth or by nature and is not caused byany incision. For example, a natural orifice may include the oral cavityor the vaginal cavity. In one example, an endoscope may be used inaccordance with transvaginal gall bladder removal through the naturalorifice of the vagina in order to inspect the inner organs that arevisible through the vaginal cavity.

Disclosed embodiments may include treating the optical element of themedical instrument to cause at least one surface of the optical elementto become super-hydrophilic. The term “treating” may refer to a process,procedure or protocol applied to modify one or more properties of aphysical object. In some embodiments, treating the optical element mayinclude applying a substance (e.g., plasma) to the optical element,exposing the optical element to a condition, or any other interactionwith the optical element that may cause the optical element to becomesuper-hydrophilic. The term “super-hydrophilic” may refer to a very highlevel of hydrophilicity, for example sufficiently hydrophilic tosubstantially decrease a contact angle between a fluid and the surfaceof the object, e.g., so as to allow the fluid to coat the surface of theobject as a substantially uniform (e.g., flat) layer. It may bedesirable to treat the optical element of the medical instrument tocause at least one surface of the optical element to becomesuper-hydrophilic because super-hydrophilic surfaces are less prone tofogging caused by condensation, which may limit condensation distortionof the optical element. A substance may include any material thatpossesses physical properties, such as a liquid, solid, gas, or plasma.Applying a substance to the optical element to treat the optical elementmay be desirable because an amount of the substance may be controlled,such that the amount of the substance applied may be increased ordecreased to achieve a desired level of hydrophilicity orsuper-hydrophilicity. In one example, treating the optical element mayinclude applying a liquid coating to the optical element. In anotherexample, treating the optical element may include exposing the opticalelement to a gaseous or plasma-based substance. A condition may includea temperature, location, habitat, setting, or any other factorassociated with the circumstances of the optical element. In oneexample, exposing the optical element to a condition may includeincreasing the temperature of the optical element. In another example,exposing the optical element to a condition may include reducing thepressure of the region around the optical element. An interaction withthe optical element may include a communication, contact, cooperation,movement, or any other type of action performed in association with theoptical element. In one example, an interaction with the optical elementmay include moving the optical element. In another example, aninteraction with the optical element may include contacting the opticalelement with any substance or object.

In some embodiments, treating the optical element may occur in a vacuumchamber. A vacuum chamber may include any rigid enclosure from which airor other gases are removed to some degree by a vacuum pump, resulting ina low-pressure environment within the enclosure (e.g., a sub-atmosphericpressure environment). In some examples, the pressure within the vacuumchamber may be less than 0.3 atm. In other examples, the pressure withinthe vacuum chamber may be less than 0.1 atm. In yet other examples, thepressure within the vacuum chamber may be between 0.1 to 0.01 atm. Itmay be desirable to treat the optical element in a vacuum chamber inorder to improve the resulting hydrophilicity of the optical element. Insome examples, the vacuum chamber may be incorporated into the medicalinstrument. In other examples, the vacuum chamber may include anadditional device used in conjunction with the medical instrument.

In some embodiments, treating the optical element may include exposingthe optical surface to plasma. The term “plasma” may refer to a state ofmatter containing an abundance of charged particles, e.g., electrons andions. Consequently, plasma may be highly electrically conductive andsensitive to electric and/or electromagnetic fields. It may be desirableto expose the optical surface to plasma in order to improve thehydrophilicity of the optical element. Specifically, during ahydrophilic treatment, the surface undergoes oxidation and thebombarding plasma ions form hydroxyl groups on the surface. Thesehydroxyl groups are polar, and since water is polar, it is attracted tothem. Ultimately, this is what enhances the surface's wettability andadhesion, which in turn makes it more hydrophilic. Exposing the opticalsurface to plasma may include continuously contacting the opticalsurface with plasma. Exposing the optical surface to plasma may alsoinclude intermittently contacting the optical surface with plasma.

In some embodiments, treating the optical element may include coatingthe optical surface with a liquid solution. A liquid solution mayinclude any homogenous mixture composed of two or more components. Forexample, a liquid solution may include a hydrophilic mixture that formsa covalent bond to create water-attracting surfaces. Coating the opticalsurface with a liquid solution may include dip coating, spray coating,reel-to-reel coating, robotic coating, spin coating, submersion coating,or any other manner of contacting the optical surface with the liquidsolution.

In some embodiments, causing the at least one surface of the opticalelement to become super-hydrophilic may include enabling, for at leastone hour after treating the optical element, droplets hitting the atleast one surface of the optical element to have contact angles of lessthan 10 degrees. For example, causing the at least one surface of theoptical element to become super-hydrophilic may include sufficientlytreating the at least one surface to enable for 45 minutes aftertreating the optical element, droplets hitting the at least one surfaceof the optical element to have contact angles of less than 10 degrees.The contact angle is a quantitative measure of the hydrophilicity of asurface or material. If the contact angle of water is less than acertain degree, the surface may be designated hydrophilic since theforces of interaction between water and the surface nearly equal thecohesive forces of bulk water and water does not cleanly drain from thesurface. If the liquid molecules are strongly attracted to the solidmolecules then the liquid drop will completely spread out on the solidsurface and create a completely hydrophilic surface, corresponding to acontact angle of 0°. In some embodiments, the contact angles may be lessthan 30 degrees. In some embodiments, the contact angles may be lessthan 20 degrees. In some embodiments, the contact angles may be lessthan 8.5 degrees. In some embodiments, the contact angles may be lessthan 7.5 degrees. For example, causing the at least one surface of theoptical element to become super-hydrophilic may include sufficientlytreating the at least one surface such that for forty-five minutes aftertreating the optical element, droplets hitting the at least one surfaceof the optical element to have contact angles of 7 degrees or less. Insome embodiments, the contact angles may be less than 5 degrees.

In some embodiments, causing the at least one surface of the opticalelement to become super-hydrophilic may include treating the opticalelement for less than 30 seconds. It may be desirable to treat theoptical element for less than 30 seconds when using a treatment that ishighly effective within a short period of time. It may also be desirableto treat the optical element for less than 30 seconds when there is anurgent need for an endoscope with improved condensation distortioninhibition in a surgical procedure. For example, causing the at leastone surface of the optical element to become super-hydrophilic mayinclude treating the optical element for 20 seconds.

In some embodiments, treating the optical element may include causing asuper-hydrophilic state of the at least one surface of the opticalelement that deteriorates over time. Over time, a super-hydrophilicstate of the at least one surface of the optical element maydeteriorate, such that the degree of hydrophilicity changes. In someinstances, it may be desirable (or at least acceptable) to have asuper-hydrophilic state such that droplets hitting the at least onesurface of the optical element have contact angles of 7 degrees. Inother instances, it may be desirable (or acceptable) to have asuper-hydrophilic state such that droplets hitting the at least onesurface of the optical element have contact angles of 10 degrees. Insuch situations, deterioration of the super-hydrophilic state may beacceptable so that the same medical instrument can be used in bothinstances. Deterioration may include decline, degradation, worsening,lessening, retrogression, decay, or any other process of becomingimpaired or inferior in the quality, functioning, or condition of beingsuper-hydrophilic. For example, causing a super-hydrophilic state of theat least one surface of the optical element that deteriorates over timemay include causing the super-hydrophilic state to reduce to ahydrophilic state within 48 hours. In another example, causing asuper-hydrophilic state of the at least one surface of the opticalelement that deteriorates over time may include causing thesuper-hydrophilic state to reduce to a hydrophobic state within 48hours.

In some embodiments, the deterioration of the super-hydrophilic state ofthe at least one surface of the optical element may occur within 24hours. For example, the same medical instrument may be used for variousvisualization or surgical procedures within a single day (e.g., forsurgeries with long durations). For example, causing a super-hydrophilicstate of the at least one surface of the optical element thatdeteriorates over time may include treating the at least one surface sothat its super-hydrophilic state remains for about 24 hours. In anotherexample, causing a super-hydrophilic state of the at least one surfaceof the optical element that deteriorates over time may include causingthe super-hydrophilic state to reduce to a water neutral or hydrophobicstate within 24 hours.

In some embodiments, treating the optical element includes maintaining aliquid in contact with the optical element for a period sufficient tocause the at least one surface of the optical element to becomesuper-hydrophilic. The liquid may include any fluid that may cause theat least one surface of the optical element to become super-hydrophilic,including any fluid capable of participating in dynamic hydrogen bondingwith surrounding water. In some embodiments, the liquid may be used toprovide a hydrophilic coating to the hydrophilic surface of the opticalelement prior to exposure to hot air. In some examples, the liquid maybe ionic. In other examples, the liquid maybe negatively charged inorder to further facilitate aqueous interactions, which in someinstances may give rise to hydrogel materials that may exhibit lowcoefficients of friction. As one example, the liquid may be VitreOx™.Maintaining the liquid in contact with the optical element may includecoating the optical element with the liquid, submerging the opticalelement in the liquid, continuously exposing a flow of the liquid to theoptical element, or in any other way continuing contact between theliquid or the optical element. A period sufficient to cause the at leastone surface of the optical element to become super-hydrophilic mayinclude a single period or a plurality of periods. In some examples, theperiod may be the same for a plurality of liquids. In other examples theperiod may be different for a plurality of liquids. In some examples,the period may be the same for a plurality of types of optical elements.In other examples, the period may be different for a plurality of typesof optical elements.

Disclosed embodiments may include inserting the medical instrument, withthe super-hydrophilic element, into the body cavity. Inserting themedical instrument into the body cavity may include embedding, entering,implanting, injecting, introducing, admitting, interposing, placing,setting, or in any other way bringing optics of the medical instrumentto a location within a body cavity. It may be desirable to insert themedical instrument, with the super-hydrophilic element, into the bodycavity in order to improve the functioning of an endoscope inserted intothe body by improving image visualization through the reduction of imagedistortion by fogging. In some examples, the entire super-hydrophilicelement may be inserted into the body cavity. In other examples, only aportion of the super-hydrophilic element may be inserted into the bodycavity.

Some embodiments further include applying a liquid to the opticalelement prior to inserting the medical instrument into the body cavity.A liquid may include any fluid material, such as water or hydrophilicsubstance. Applying a liquid to the optical element prior to insertingthe medical instrument into the body cavity may be desirable in order toverify that the treatment of the optical element to cause the at leastone surface of the optical element to become super-hydrophilic wassuccessful. If after applying the liquid to the optical element prior toinserting the medical instrument into the body cavity, the opticalelement still experiences condensation distortion, then it may bedesirable to again treat the optical element prior to inserting themedical instrument into the body cavity, in order to improvevisualization using the optical element.

Some disclosed embodiments include exposing the super-hydrophilicoptical element to moisture, such that the moisture forms a film barrieron the at least one surface of the optical element to thereby inhibitcondensation distortion. Moisture may include a liquid, fog, humidity,dampness, wetness, or any other presence of a liquid caused by exposureto liquids, such as one or more body fluids or moisture within the body.Exposing the super-hydrophilic optical element to moisture may includeintroducing, contacting, touching, or in any other way causing aninteraction between the super-hydrophilic optical element and moisture.In one example, exposing the super-hydrophilic optical element tomoisture may include contacting a portion of the super-hydrophilicoptical element with moisture. In another example, exposing thesuper-hydrophilic optical element to moisture may include locating theoptical element in an environment and facilitating condensation on theoptical element. A film barrier may include a covering, lamination,coating, covering, membrane, partition, sheet, or any other thinseparation layer. The film barrier may inhibit condensation distortionby reducing or even eliminating the formation of water droplets on theat least one surface of the optical element.

In some embodiments, the method may further include, after inserting themedical instrument into the body cavity, re-treating the optical elementto cause the at least one surface of the optical element to becomesuper-hydrophilic. It may be desirable to re-treat the optical elementto cause the at least one surface of the optical element to becomesuper-hydrophilic after inserting the medical instrument into the bodycavity in order to return the surface to a super-hydrophilic statefollowing a deterioration of the super-hydrophilic state. It may also bedesirable to re-treat the optical element to cause the at least onesurface of the optical element to become super-hydrophilic afterinserting the medical instrument into the body cavity in order toachieve a higher level of super-hydrophilicity if the medical instrumentis still experiencing an unwanted amount of condensation distortion. Forexample, the initial treatment of the optical element may cause the atleast one surface of the optical element to become super-hydrophilicsuch that droplets hitting the at least one surface of the opticalelement have contact angles of less than 10 degrees. Thesuper-hydrophilic state of the surface of the optical element may thendeteriorate over time such that droplets hitting the at least onesurface of the optical element have contact angles greater than 10degrees and less than 30 degrees. In this example, re-treating theoptical element to cause the at least one surface of the optical elementto become super-hydrophilic may include causing the droplets hitting theat least one surface of the optical element to have contact angles ofless than 10 degrees, in order to return the surface to a desiredsuper-hydrophilic state for the procedure.

Some embodiments further include re-treating the optical element tocause the at least one surface of the optical element to becomesuper-hydrophilic at least one additional time within 24 hours oftreating the optical element. It may be desirable to re-treat theoptical element to cause the at least one surface of the optical elementto become super-hydrophilic at least one additional time within 24 hoursof treating the optical element so that the same medical instrument maycontinue to be used in a lengthy surgical procedure. For example, theinitial treatment of the optical element may cause the at least onesurface of the optical element to become super-hydrophilic such thatdroplets hitting the at least one surface of the optical element havecontact angles of less than 10 degrees, where the super-hydrophilicstate deteriorates over time. The super-hydrophilic state of the surfaceof the optical element may then deteriorate throughout the day such thatdroplets hitting the at least one surface of the optical element havecontact angles greater than 10 degrees. In this example, re-treating theoptical element to cause the at least one surface of the optical elementto become super-hydrophilic may include causing the droplets hitting theat least one surface of the optical element to have contact angles ofless than 10 degrees within 15 hours, in order to return the surface toa desired super-hydrophilic state for the procedure within the same day.

In some embodiments, the at least one additional re-treatment of theoptical element includes executing the at least one additionalre-treatment by a battery-powered plasma generator. The term “plasmagenerator” may refer to a device configured to generate plasma, e.g.,inside a plasma generation zone. The term “plasma generation zone” mayrefer to a physical volume or space in which a plasma cloud may beformed, e.g., by igniting a gas introduced therein. The plasmageneration zone may be of any size. For example, the plasma generationzone may be less than 15 cm³, less than 10 cm³, or less than 5 cm³. Theplasma generator may generate an electromagnetic field within the plasmageneration zone, such that exposing a gas to the electromagnetic fieldignites the gas to generate plasma.

A battery-powered plasma generator may include any device or system thatincludes a battery for powering the device and is capable of formingplasma. Such a device or system may be configured to treat objects witha plasma cloud by executing one or more actions and/or functions basedon computer program instructions that may be generated and/or receivedfrom at least one processor. The formation of a plasma cloud may beachieved by subjecting gas to a strong electromagnetic field to thepoint where an ionized gaseous substance becomes increasinglyelectrically conductive. FIG. 1 schematically depicts a plasma generator100, according to an aspects of some embodiments. Plasma generator 100may include an operating unit 120 and a plasma applicator 130electrically associated with operating unit 120, e.g., via a cable 112.Operating unit 120 may be associated with at least one processor 102(e.g., a controller), a power supply 104 and/or 530, which may be abattery, circuitry 106, and at least one memory 108. At least oneprocessor 102 may be communicatively coupled to at least one memory 108using wired and/or wireless means, e.g., via bus system 110. At leastone processor 102 may be further electrically coupled to power supply530 and circuity 106, e.g., via a bus system 110. At least one processor102 may be configured to execute one or more program code instructionswith respect to one or more data items stored in at least one memory108. The at least one program code instruction may facilitate incontrolling one or operational aspects of plasma generation system 100,e.g., to control the generation of plasma via plasma applicator 130. Forexample, at least one processor 102 may control and moderate one or moreattributes of energy supplied by power supply 530 (e.g., as electricpower) to plasma applicator 130 for the purpose of generating plasma totreat an object, for example by controlling one or more components(e.g., switches, diodes, and other logical componentry) of circuity 106.While at least one processor 102, power supply 530, circuity 106, and atleast one memory 108 are shown inside operating unit 120, this isintended for illustrative purposes only and does not limit the inventionto the configuration illustrated. For example, at least one processor102 and at least one memory 108 may include multiple local and/or remoteprocessors and memory units, as known in the art of distributedcomputing. Similarly, while FIG. 1 shows power supply 104 and circuitry106 positioned within operating unit 120, this is not required, andpower supply 104 and/or circuitry 106 may be external to operating unit120, e.g., power supply 104 may be within a wall unit that is coupled tooperating unit 120 via cable.

FIGS. 5A-5C illustrate three views of a plasma generating system 500, inaccordance with some embodiments of the present disclosure. In someembodiments, plasma generating system 500 may correspond to plasmagenerating field applicator 130 (FIG. 1) in that plasma generatingsystem 500 may be configured to receive energy for carrying out a plasmatreatment, e.g., via circuity 106, power supply (battery) 530, at leastone processor 102, and cable 112 (FIG. 1). As illustrated in the figure,Plasma generating system 500 may include a housing 510 having, a cavity502 and accommodating, a plasma activation generation zone 504 (e.g.,plasma activation zone), a plasma generator 506, and a controller 508.Plasma generating system 500 may include a plasma-generation activationzone 504 within the cavity 502 and arranged such that when the at leasta portion of the medical instrument having an optical element isretained within the cavity 502, the optical element is located withinthe plasma plasma-activation generation zone 504. Plasma generator 506may generate plasma for treating an object (e.g., a medical instrument)within plasma generation zone 504 in accordance with embodimentsdisclosed herein. Cavity 502 of housing 510 may correspond to slot 132(FIG. 1). Cavity 502 may provide access to plasma generation zone 504,e.g., to enable inserting an object into plasma generation zone 504 forcarrying out a plasma treatment to increase the hydrophilicity of theobject. Controller 508 may control one or more aspects of plasmagenerator 506, such as the influx and/or outflow of gas into plasmaactivation zone 504 for the purpose of generating plasma, the generationof an electric and/or electromagnetic field for generating plasma, andany other parameter relevant to the generation of plasma via plasmagenerator 506. Plasma generating system 500 may further include one ormore sensors, such as a pressure sensor, a voltage sensor 514 and aplasma frequency sensor 512.

In some embodiments, the at least one additional re-treatment of theoptical element includes using the battery-powered plasma generatorwithout charging the battery-powered plasma generator between thetreatment and the at least one additional re-treatment. Charging mayinclude storing energy in the battery of the battery-powered plasmagenerator by running an electrical protocol. The charging protocol,including how much voltage or current is introduced and for how long itis introduced, may depend on the size and type of the battery beingcharged. It may be desirable to use the battery-powered plasma generatorwithout charging the battery-powered plasma generator between thetreatment and the at least one additional re-treatment in order toimprove energy efficiency while using the battery-powered plasmagenerator. In one example, the at least one additional re-treatment ofthe optical element may include using the battery-powered plasmagenerator without charging the battery-powered plasma generator betweenthe treatment and one additional re-treatment. In another example, theat least one additional re-treatment of the optical element may includeusing the battery-powered plasma generator without charging thebattery-powered plasma generator between the treatment and twoadditional re-treatments.

Some embodiments further include estimating a number of remainingtreatments of the optical element that can be performed beforemaintenance is required. Estimating a number of remaining treatments ofthe optical element that can be performed before maintenance is requiredmay be performed either manually by a user of the plasma generator orautomatically by the plasma generator. For example, a user may estimatebased on the charge-holding history of the associated battery, that aremaining four treatments of the optical element can be performed beforemaintenance is required. In another example, the plasma generator mayautomatically determine, based on the charge-holding history of theassociated battery, that a remaining three treatments of the opticalelement can be performed before maintenance is required. Maintenance mayinclude maintenance of the plasma generator or any other device used inconjunction with the disclosed embodiments. Maintenance may includeupdating, fixing, replacing, or repairing the battery or any othercomponent of the plasma generator. In one example, maintenance mayinclude charging the battery when it is estimated that no remainingtreatments of the optical element can be performed before maintenance isrequired. In another example, maintenance may include replacing thebattery when it is estimated that no remaining treatments of the opticalelement can be performed before maintenance is required. By way of otherexamples, maintenance may include replacing a filter or a gas canisteror replacing an electrode.

Disclosed embodiments may involve methods for treating an endoscope tomake it super hydrophilic. FIG. 15 illustrates an exemplary method 1505for inhibiting condensation distortion on an optical element of amedical instrument configured for insertion into a body cavity,consistent with some embodiments of the present disclosure. As shown instep 1510, the method 1505 may involve treating the optical element ofthe medical instrument to cause at least one surface of the opticalelement to become super-hydrophilic. The method 1505 may also involveinserting the medical instrument, with the super-hydrophilic opticalelement, into the body cavity, as shown in step 1512. Step 1514 showsthat the method 1505 may also involve exposing the super-hydrophilicoptical element to moisture, such that the moisture forms a film barrieron the at least one surface of the optical element to thereby inhibitcondensation distortion.

Minimally invasive surgery involves a variety of techniques to operatewith less damage to the body compared to open surgery. Generally,minimally invasive surgery is associated with less pain, shorterhospital stays, and fewer complications. Laparoscopy—surgery donethrough one or more small incisions, using small tubes and tiny camerasand surgical instruments—was one of the first types of minimallyinvasive surgery. Another type of minimally invasive surgery is roboticsurgery. It provides a magnified 3D view of the surgical site and helpsthe surgeon operate with precision, flexibility and control.

Experience shows that images collected by optical instruments insertedto the patient's body tend to blur due to accumulation of fog on thesurface of the optical element of the instrument. As discussed above,the local environment within the patient's body is generally humid andwarm compared to ambient conditions. Consequently, the optical elementof the instrument, following insertion to the body, tends to accumulatefog, that is to say to accumulate condensed vapor on the surface of theoptical element.

One reason that condensation of vapor on an optical element might causeblur, is that the condensed liquid—e.g. water, possibly mixed with bodyfluids—condenses into droplets which distort the light rays passingthrough the droplets, thereby ruining the optical quality of the opticalelement. In other words, each droplet might function as a lens, focusingor diverging or generally distorting the light rays passing therethroughin uncontrolled manner. The total effect of the multitude of droplets onthe optical element is thus generating an optically rough surface,thereby preventing obtaining a sharp image from light passing theoptical element (or reflecting therefrom).

It is noted that some medical instruments intended for collecting imagesas described herein may operate outside the visible spectrum of light,namely with non-visible radiation, such as in the near infra-red (IR)spectrum, using optical elements. Such optical elements may sufferdeterioration in optical quality due to accumulation of fog similarly tooptical elements operating in the visible spectrum. Consequently, theteachings herein should be understood as applicable to optical elementsand optical systems in the wide sense, including such that operate withnon-visible light. It is further noted that accumulation of fog on asurface of an optical element may affect not only incoming light raysbut may also divert or even absorb light rays extending out from anoptical device and may thus hinder the operation of light-emittingelements, too. Aspects of the invention thus relate to treating anoptical element of a medical device, as detailed below, be it a lightcollecting device or a light emitting device or a combination of both.

There is thus provided, according to an aspect of some embodiments, amethod of treating an optical to prevent it from fogging during use.According to some embodiments the optical element may be an opticalelement of a medical device that is inserted into the patient's bodyduring use, such as an endoscope. The method includes increasinghydrophilicity of the optical surface of the optical element. In someembodiments the method includes applying a plasma-generatingelectromagnetic field in close vicinity to the optical element, so as tocause such increase in hydrophilicity. The treatment process may beprovided prior using the medical device in the medical procedure.According to some embodiments the method may be applied during themedical procedure as the medical device is removed from the patient'sbody for treatment and consequently re-introduced to the patient's body.

Increasing hydrophilicity of the optical surface is achieved byincreasing the surface tension of the optical surface. As the surfacetension of the treated surface increases and approaches the surfacetension of water, the contact angle of water droplets on the opticalsurface decreases, and each droplet tends to spread on the surface andform a more flattened and less curved structure. Complete wetting isachieved by increasing the surface tension of the treated surface toabove the surface tension of water, namely above 0.072 N/m. When thesurface tension of the treated surface is higher than the surfacetension of water, water does not accumulate in droplets on the surfacebut rather wet the surface, having a contact angle of substantially 0degrees. Thus, the method eliminates or at least significantly reducesblur due to fogging because condensation of moisture on the hydrophilicsurface of the optical element results in a thin and even layer offluid, thereby maintaining the optical quality of the optical element orat least limiting the degradation of the optical quality. Variations offluid thickness on the optical element is reduced by the plasmatreatment, and thereby variability in optical lengths associated withpassing of light through the condensed fluid on the optical element isreduced as well.

The effects of plasma treatment on hydrophilicity of a treated surfaceare often temporary, so that hydrophilicity of a treated surface tendsto decrease over time after the exposure to plasma ends. The method maythus further include using the optical element (or the device in whichthe optical element is installed)—namely exposing the optical element tomoisture—soon after applying the plasma. “Soon after” means within 24hours, preferably within 6 hours and even more preferably using theoptical element within less than an hour after applying the plasmathereto. Moreover, other treatments or processes applied to theinstrument's surface after such plasma treatment—sterilization as oneexample—might decrease or eliminate altogether the effects of the plasmatreatment. It is therefore most preferable to apply the method ofincreasing hydrophilicity according to the teachings herein immediatelyprior to the medical procedure itself, to apply it on a medical devicethat has already been sterilized and carry it out under sterileconditions while maintaining the sterility of the medical device.

Medical devices having an optical element that may require plasmatreatment as described herein, may have a variety of shapes and sizes.For example, laparoscopes have diameters in the range of 5-10 mm andeven beyond. In some laparoscopy procedures, two laparoscopes may beused, typically sequentially, during a single procedure applied to asingle patient. For example, entering the abdominal cavity under visionis a known technique which may be performed with a direct vision trocar.A first laparoscope may be placed directly into the trocar sheath sothat the trocar end can be seen and followed. As the trocar is pushedand advanced into the peritoneal cavity, each layer of the abdominalwall may be visualized and registered. Following insertion of thetrocar, a second laparoscope may be inserted over the trocar to allowinspection of the procedure inside the abdominal cavity. When roboticsurgery is employed, the second laparoscope, being part of the robot, isevidently different from the first, and may consequently have adifferent diameter. It is therefore advantageous that a system, anapparatus or a device for treating an endoscope prior to or during amedical procedure, would be compatible with medical devices intended foruse in a same procedure, of various shapes and dimensions. Particularly,it is advantageous if endoscopes having distal segments of differentdiameters, may be treated according to the teachings herein in a singlesystem, apparatus or device.

Medical devices that may require treatment according to the teachingsherein vary greatly not only in dimensions but also in types. Forexample, some endoscopes—e.g. laparoscopes—are rigid, having a metallicsheath in the distal segment thereof. Other endoscopes—e.g.colonoscopes—are typically flexible, having a non-rigid distal segment,namely such that does not include a metallic tube enveloping the distalsegment, thus their distal segment has a substantially dielectricsurface. Yet some types of endoscopes exist in both rigid and flexibleconfigurations. Further, endoscopes of various types may have distalsegments with very different diameters. For example, pediatriccolonoscopes have distal segments with outer diameters in the range of11-12 mm. Adult colonoscopes are even wider, with an outer diameter of12.8 mm. Cystoscopes are available in both flexible and rigidconfigurations, the rigid ones typically having metallic externalsheaths. Distal segments' diameters of flexible cystoscopes rangebetween 14 F and 16.2 F (1F=0.33 mm). Diameters of rigid cystoscopesvary between 6 F and 27 F whereas the most commonly used cystoscopes inadults have diameters ranging between 15 F and 25 F. Rigid bronchoscopesmay have outside dimeters ranging from 8.2 mm (size 6) for adolescents,down to 3.7 mm (size 2.5) for premature infants. Arthroscopes sheaths(used for diagnosing and treating joint problems) have outer diametersranging from 6mm and more, down to 2.5 mm and even 1.9 mm.

It is thus advantageous to have a system that requires only minoradaptations to allow the system treating a large variety of medicaldevices. It is further advantageous to have a method of treating amedical device according to the teachings herein, that may employ asystem capable of providing such a treatment, requiring only minoradaptations to treat medical devices that are different from oneanother. For example, it is advantageous to have a system including auniversal operational unit and an adapter—or a set of adapters—eachconfigured to adapt the universal operational unit to treating aspecific medical device or a specific type of medical devices or a groupof medical devices used in a same procedure given to a single patient.Different adapters may be needed to treat different types of medicaldevices or treat devices that differ in some other parameter. It isnoted that in the description herein, differences between medicaldevices may include—but are not necessarily limited to—differences inshape, in dimension and in mechanical structure and electricalproperties. Difference in electrical properties may include for examplehaving a distal segment that is electrically conducting (e.g. due to anenveloping metallic sheath) or alternatively a distal segment that iselectrically insulating (having a dielectric material on the externalsurface). It may further be advantageous that such a universaloperational unit could identify and/or certify an adapter in use, toadapt certain operational parameters to the specific adapter and/or tothe medical device being treated with the adapter.

FIG. 21A schematically depicts an apparatus 21100, according to anaspect of some embodiments, for preparing a medical device 21200 such asan endoscope, to a medical procedure. Medical device 21200 includes adistal segment 21210, schematically depicted also in FIG. 21B. Distalsegment 21210 includes an optical element 21220 configured to enablecollecting an image of the surroundings of the optical element. Opticalelement 21220 may be in some embodiments a transparent sheet such as awindow or a lens, of material such as glass or quartz, or plastic suchas Perspex, thereby allowing light from the outside of the medicaldevice 21200 to be collected in the inside of medical device 21200, e.g.by a light sensitive device (not shown here) such as a camera. Accordingto some embodiments optical element 21220 may be a mirror, reflectinglight (rather than transferring light there through) towards a lightcollecting apparatus (not shown here) or a light sensitive device.Optical element 21220 includes an optical surface 21222 which during amedical procedure may be exposed to moisture. Consequently, if nottreated to prevent fogging, optical surface 21222 may thereby becomecovered with fog, such fog being the result of accumulation of dropletson the optical surface 21222, e.g. (but not limited to) due tocondensation of vapor.

Apparatus 21100 includes an adapter 21110 dimensioned to receive thereindistal segment 21210 of the medical device 21200. Apparatus 21100further includes an operational unit 21120 detached from adapter 21110.Operational unit 21120 includes a slot 21122 configured to receivetherein distal segment 21210 of medical device 21200, whereas distalsegment 21210 is shrouded within adapter 21110. In other words, for use,distal segment 21210 of medical device 21200 is inserted into adapter21110, and adapter 21110, with distal segment 21210 being shroudedtherein, is inserted into slot 21122. According to some embodimentsadapter 21110 is inserted into slot 21122, and then distal segment 21210is inserted and advanced into adapter 21110.

Operational unit 21120 includes an electric power source (not shownhere). Operational unit 21120 is further configured, when distal segment21210, shrouded within adapter 21110, is positioned inside slot 21122,and upon activation of the power source, to apply inside adapter 21110inside slot 21122 an electric field suitable for plasma generationproximal optical surface 21222. In some embodiments operational unit21120 is energized from an external energy source e.g. from a walloutlet via a cable 21130. In some embodiments the operational unit maybe energized by an internal energy source such as a battery, for examplea rechargeable battery.

According to some embodiments operational unit 21120 may be fluidlyassociated with a gas pump and additionally or alternatively with a gasreservoir (neither one is shown here) via one or more gas tube(s) 21132.The gas pump and the gas reservoir may be used to controllably evacuate,or to controllably flush with a preferred gas, respectively, a vicinityof the distal segment of the endoscope, to facilitate plasma ignition,as is further detailed and explained below. According to someembodiments, a preferred gas may be helium, argon or nitrogen. Accordingto some embodiments, a gas pressure suitable for plasma ignition afterevacuation may be below 0.1Atm. According to some embodiments, thevicinity of the distal segment of the endoscope may be pumped andevacuated and then flushed with a desired gas. According to someembodiments, the gas pump and/or the gas reservoir, as the case may be,may be optionally situated in the operational unit 21120.

Operational unit 21120 is configured to enable a user of apparatus 21100to operate and control the apparatus. Operational unit 21120 may thusinclude command switches 21134, such as physical or virtual switches.Operational unit 21120 may further include indicators 136 for providinga user with required data and information for operating the apparatus,such as indication LEDs, displays and possibly an operating software forproviding a user with operating and command screens to allow a user tooperate and command the apparatus.

According to some embodiments operational unit 21120 is required to beportable, so it can be freely moved and positioned in any requiredlocation in the operation room. In other words operational unit 21120 isrequired to be operable while being disconnected from any other object,particularly from a fixed object such as a wall outlet. In suchembodiments, operational unit 21120 may be energized by an internalbattery, and in some embodiments, which require gas pumping or flushing,operational unit 21120 may include a gas pump and/or a gas reservoir(neither are shown here). Embodiments of operational unit 21120 whereinthe operational unit is portable as described herein, may be void ofcable 21130 and of gas tube(s) 21132, or the cable and the gas tube(s)may be out of use.

FIG. 21C schematically depicts an apparatus 21100 a including anoperational unit 21120 a which is portable as described above. Apparatus21100 a further includes a sterility cup 21150 and an adapter 21110including a cup cover 21152 configured to close sterility cup 21150.Sterility cup 21150 and cup cover 21152 are intended to provide asterile environment for treating the medical device, prior or during amedical operation, while using operational unit 21120 a which may benon-sterile. sterility cup 21150, cup cover 21152 and adapter 21110 amay be dispensable, disposable or replaceable parts, being configured tobe used during a single medical procedure carried out on a singlepatient. According to some embodiments, the adapter functions as asterility barrier between the medical device which should be kept clearof contamination, and the operational unit, which may be exposed tocontamination and is considered non-sterile.

For use, the sterility cup 21150, cup cover 21152 and adapter 21110 maybe supplied in one or more sterile packages which are opened in asterile environment prior to activating the apparatus. Operational unit21120 may then be inserted into sterility cup 21150 as is depicted inFIG. 21C. Further, adapter 21110 may be attached to cup cover 21152 asis depicted in FIG. 21C. Additionally or alternatively, adapter 21110and cup cover 21152 may be supplied being attached together as depictedin the Figure. By inserting the adapter to the slot 21122, while closingthe sterility cup 21150 with the cup cover 21152, sterile environmentmay be provided in the surroundings outside of the cup. In other words,sterility cup 21150, closed by cup cover 21152, functions as amicrobially sealed case enclosing the operational unit there within andpreventing spreading contamination originating from the operational unitoutside the cup. Furthermore, the medical device' distal segment 21210may be inserted into the sterile adapter 21110, for treatment.

According to some embodiments, inserting the distal segment 21210 to theadapter activates the operational unit, as is further detailed andexplained below. In some embodiments, the user may turn on theoperational unit using a physical switch, prior to closing the cup withthe cup cover, thereby switching the operational unit into a ‘standby’state. Then, inserting the distal segment into the adapter, may activatethe operational unit to perform plasma treatment. In some embodimentsthe cup cover 21152, and optionally the sterility cup 21150, aretransparent so the user may see the operational indicators 136 andmonitor the progress of the treatment.

FIGS. 22A and 22C schematically depict in a cross-sectional view, anembodiment of an adapter 22300 according to an aspect of the invention.Adapter 22300 is particularly suitable for use with a medical devicesuch as an endoscope 22400, depicted schematically inside a hollowcylinder 22312 of adapter 22300 in FIG. 22C whereas adapter 22300 isinside a slot 22422 of an operational unit 22420. Endoscope 22400includes a distal segment 22402 and an electrically conductingsurface—e.g. a metallic surface 22404—at distal segment 22402, proximalan optical element 22406. Optical element 22406 further includes anoptical surface 22408, which may be subject to plasma treatment asdescribed herein.

Adapter 22300 is configured to provide a sterile environment to amedical device inserted thereto, hence it is microbially sealed toexternal contaminants. In other words, adapter 22300 is configured toprevent penetration of contaminants from the surroundings of theadapter—e.g. from the operational unit—through the walls of the hollowcylinder to the inside thereof, when the adapter is in the slot of theoperational unit. Further, adapter 22300 is configured to provide aconfined space which is gas sealed when the medical device is insertedinto the hollow cylinder of the adapter. The confined space which isgas-sealed may be fluidly associated, via one or more pumping openings,to a gas pump, thereby enabling pumping the confined space. Furthermore,adapter 22300 is configured as a disposable part intended for use duringone operational procedure to a single patient. Accordingly, adapter22300 is configured to be manufactured and assembled at a low cost, asis detailed further below.

Drawing attention to FIG. 22A, hollow cylinder 22312 is madesubstantially of a dielectric material, and extends between a cylinderproximal opening 22314 and a cylinder distal end 22316. Adapter 22300further includes an adaptive vacuum seal 22320 depicted schematicallyalso in FIG. 22B. Adaptive vacuum seal 22320 is positioned inside hollowcylinder 22312 and adapted to fit an external dimension (e.g. anexternal circumference) of endoscopes such as endoscope 22400 so as toallow insertion of the endoscope into adapter 22300 using a slightforce, e.g. by hand, as is known in the art. Accordingly, adaptivevacuum seal 22320 is configured to hold a pressure difference (or gasconcentration difference) between a distal portion 22302 of hollowcylinder 22312 and an outside 22304 of adapter 22300 when endoscope22400 is positioned inside adapter 22300.

Adaptive vacuum seal 22320 is constructed of a seal outer ring 22322shaped as a short cylinder, and a seal inner ring 22324 extendingradially between seal outer ring 22322 and a seal central opening 22328of the adaptive vacuum seal 22320, along a wavy curve having at leastone crest 22326. Adaptive vacuum seal 22320 may be formed of a flexiblematerial such as rubber or silicone and may therefore fit an externalcircumference of endoscopes (or other devices) within a range ofcircumferences. In other words, adaptive vacuum seal 22320 may sealagainst a first medical device, having a first circumference, insertedinto hollow cylinder 22312 and through central opening 22328, and alsoagainst a second medical device, having a second circumference differentfrom the first circumference, inserted through central opening 22328after the first device is removed from the adapter. According to someembodiments, the ratio between the two circumferences may be at least1.5. Accordingly, if the first and second medical devices have circularcross-sections, then adaptive vacuum seal 22320 may vacuum seal againstthe first and second medical devices even if their cross-sectionaldiameters have a ratio of at least 150%. Further, adaptive vacuum seal22320 may vacuum seal against a devise having a non-circularcross-section.

Adapter 22300 further includes feedthroughs 22330 a and 22330 b arrangedon hollow cylinder 22312 along the cylinder's longitudinal axis andconfigured to establish an electrical connection between the outside22304 of adapter 22300 and an inside 22306 of the hollow cylinder.Feedthroughs 22330 are constructed of a metallic outer ring 22332 (thatis, metallic rings 22332 a and 22332 b respectively) shaped as a shortcylinder and two opposing flexible metallic stripes 22334 extendinginwards from the metallic ring and slanted at an angle relative to theplane of the metallic ring. Feedthroughs 22330 may be made of a flexiblemetal, preferably inert and medically approved, for example stainlesssteel.

To allow low-cost manufacturing, hollow cylinder 22312 is constructed offour segments—a proximal segment 22340, a first middle segment 22342, asecond middle segment 22344 and a cylinder distal segment 22346, whichare made of a dielectric material or dielectric materials, andconfigured to be sealingly assembled together during manufacturing as isexplained below.

When the segments are separated, an O-ring 22360 a is positioned in acorresponding groove in proximal segment 22340 and an O-ring 22360 b ispositioned in a corresponding groove in first middle segment 22342.Feedthrough 22330 a may then be appended by sliding the metallic outerring 22332 a over the O-ring 22360 a while adjusting the metallicstripes 22334 a into corresponding proximal segment slits 22348 inproximal segment 22340. The proximal segment and the first middlesegment may then be assembled together in a snap-fit manner by slidingthe first middle segment into the metallic outer ring 22332 a whileadjusting first protrusions 22350 of first middle segment 22342 intocorresponding proximal depressions 22352 in proximal segment 22340. Whenassembled together, O-rings 22360 a and 22360 b, between the proximalsegment and the metallic outer ring 22332 a and between the first middlesegment 22342 and the metallic outer ring 22332 a, respectively, sealthe gap between the two segments, and particularly prevent thepenetration of contaminants, through the gap, from the outside 22304into the hollow cylinder 22312.

Second middle segment 22344 may be assembled with first middle segment22342 in a similar snap-fit manner, as second protrusions 22354 of firstmiddle segment 22342 are adjusted into corresponding second depressions22356 in second middle segment 22344. The gap between second middlesegment 22344 and first middle segment 22342 is sealed by O-rings 22360c and 22360 d, between the first middle segment and the metallic outerring 22332 b and between the second middle segment 22344 and themetallic outer ring 22332 b, respectively. The metallic stripes 22334 bof feedthrough 22330 b are adjusted into corresponding first slits 22358in first middle segment 22342.

Cylinder distal segment 22346 may also be assembled with second middlesegment 22344 using a snap-fit manner, as second protrusions 22362 areengaged into distal segment depressions 22364. O-ring 22366 seals thegap between second middle segment 22344 and cylinder distal segment22346. When second middle segment 22344 and cylinder distal segment22346 are assembled together, outer ring 22322 of adaptive vacuum seal22320 is held tight between opposing grooves of second middle segment22344 and cylinder distal segment 22346 so that inserting a medicaldevice into central opening 22328 or extracting a medical devicetherefrom does not displace the adaptive vacuum seal from position.

Adapter 22300 includes pumping opening 22368 in cylinder distal segment22346, allowing pumping gas through the pumping openings from distalportion 22302. Openings 22368 are equipped with a unidirectional valve22370 allowing extracting gas from the distal portion 22302 through thepumping openings, but preventing penetration of gas through the pumpingopenings into the distal portion. Thus, unidirectional valve 22370allows pumping gas from the distal portion while preventing penetrationof contamination into the hollow cylinder through the pumping openings.

FIG. 23C schematically depicts adapter 22300 positioned inside slot22422 of operational unit 22420, wherein endoscope 22400 is inside thehollow cylinder 22312 of the adapter. Endoscope 22400 is advanced in thehollow cylinder until distal segment 22402 contacts fins 22372 of theadapter. Thus fins 22372 are employed as a stopper for the advancementof the endoscope into the adapter, so as to determine a proper positionof the endoscope during plasma generation.

During insertion of endoscope 22400 into the adapter, the endoscope isadvanced through central opening 22328 of adaptive vacuum seal 22320.The edges of the inner ring 22324 around the central opening sealinglycontact the metallic surface 22404 of the endoscope, thus allowingpumping air from the distal portion 22302 while maintaining a pressuredifference across the adaptive vacuum seal. In some embodiments adapter22300 includes a stabilizer 22374 positioned near opening 22314 of thehollow cylinder and configured to stabilize the endoscope in a centerposition of the hollow cylinder during insertion into the hollowcylinder and during the endoscope's residing in the adapter. Stabilizer22374 is configured as an annular ring of a soft and flexible material,e.g., soft silicone or a sponge, and is configured to allow insertion ofendoscopes having different diameters into the hollow cylinder.Stabilizer 22374 should not necessarily seal against the walls of theendoscope, but rather maintain the endoscope stabilized along thelongitudinal (symmetry) axis of the hollow cylinder so as to preventdeviations of the endoscope from the center of the adaptive vacuum seal22320 during insertion or during residence of the endoscope therein, soas to prevent air leaks through an accidental gap between the adaptivevacuum seal 22320 and the endoscope.

Operational unit 22420 includes a pumping channel 22424 fluidlyassociated with a vacuum pump (not shown here) of the operational unit.Channel 22424 is fluidly associated to pumping openings 22368 viaunidirectional valve 22370, thus enabling pumping air from the distalportion 22302, to enable or to facilitate generating plasma therein. Anexternal seal 22380 positioned on the external wall of the hollowcylinder, preferably near the distal end 22316 of hollow cylinder 22312,seals against the walls of the slot 22312 thereby preventing air leaksfrom the outside 22304 via the slot 22312 into the channel 22424 andthus allowing pumping air from the distal portion.

Operational unit 22420 further includes an anode 22430, electricallyassociated, e.g., via a HV cable 22432, with a RF high voltage (HV)power source (not shown here). Anode 22430 is annular, being arrangedaround the longitudinal axis of the slot, that is to say around thelongitudinal axis of hollow cylinder 22312 and opposite the distalportion 22302 of the hollow cylinder, when the adapter is inserted tothe slot. Operational unit 22420 further includes electrical contacts22434 and 22436, configured to electrically contact the metallic outerrings 22332 a and 22332 b, respectively, of feedthroughs 22330 a and22330 b of the adapter. Electrical contacts 22434 and 22436 may beelectrically associated, via HV cables 22440 and 22442 respectively, toelectrical circuitry of the operational unit. In some embodimentselectrical contact 22434 may be electrically associated to the RF HVpower source, so that when the RF HV power source is activated, a RFhigh voltage is applied between anode 22430 and electrical contact22434. In some embodiments electrical contact 22434 is fixedly connectedto a ground potential.

When the distal segment of the endoscope is in the hollow cylinder asdetailed above, flexible stripes 22334 a and 22334 b electricallycontact the metallic surface 22404, so that when the RF HV power sourceis activated, a plasma generating HV is applied between the anode andthe metallic surface 22404. The plasma generating EM field may generateplasma in the vicinity of the optical element 22406. It is noted thatthe dielectric walls of the cylinder distal segment 22346 are positionedbetween the anode and the metallic surface 22404 of the endoscope, henceplasma is activated in the distal portion 22302 in a DielectricBreakdown Discharge (DBD) mode of operation. It is further noted thatfins 22372 may be employed to focus and unify the plasma onto theoptical surface 22408.

In some embodiments the electrical connection formed by the metallicsurface between flexible stripes 22334 a and 22334 b, as the endoscopeis inserted into the hollow cylinder (and when the adapter is in theslot of the operational unit) may be employed for automatic activationof the HV power source. For example, in embodiments wherein electricalcontact 22434 is fixedly connected to a ground potential as describedabove, electrical contact 22436 may be electrically associated with acontroller (not shown here) of the operational unit, wherein thecontroller may consequently control activating or deactivating the RF HVsource. Insertion of the endoscope into the hollow cylinder may force aground potential at electrical contact 22436 to command the controlleractivating the RF HV power source thereby generating plasma in thevicinity of the distal segment of the endoscope. Plasma may so begenerated for a pre-determined time duration required for a properplasma treatment as is dictated by the controller, and, alternatively ofadditionally, plasma may be generated until the endoscope is removedfrom the hollow cylinder and ground potential ceases at electricalcontact 22436.

FIGS. 23A, 23B, and 23C depict schematically various electrodearrangements that can be employed to treat a medical device 22450having, on a distal segment 22452 thereof an optical element 22454having an optical surface 22456 that may be treated against accumulationof fog. For the sake of simplicity the distal segment 22452 is depictedas an elongated member, however this should not be construed as limitingand the teachings herein may apply to medical devices having othershapes and dimensions. Medical device 22450 is different from medicaldevice 22400 of FIG. 22C in that medical device 22450 does not have ametallic surface at the distal segment 22452 thereof, in other words thesurface of the distal segment is not electrically conducting. FIGS. 23A,23B, and 23C depict apparatuses 23508, 23538 and 23568, respectively. Inthe Figures, medical device 22450 is inserted in adapters 23510, 23540and 23570, respectively, wherein the adapters are positioned incorresponding slots 23530, 23560 and 23590 of operational units 23512,23542 and 23572, respectively, substantially as described above.

In FIG. 23A, an annular electrode 23514 is included by adapter 23510,and a second electrode 23516 is included by the operational unit 23512.Electric connections of the electrodes to a power source (not shownhere) are implied and are not explicitly shown. Annular electrode 23514may be made flexible to tightly contact the surface of the distalsegment of the medical device, or it may be dimensioned to allow a gapbetween the electrode and the medical device. The second electrode 23516is shaped as a plate, however other shapes are readily contemplated. Insome embodiments the second electrode may be annular, having a ring-likeshape. In some embodiments the second electrode may be pointed, having atip pointing towards the adapter, to amplify the field and focus thefield in the vicinity of the center of the optical surface. Because thedistal segment of the endoscope does not have a conducting surface, aplasma generating electric field is applied between the electrodes, inother words the geometry of the electrodes and the distance between theelectrodes are dominant in determining the field. Plasma is generated inthe vicinity of the optical surface 22456 in a DBD mode, due to adielectric barrier formed by the distal end 23518 of the hollowcylinder. Vacuum seals 23520 and 23522, between the distal segment andthe hollow cylinder of the adapter, and between the adapter and the slotof the operational unit, respectively, assist in maintaining vacuum inthe distal portion 23524 of the hollow cylinder, substantially asexplained above regarding FIG. 22C. Pumping the distal portion is madepossible via channels 23526 of the operational unit and via pumpingopenings 23528 in the adapter.

In FIG. 23B, an annular electrode 23544 and a second electrode 23546 areincluded by adapter 23540. As in FIG. 23A, electric connections of theelectrodes to a power source (not shown here) are implied. Annularelectrode 23544 and second electrode 23546 may be shaped similarly toannular electrode 23514 and second electrode 23516, respectively, inFIG. 23A, and according the description above. Plasma is generated inthe vicinity of the optical surface 22456 in a DBD mode, due to adielectric barrier formed by the distal end 23548 of the hollowcylinder. Also, vacuum seals 23550 and 23552 and pumping arrangementsare substantially similar to the corresponding seals and pumping methoddescribed above to FIG. 23A. In operation, the electrode arrangement ofFIG. 23B is advantageous over that of FIG. 23A in that both the annularelectrode 23544 and second electrode 23546 are included by the adapter23540, hence the plasma generating electric field applied between theelectrodes is more accurately determined and is less subject to inconsistencies or uncertainty involving the relative position of theadapter in the slot. A disadvantage of the arrangement in FIG. 23B isthat the adapter 23540 might be more expensive relative to adapter 23510of FIG. 23A, due to the inclusion of the second electrode 23546 in theadapter.

The electrodes arrangement in FIG. 23C is different from that of FIG.23B in that an annular electrode 23574 in an adapter 23570 is locatedoutside the hollow cylinder of the adapter 23570 and not inside hollowcylinder as in FIG. 23B. Also, a second electrode 23576 included by theadapter 23570, is not separated from the optical element 22454 of theendoscope by a dielectric layer as in FIG. 23B. Thus, in the arrangementof FIG. 23C, plasma is generated in a DBD mode due to the dielectriclayer of the walls of the adapter 23570 next to the annular electrode23574.

According to an aspect of the invention, it would be advantageous tocertify an adapter housing a medical device therein, for activatingplasma, prior to such plasma activation and/or during such plasmaactivation. For example, it may be necessary or at least advantageous tocertify that an adapter is properly positioned in the slot of anoperational unit, to ensure proper plasma activation inside the adapter.For example it may be advantageous to prevent the generation ofhigh-voltage (intended to induce a plasma-generating EM field or togenerate plasma or to maintain plasma inside the adapter), if theadapter in absent from the slot or misplaced in the slot. Suchprevention of high-voltage generation may be needed to preventaccidental electrification of a user or undesired arcing, or otherundesired results of unsuccessful delivery of the plasma generatingfield to the adapter. According to some embodiments accurate positioningof the adapter inside the slot may be necessary to ensure suitablecoupling of the electric voltage generated by the operational unit tothe adapter. For example, it may be necessary or at least desired toensure electric contact of the RF power supply in the operational unitwith electrodes of the adapter. In some embodiments such accuratepositioning of the adapter in the slot may be necessary to ensuresuitable and proper impedance matching between the adapter and the HVgenerator. According to some embodiments, it is necessary or at leastdesirable to ensure that plasma is actually being generated inside theadapter, to validate the plasma treatment and to prevent mistaken use ofa medical device that did not undergo plasma treatment.

According to some embodiments it may be necessary, or at leastdesirable, to associate and apply a particular plasma treatment protocolto a particular type of medical device, by identifying the adapter usedwith the medical device. In other words, different types of medicaldevices may undergo plasma treatment in different adapters, wherein eachtype of medical device may be identified by an identification componentembedded in the corresponding adapter. When the adapter is positioned inthe slot of the operational unit, the operational unit may identify thetype of the medical device by recognizing the identification componentof the adapter, thereby preventing applying plasma according to a wrongprotocol, and ensuring applying plasma according to a correct andsuitable protocol.

Thus, according to an aspect of the invention, an apparatus for plasmatreatment of a medical device is provided including an operational unitand an adapter (detachable from the operational unit). The apparatusfurther includes an adapter certification system including a fieldtransponder attached to one of the operational unit and the adapter, anda receiver, attached to the other of the operational unit and theadapter. A signal transmitted from the field transponder may be receivedby the receiver, thereby certifying the identity of the adapter or theposition thereof relative to the operational unit. According to someembodiments the certification system further includes a transmitterpositioned also on the other one of the operational unit and an adapter.According to some embodiments, the transmitter may transmit atransmitted signal to which the field transponder may respond with aresponse signal which is received by the receiver. The field transpondermay be passive (such as a reflector) or may be active (powered by anenergy source).

FIG. 24 schematically depicts an embodiment of an apparatus 24600 forplasma treatment of a medical device 24602—e.g. endoscope—having anoptical element 24604 with an optical surface 24606 at a distal segment24608 thereof. The optical surface may require treatment as describedabove prior to using the medical device in a medical procedure.Apparatus 24600 includes an operational unit 24610 and an adapter 24620detachable from the operational unit. Adapter 24620 contains therein thedistal segment 24608 in hollow cylinder 24630. The operational unitincludes a slot 24640 configured to receive adapter 24620 therein. It isnoted that in some embodiments medical device 24602 may have anon-cylindrical or a non-symmetric shape (at least near the opticalelement) and the hollow cylinder may have a correspondingnon-cylindrical or a non-symmetrical shape, allowing the insertion ofthe medical device into the hollow cylinder in a single orientation. Yetthe external shape of the adapter, as well as the shape of the slot, maybe symmetrical, to allow various adapters, corresponding to differenttypes of medical devices, be used with the operational unit. In suchcases it may be desired to certify the orientation of the adapter insidethe slot.

According to some embodiments hollow cylinder 24630 may be sealed by themedical device 24602 inserted thereto, substantially as described above,thereby being configured to maintain in a distal portion thereof vacuumor an atmosphere that is markedly different in pressure and compositionfrom ambient atmosphere (i.e. air). Hollow cylinder 24630 may be fluidlyassociated with a vacuum pump or a gas reservoir 24612 of theoperational unit via pumping openings 24632 in the adapter, to allowpumping the distal portion 24634 of the hollow cylinder or flush thehollow cylinder with gas as described above. According to someembodiments, hollow cylinder 24630 is not gas-sealed, but onlymicrobially sealed. Apparatus 24600 further includes electrodes 24660,included by the operational unit and electrodes 24662, included by theadapter. Operational unit 24610 further includes a power source 24644electrically associated with the electrodes 24660 and configured togenerate electric power—e.g. power at a high voltage and highfrequency—suitable to employ the electrodes 24660 to induce aplasma-generating electric field in hollow cylinder 24630 in thevicinity of optical surface 24606.

Operational unit 24610 further includes a transmitter 24650 configuredto transmit a signal towards adapter 24620. According to someembodiments, transmitter 24650 is configured to transmit the signaltowards adapter 24620 when adapter 24620 is proximal to slot 24640 orinside slot 24640. Operational unit 24610 further includes a receiver24652 configured to receive from adapter 24620 a response signal, namelya reflected or transmitted signal respective to the transmitted signaltransmitted from transmitter 24650. Adapter 24620 includes a fieldtransponder 24654, configured to reflect or to transmit the responsesignal, in response to the signal transmitted from transmitter 24650.The signal transmitted towards the adapter and/or from the adaptertowards receiver 24652 may be wireless (e.g. an electromagnetic signalsuch as a RF signal or an optical signal) or may be wired usingelectrical contacts, as is exemplified herein below.

According to some embodiments transmitter 24650 is a directionaltransmitter, configured to transmit along a predetermined direction, andfield transponder 24654 is localized. In such embodiments only whenadapter is suitably positioned in a well-defined position—for example inslot 24640 whereas field transponder 24654 is positioned in thedirection of the transmitted signal from transmitter 24650—thattransponder 24654 responds with a response signal. According to someembodiments field transponder 24654 is passive, thereby passivelyreflecting a portion of the transmitted signal. According to someembodiments field transponder 24654 is active thereby activelytransmitting a response signal (which may be different in frequency orhave a stronger intensity compared to the transmitted signal fromtransmitter 24650).

According to some embodiments transmitter 24650 is not necessary, andactive field transponder 24654 may be configured to actively transmit acertifying signal which certifies the identity of adapter 24620 or thevalidity thereof or the position thereof when received by receiver24654. According to some such embodiments, active field transponder24654 may include a light source, or a directed light source such as alaser or a LED, configured to be directed towards received 24652 in theoperational unit when the adapter is suitably positioned in the slot.According to some embodiments active field transponder 24654 maytransmit a coded RF signal which may be received by receiver 24652 whenthe adapter is suitably positioned in the slot. According to someembodiments, active field transponder 24654 may be energized by aportable energy source such as a battery which is included by theadapter. According to some embodiments active field transponder 24654may be energized—through electric wires and/or wirelessly throughinduction or otherwise by radiation—by an energy source of theoperational unit. According to some embodiments electric contacts on theadapter and on the slot of the operational unit may come into mutualelectric contact when the adapter is inserted into the slot, so as toclose an electric circuit that allows activation (energizing) activefield transponder 24654. According to some embodiments an interactionbetween transmitter 24650 and transponder 24654 is mutual and notdirectional, as for example a magnetic force occurring between twomagnets.

According to some embodiments operational unit 24610 may further includea controller 24670 functionally associated with receiver 24652 andoptionally associated with transmitter 24650. According to someembodiments the controller may receive an output from receiver 24652indicating receiving a response signal from field transponder 24654.According to some embodiments the controller may be functionallyassociated with power source 24644, to control power source 24644 togenerate power when a valid response signal is received in receiver24652, and not to generate power when a response signal is not receivedin receiver 24652.

According to some embodiments, transmitter 24650, receiver 24652 andfield transponder 24654 may be shielded, e.g., by an electromagneticshield (not shown here), to prevent interference of the plasmaexcitation field with their operation. Each of the transmitter, thereceiver and the field transponder may be shielded or not Accordingspecifics of the embodiment involved. Such shielding may be required ornot depending on several considerations including whether or notinterference from the plasma excitation field impairs the operation ofthe transmitter, the receiver or the field transponder.

FIGS. 25A—25E schematically exemplify some embodiments of correspondingapparatuses configured for certifying an adapter having a fieldtransponder according to the teachings herein. FIG. 25A schematicallydepicts an embodiment of an apparatus 24600 a including an operationalunit 24610 a and an adapter 24620 a. Apparatus 24600 a exemplifiescertifying a correct positioning and/or orientation of the adapter in aslot 24640 a of the operational unit, employing wireless interactionbetween a transmitter and a transponder, wherein any one, or both, maybe passive, embodied by two magnets. Operational unit 24610 a includes aferromagnet 24650 a positioned near slot 24640 a and mechanicallyassociated with a switch 24652 a. Ferromagnet 24650 a may be a magneticslab or an electromagnet being energized constantly or towards avalidity test of the adapter. Adapter 24620 a includes a ferromagneticslab 24654 a (e.g. a slab of iron or a magnet). When adapter 24620 a isinserted into slot 24640 a, a magnetic source between ferromagnet 24650a and ferromagnetic slab 24654 a may displace ferromagnet 24650 a orotherwise cause switch 24652 a to close a circuit thereby certifyingthat adapter 24620 a is suitably positioned in slot 24640 a. Switch24652 a may be functionally associated with a controller 24670 a, thecontroller being configured to control the activation of power source24644 a (or otherwise control the application of a plasma-generating EMfield in the adapter) as described above, according the state (open orclose) of switch 24652 a. According to various embodiments, bothferromagnet 24650 a and ferromagnetic slab 24654 a are magnets; orferromagnet 24650 a is a magnet whereas ferromagnetic slab 24654 a isnot a magnet; or ferromagnetic slab 24654 a is a magnet whereasferromagnet 24650 a is not a magnet.

FIG. 25B schematically depicts an embodiment of an apparatus 24600 bincluding an operational unit 24610 b and an adapter 24620 b,exemplifying certifying a correct positioning and/or orientation of theadapter in a slot 24640 b of the operational unit, employing wirelessinteraction between a directional transmitter, a passive transponder anda receiver. Operational unit 24610 b includes a light source 24650 bsuch as a LED or a focused beam source such as a laser. Light producedby light source 24650 b is directed towards adapter 24620 b, possiblythrough a window or an opening (not shown here) in slot 24640 b. Whenadapter 24620 b is suitably positioned inside slot 24640 b, the lightbeam produced by the light source is reflected from a reflector 24654 b(such as a mirror) accommodated on adapter 24620 b, towards a lightdetector 24652 b in operational unit 24610 b. A detection signal fromthe light detector may then certify the position of adapter 24620 band/or the orientation thereof, inside slot 24640 b. The detectionsignal may thereby be used to allow (e.g. by a controller 24670 b)activation of plasma in the adapter. According to some embodiments, theoperational unit does not include a light source whereas the adapterincludes a light source (not shown here), for example a directionallight source, energized by a battery (not shown here). The light sourceon the adapter may be configured to direct light towards a lightdetector of the operational unit, thereby certifying that the adapter isproperly positioned in the slot of the operational unit.

FIG. 25C schematically depicts an embodiment of an apparatus 24600 callowing certifying the validity and/or the positioning and/ororientation of a related adapter 24620 c or the position thereof in slot24640 c, without a transmitter. Adapter 24620 c includes a code sticker24654 c whereas an operational unit 24610 c includes an optical reader24652 c configured to read—possibly through a window or an opening (notshown here) of a slot 24640 c —a code on the code sticker 24654 c whenadapter 24620 c is suitably positioned inside the slot. Such reading maybe accomplished, in some embodiments, using a laser beam as is known inthe art. In some embodiments such reading is accomplished without adedicated light source using ambient light. The code on the code stickermay be decoded by the code reader and a corresponding validation signalmay be sent to a controller 24670 c of the operational unit 24610 c.Additionally or alternatively, the code on the code sticker may bedecoded by the controller (e.g. by way of receiving an image of the codesticker and employing an image analysis algorithm). The code read fromthe code sticker may be used to validate an identity of the adapter, forexample for the purpose of certifying employment of a correct treatmentprotocol suitable for the specific medical device in the adapter.

FIG. 25D exemplifies an embodiment of an apparatus 24600 d allowingcertifying the validity of a related adapter 24620 d. An operationalunit 24610 d includes an RFID reader 24650 d functionally associatedwith a controller 24670 d, whereas adapter 24620 d includes an RFID chip24654 d. In some embodiments RFID chip 24654 d may be activated byradiation received from the RFID reader 24650 d, rendering the RFID chipsubstantially independent of a dedicated energy source and responsivefrom any location around the RFID reader where the received energy issufficient to activate the RFID chip. According to some embodiments,RFID chip 24654 d may be activated by a portable energy source of theadapter such as a battery thereby being independent of an energy sourceexternal to the adapter. In some embodiments the RFID chip may beenergized by an energy source of the operational unit e.g. viaelectrical contacts or wirelessly, only when the adapter is properlypositioned in the slot. When adapter 24620 d is in the vicinity ofoperational unit 24610 d, RFID reader 24650 d may identify RFID chip24654 d, thereby identifying the type of adapter 24620 d, and, possibly,certifying the adequacy of a plasma activation protocol to the type ofmedical device inside the adapter. In some embodiments the RFID chip maybe configured to register a mere activation of the RFID chip or atransmission of validation response signal towards the RFID reader,thereby enabling monitoring instances of activation or instances of useof the adapter.

FIG. 25E exemplifies an embodiment of an apparatus 24600 e allowingcertifying the validity of a related adapter 24620 e and the adapter'sposition in a slot 24640 e of an operational unit 24610 e. Adapter 24620e includes a smart card 24654 e (a Universal Integrated Circuit Card(UICC), e.g., a Subscriber Identification Module (SIM)), and operationalunit 24610 e includes a card reader 24650 e functionally associated witha controller 24670 e. When adapter 24620 e is in slot 24640 e, smartcard 24654 e may be read by a card reader 24650 e to certify theadequate position of the adapter in the slot and/or to identify theadapter 24620 e as explained above. To read the smart card, the cardreader contacts the smart card, hence accurate positioning of theadapter in the slot is required to validate the adapter and/or theactivation of the operational unit. Identification of the adapter may beemployed to identify the type of the adapter among several types ofadapters, and additionally or alternatively to identify the specificadapter in use. Identification of the adapter may be employed to approveand allow—or to prevent—a plasma treatment protocol according to thetype of adapter, and/or to approve and allow—or to prevent—the use of aspecific adapter during a specific event of using the apparatus.

There is therefore provided, according to an aspect of the invention, anapparatus (21100, 21100 a, 23508, 23538, 23568, 24600, 24600 a, 24600 b,24600 c, 24600 d, 24600 e) for preparing a medical device (21200, 22400,22450, 24602) to a medical procedure. The medical device has a distalsegment (21210, 22402, 22452, 24608) intended to be inserted to apatient's body, whereas the distal segment includes an optical member(21220, 22406, 22454, 24604) having an optical surface (21222, 22408,22456, 24606). It should be understood that, generally, each of themedical devices may be treated by each of the apparatuses, unlessexplicitly dictated otherwise by the description (for example medicaldevice 22450 may not be treated by adapter 22300 of FIG. 22A, which isexplicitly configured to be used with a medical device having a metallicsurface at the distal segment thereof).

The apparatus includes an operational unit (21120, 21120 a, 22420,23512, 23542, 23572, 24610, 24610 a, 24610 b, 24610 c, 24610 d, 24610e), an adapter (21110, 21110 a, 22300, 23510, 23540, 23570, 24620, 24620a, 24620 b, 24620 c, 24620 d, 24620 e) detached from the operationalunit and at least one electrode (22430, 23516, 23546, 23576, 24660,24660 a, 24660 b, 24660 c, 24660 d, 24660 e) which may be included bythe operational unit (anode 22430) or by the adapter (in adapters 23540and 23570) or by both (in apparatuses 23508, 24600, 24600 a, 24600 b,24600 c, 24600 d, 24600 e). The operational unit may include an EM powersource (24644) and a housing including a slot (21122, 21122 a, 22422,23530, 23560,590, 24640, 24640 a, 24640, 24640 b, 24640 c, 24640 d,24640 e) configured to receive the adapter in the slot. The operationalunit further includes an adapter identifier (24652, 24650 a, 24652 b,24652 c, 24650 d, 24650 e), configured to receive an identificationsignal from a corresponding transponder (24654, 24654 a, 24654 b, 24654c, 24654 d, 24654 e), and a controller (24670) functionally associatedwith the adapter identifier.

The adapter includes a hollow cylinder (22312, 23510, 23540, 23570,24630, 24630 a, 24630 b, 24630 c, 24630 d, 24630 e), extending betweenan opening (21114 in adapter 21110, 21114 a in adapter 21110 a, 22314)and a distal end (22316, 23518, 23548, 23578) of the hollow cylinder(the opening is not explicitly shown in FIGS. 23A through 23C, 24, and25A-25E and the cylinder distal end is not explicitly enumerated inFIGS. 24 and 25A-25E). The opening is dimensioned to allow insertion ofthe distal segment into the hollow cylinder. The adapter includes a seal(22320, 23520, 23550, 23580, 24664, 24664 a, 24664 b, 24664 c, 24664 d,24664 e) positioned in the hollow cylinder and defining a distal portion(22302, 23524, 23554, 23584, 24634) of the hollow cylinder between theseal and the distal end of the hollow cylinder. The seal is dimensionedto sealingly fit an external circumference of the distal segment whenthe distal segment is inserted into the hollow cylinder. The adapterfurther includes the transponder, being configured to transmit theidentification signal identifying the adapter or a position thereofrelative to the adapter identifier, when the adapter is in the slot. Theapparatus is configured, when the distal segment is in the hollowcylinder of the adapter, the adapter is in the slot and the adapteridentifier receives the identification signal from the transponder, toapply a plasma-generating EM field in the distal portion of the hollowcylinder by the at least one electrode, the electrode receiving EM powerfrom the power source.

It should be understood that identification systems including an adapteridentifier of the operational unit and a transponder of the adapter,which are depicted explicitly and explained in detail in apparatuses24600 and 24600 a-24600 e, may be employed and used in all apparatusesof the invention including apparatuses 21100, 23508, 23538 and 23568.

In some embodiments the transponder includes at least one selected fromthe group consisting of a magnet (24654 a), a mirror (24654 b), a lightsource, an optical filter, a code sticker (24654 c), a RFID chip (24654d) and a smart card (24654 e).

In some embodiments the seal is a microbial seal (22320, 23520, 23550,23580, 24664, 24664 a, 24664 b, 24664 c, 24664 d, 24664 e). In someembodiments the seal is a vacuum seal (22320, 23520, 24664, 24664 a,24664 b, 24664 c, 24664 d, 24664 e).

In some embodiments the seal (22320, 24664, 24664 a, 24664 b, 24664 c,24664 d, 24664 e) is configured to sealingly fit the distal segmentalong a non-circular circumference. In some embodiments the seal (22320)is configured to sealingly fit distal segments having variouscircumferences. In some embodiments the seal (22320) is configured tosealingly fit distal segments having circular circumferences in a rangebetween a first circumference L and a second circumference greater than1.5L.

In some embodiments the adapter (22312) further includes an externalvacuum seal (22380) positioned along an external circumference of theadapter and configured to seal a gap between the adapter and an innerwall of the slot (22422) of the operational unit (22420), when theadapter is inserted into the slot.

In some embodiments the adapter (22300, 23510, 23540, 23570, 24620,24620 a, 24620 b, 24620 c, 24620 d, 24620 e) further includes a pumpingopening (22368, 23528, 23558, 23588, 24632, 24632 a, 24632 b, 24632 c,24632 d, 24632 e) on the distal portion of the hollow cylinder,configured for enabling pumping gas from the distal portion of thehollow cylinder or flowing gas thereto (e.g. apparatuses 23538, 23568).

In some embodiments the operational unit (24610, 24610 a, 24610 b, 24610c, 24610 d, 24610 e) further includes a pump (24612, 24612 a, 24612 b,24612 c, 24612 d, 24612 e) configured to pump gas from the distalportion (24634, 24634 a, 24634 b, 24634 c, 24634 d, 24634 e) of thehollow cylinder, via the pumping opening, when the adapter is in theslot.

In some embodiments the operational unit further includes a gas portconfigured to fluidly associate a gas reservoir or a gas pump, externalto the operational unit, to the pumping opening of the hollow cylinder,when the adapter is in the slot.

In some embodiments the pumping opening (22368) is equipped with amicrobial barrier configured for preventing penetration of contaminationinto the hollow cylinder through the venting opening during use. In someembodiments the microbial barrier is a sterility filter. In someembodiments wherein the microbial barrier is a unidirectional valve(22370).

In some embodiments the operational unit (21120 a) further includes arechargeable battery.

In some embodiments the apparatus (21100 a) further including asterility container (21150) detached from the operational unit (21120 a)and from the adapter (21110 a), having a container opening (21160) andbeing dimensioned to house the operational unit there inside when theadapter (21110 a) is in the slot (21122 a). In some embodiments theadapter further includes a sterility screen (21152) having a screenopening coinciding with said opening of the hollow cylinder (21114 a),the sterility screen being dimensioned and configured to fit and closethe container opening (21160) when the adapter is in the slot.

In some embodiments the at least one electrode (23544, 23546, 23574,23576) is included by the adapter (23540, 23570). In some embodimentsthe at least one electrode (22430) is included by the operational unit(22420).

In some embodiments the adapter (22300) includes an electricalfeedthrough (22330 a, 22330 b) electrically connecting an externalcontact (22332 a, 22332 b) on the outside of the adapter with anelectrical contact (22334 a, 22334 b) on the inside (22306) of thehollow cylinder, the electrical contact being configured to contact thedistal segment (22402) when the distal segment is received inside thehollow cylinder.

In some embodiments the plasma generating field is applied between theat least one electrode (22430) and a metallic surface (22404) on thedistal end (22402), the metallic surface being in contact with theelectrical contact (22434 a, 22434 b) of the adapter (22300).

There is further provided, according to an aspect of the invention, anadapter (21110, 21110 a, 22300, 23510, 23540, 23570, 24620, 24620 a,24620 b, 24620 c, 24620 d, 24620 e) for use with an operational unit(21120, 21120 a, 22420, 23512, 23542, 23572, 24610, 24610 a, 24610 b,24610 c, 24610 d, 24610 e) for preparing a medical device as describedabove for a medical procedure, the adapter being detachable from theoperational unit and from the medical device. The adapter includes ahollow cylinder extending between an opening dimensioned and configuredto receive the distal segment of the medical device and a distal end ofthe hollow cylinder. The adapter further includes a seal (22320, 23520,23550, 23580, 24664, 24664 a, 24664 b, 24664 c, 24664 d, 24664 e)positioned in the hollow cylinder and defining a distal portion (22302,23524, 23554, 23584, 24634) of the hollow cylinder between the seal andthe distal end of the hollow cylinder, the seal dimensioned to sealinglyfit an external circumference of the distal segment when the distalsegment is inserted into the hollow cylinder. And the adapter furtherincludes a transponder (24654, 24654 a, 24654 b, 24654 c, 24654 d, 24654e) configured to transmit an identification signal identifying theadapter when the adapter is in the slot.

In some embodiments the transponder (24654 c, 24654 d, 24654 e) storesinformation identifying the adapter. In some embodiments the transponder(24654 d, 24654 e) is configured to transmit the identification signalin response to a coded signal, thereby identifying the adapter.

In some embodiments the adapter (22300, 24620, 24620 a, 24620 b, 24620c, 24620 d, 24620 e) further includes an electrical feedthrough (22330)electrically connecting an external contact (22332) on the outside ofthe adapter to an electrical conductor (22334, 24622 a, 24622 b, 24622c, 24622 d, 24622 e) on the inside of the hollow cylinder.

In some embodiments the electrical conductor (22334) is configured as anelectrical contact (22334 a, 22334 b) configured to contact an externalsurface (22404) of the distal segment of the medical device when thedistal segment is received in the hollow cylinder. In some embodimentsthe electrical conductor is configured as an electrode (24622 a, 24622b, 24622 c, 24622 d, 24622 e).

In some embodiments the adapter further includes a stopper (22372)configured to limit advancement of the distal segment of the medicaldevice into the hollow cylinder. In some embodiments the stopper isemployed as a dielectric barrier between the first electrode and thesecond electrode, thereby assisting in focusing plasma towards theoptical member of the medical device, during use.

In some embodiments the adapter further includes a hollow stabilizer(22374) positioned near the opening (22314) and configured to receivethe distal segment of the medical device there through and adapted tofit an external circumference of the medical device to thereby stabilizethe medical device in the hollow cylinder.

In some embodiments the adapter (21110 a) further includes a rigidsterility screen (21152) having a screen opening coinciding with theopening (21114 a) of the hollow cylinder.

In some embodiments the seal (22320, 24664, 24664 a, 24664 b, 24664 c,24664 d, 24664 e) is configured to sealingly fit the distal segmentalong a non-circular circumference. In some embodiments the seal (22320)is configured to sealingly fit distal segments having variouscircumferences. In some embodiments the seal (22320) is configured tosealingly fit distal segments having circular circumferences in a rangebetween a first circumference L and a second circumference greater than1.5L.

In some embodiments the adapter (22300, 23510, 23540, 23570, 24620,24620 a, 24620 b, 24620 c, 24620 d, 24620 e) further includes a pumpingopening (22368, 23528, 23558, 23588, 24632, 24632 a, 24632 b, 24632 c,24632 d, 24632 e) at the distal portion of the hollow cylinder enablingpumping gas from—or flowing gas into—the inside of the hollow cylinderthrough the pumping opening when the distal segment of the medicaldevice is inside the adapter. In some embodiments the adapter (22300)further includes a sterility barrier fluidly associated with said distalopening and configured for preventing penetration of contamination fromthe outside of the adapter to the inside of the hollow cylinder throughthe distal opening. In some embodiments the sterility barrier is aunidirectional valve (22370). In some embodiments the sterility barrieris a sterility filter.

In some embodiments the adapter (22300) further includes an externalvacuum seal (22380) positioned along an external circumference of theadapter and configured to seal a gap between the adapter and an innerwall of a slot of said apparatus, when the adapter is inserted into theslot.

There is yet further provided, according to an aspect of the invention,an adapter (22300) for use with an operational unit (22420) forpreparing a medical device (22400) as described above for a medicalprocedure, the adapter being detachable from the operational unit andfrom the medical device. The adapter includes a hollow cylinder (22312)extending between an opening (22314) dimensioned and configured toreceive the distal segment of the medical device, and a distal end(22316) of the hollow cylinder. The adapter further includes a seal(22320) positioned in the hollow cylinder and defining a distal portion(22302) of the hollow cylinder between the seal and the distal end ofthe hollow cylinder. The seal is dimensioned to sealingly fit distalsegments having external circumferences in a range between a firstcircumference L and a second circumference greater than 1.5L. And theadapter further includes an electrical feedthrough (22330 a, 22330 b)electrically connecting an external contact (22332 a, 22332 b) outsideof the hollow cylinder to an electrical conductor (22334 a, 22334 b)inside the hollow cylinder.

There is also provided, according to an aspect of the invention, amethod of preparing at least a first medical device and a second medicaldevice for a medical procedure carried out on a single patient. Each ofthe medical devices has a distal segment including an optical member.The circumference of the distal segment of one of the first and secondmedical devices is L and the circumference of the distal segment of theother medical device is greater than 1.2L. The method includes providinga plasma chamber (distal portion 22302 of adapter 22300 when the adapteris in the slot 22422) including at least one electrode (22430)electrically associated with a power source and configured for applyingin the plasma chamber a plasma generating EM field. The plasma chamberalso has an opening (22314) and a seal (22320) dimensioned andconfigured to receive the distal segment of each of the first and secondmedical devices in the opening through the seal. The method furtherincludes inserting the distal segment of the first medical device to theplasma chamber through the opening so that the seal and the distal endtogether seal the opening. The method further includes supplying EMpower from the power source to the at least one electrode, therebyapplying a plasma generating EM field and generating plasma in thevicinity of the optical member. And the method further includesrepeating said steps of inserting the distal segment and supplying EMpower for the second medical device. In some embodiments the medicaldevices are endoscopes, one having a distal member with a diameter D andthe other having a distal member with a diameter 2D.

And there is yet further provided, according to an aspect of theinvention, an adaptive seal (22320) made of a flexible material. Theseal is shaped as a combined outer tube (22322) and an inner annularring (22324) extending radially along a wavy curve having at least onecrest (22326), between the outer tube and a central opening (22328) ofthe seal. The adaptive seal is thereby configured to sealingly fit to anexternal surface of a member positioned in the central opening andhaving a smooth circumference within a range between a firstcircumference L and a second circumference 1.5L. A smooth circumferenceherein means a convex curve outlining aa convex shape and having nocorners or sharp edges.

In some embodiments the outer tube is a circular cylinder. In someembodiments the flexible material is silicone. In some embodiments theflexible material has a hardness of between 25 to 90 Shore. In someembodiments the inner annular ring extends radially along a wavy curvehaving at least two or at least three crests.

And there is yet further provided, according to an aspect of theinvention, a method of sealing a tube using a member inserted into thetube. The method includes providing adaptive seal 22320; disposing theadaptive seal in the tube (e.g. hollow cylinder 22312) to be sealed sothat the outer tube (22322) of the seal coincides with the inner wall ofthe tube; tightening the adaptive seal to the tube using at least onesmaller tube (an edge of second middle segment 22344) inserted into theouter tube of the seal, so a gap between the tube and the smaller tubeis sealed. The method further includes inserting the member to thecentral opening of the adaptive seal. In some embodiments the smallertube is a ring.

Some disclosed embodiments involve the treatment of equipment. As usedherein, “equipment” may include any component or device configured toperform a particular function. As a non-limiting example, equipment mayinclude medical devices, or devices configured for examining,diagnosing, and/or treating the body. According to some embodiments, anapparatus is provided for treating equipment. Such an apparatus mayinclude any component or device configured to administer a substanceand/or energy to equipment or to otherwise change one or more propertiesof equipment. For example, non-limiting examples of apparatuses for“treating equipment” may include apparatuses for cleaning or sterilizingequipment, changing a surface quality of equipment (e.g., makingequipment more hydrophilic or hydrophobic), altering the appearance ofequipment, or depositing material on or removing material fromequipment.

Some embodiments may involve treating equipment in a vacuum environment.A “vacuum environment” may include any fully-enclosed orpartially-enclosed space with sub-atmospheric pressure. For example, avacuum environment may have a pressure slightly below atmosphericpressure or at a sub-atmospheric pressure sufficient to enable plasmaformation. A “vacuum environment” may additionally or alternativelyrefer to a sealed volume from which substantially all gas and othermaterials have been removed (e.g., with a vacuum pump and within theconstraints of the vacuum pump employed). In some embodiments, theapparatus disclosed herein may treat equipment while the apparatusand/or equipment is situated in a vacuum environment. Additionally, oralternatively, the apparatus disclosed herein may utilize a vacuumenvironment in the course of treating the equipment. Some non-limitingexamples of locations of formation of a vacuum environment include theinside 322 of sheath 410 (FIGS. 3A-3C), closed space 520 (FIG. 4),plasma generation zone 716 (FIG. 7), distal portion 22302 of hollowcylinder 22312 (FIG. 22C), and/or distal portion 24634 of hollowcylinder 24630 (FIG. 24).

Some embodiments may involve treating equipment of differing dimensions.As used herein, a “dimension” may include any measurable extent of athing, including and not limited to length, width, breadth, depth,height, diameter, radius, circumference, surface area, cross-sectionalarea, distance, hypotenuse, and arc length. Thus, the apparatusdisclosed herein may be configured to treat multiple pieces of equipmentthat vary in one or more dimensions. In some embodiments, one or morecomponents of the disclosed apparatus may be adjustable or pliable inorder to accommodate equipment of differing dimensions.

Some disclosed embodiments include an enclosure having a channel. Suchan enclosure may include any structure, casing, barrier, frame, or coverconfigured to envelop or surround another device or component, eitherpartially or entirely. For example, an enclosure may be configured toprovide an airtight or hermetically-sealed environment within whichanother device or component may be placed. In some embodiments, achannel may include a “bore,” as described herein, as well as anyopening or passage from an area outside of the enclosure into aninternal space or volume of the enclosure. Some non-limiting examples ofan enclosure having a channel include hollow cylinder 312 (which has aninterior space or channel), sheath 800 having internal channel 714(FIGS. 8A-8B), sheath 718 having an internal channel 1104 (FIG. 11), andhollow cylinder 22312 having an internal channel 22313 (FIG. 22A).

In some embodiments, the enclosure is a disposable sheath. As usedherein, the term “disposable” may refer to an article intended to beused only once (or for a limited amount of time) and then discarded. Forexample, a “disposable” article may be intended for use in a singleoperation or procedure, or inserted one time into a patient's body andsubsequently removed and discarded. As discussed elsewhere in thepresent disclosure, the term “sheath” may refer to a covering orsupporting structure that fits closely around an object. For example, asheath may enclose an optical element of a medical instrument. In oneexemplary embodiment, the sheath may be a slender, flexible, disposabletube that retains within the sheath a portion of the medical instrumentwhen the medical instrument is inserted into another device or into thebody of a patient. For example, protecting shroud 110 in FIG. 1A,protecting shroud 310 in FIG. 2, and sheath 800 in FIG. 8A are somenon-limiting examples of sheaths that may be disposable, in accordancewith disclosed embodiments. As another example, protecting shroud 310may be sized (e.g., dimensioned) to receive distal end 382 of endoscope380 (FIG. 2), where distal end 382 is provided with viewport 390.Protecting shroud 310 may, accordingly, be another example of adisposable sheath.

In some embodiments, the channel is configured for receiving elongatedtools. As used herein, the term “receiving” may refer to a capabilityfor holding, enclosing, supporting, or otherwise containing an object.For example, an object may be inserted into the channel from an areaoutside of the enclosure (thus, the channel may receive the object) and,optionally, may also be removed from the channel. As also used herein,an elongated tool may include a device or component having a length thatis larger than its width. For example, an elongated tool may have alength that is twice as long as its width, three times as large as itswidth, or any other desired ratio between its length and width. Somenon-limiting examples of an elongated tool may include endoscopes,needles, catheters, tubes, syringes, guide wires, and electric wires. Insome embodiments, the channel may be sized and configured to receive theentirety of an elongated object. Additionally, or alternatively, thechannel may be sized and configured to receive a portion of an elongatedtool while another portion of the elongated tool remains outside of thechannel.

In some embodiments, the channel is configured for receiving elongatedtools of varying diameters. For example, the channel may be configuredto receive multiple elongated tools, each tool having a different outerdiameter. The multiple elongated tools may be received sequentiallywithin the channel (e.g., a first tool is inserted and removed, then asecond tool is inserted, etc.). Additionally, or alternatively, multipleelongated tools may be received within the channel simultaneously (thatis, multiple tools may be received within the channel at the same time).As a non-limiting example, FIG. 12 depicts a sheath 800 having anopening 1210 and an internal channel 1212. Channel 1212 may beconfigured to receive multiple elongated tools 1220 and 1222 (e.g.,endoscopes), which may have different outer diameters. For example, tool1220 may have an outer diameter of “2 d,” which is twice as large asouter diameter “d” of tool 1222. Despite having varying diameters,elongated tools 1220 and 1222 may both be passed through opening 1210into channel 1212.

In some embodiments, the enclosure is divided into a vacuum chamberregion and a non-vacuum region. As used herein, a vacuum chamber regionmay refer to a space within the enclosure having a sub-atmosphericpressure. For example, a vacuum chamber region may refer to a spacedesigned to permit some or all of the gas and other materials to beremoved (e.g., with one or more vacuum pumps), thus decreasing thepressure within the vacuum chamber region to a sub-atmospheric pressure.In some embodiments, the vacuum chamber region may have a pressure ofbetween 0.1 atm and 0.01 atm. As also used herein, a non-vacuum regionmay refer to a space within the enclosure having a higher pressure thanthe vacuum chamber region. In some embodiments, the non-vacuum regionmay have a pressure equal to atmospheric pressure (e.g., the non-vacuumregion may be open to the external environment). Alternatively, thenon-vacuum region may have a sub-atmospheric pressure that is greaterthan the pressure of the vacuum chamber region. Alternatively, thenon-vacuum region may have a pressure greater than atmospheric pressure.In some embodiments, the apparatus may include a mechanism (e.g., one ormore vacuum pumps) configured to adjust the pressure in one or both ofthe vacuum chamber region and the non-vacuum region. In someembodiments, the apparatus may be configured such that the vacuumchamber region and non-vacuum region have equal pressures at certaintimes (e.g., when an elongated tool is removed from the channel) anddifferent pressures at other times (e.g., when an elongated tool isreceived within the channel).

As an example, sheath (or shroud) 310 of FIG. 3A includes asub-atmospheric inside region 322 (i.e., configured to maintain asub-atmospheric environment) that is separated, via vacuum seal 320,from a proximal region 314 that is configured to be open to an externalenvironment (outside 324). In some embodiments, fluid (e.g., air) may beremoved from inside region 322 via hose 364, thus producing a vacuumwithin inside region 322. As another example, adapter 22300 of FIG. 22Cincludes a hollow cylinder 22312 that is divided by adaptive vacuum seal22320 into a distal portion 22302 (an example of a vacuum chamberregion) and a proximal portion 22315 (an example of a non-vacuumregion). A pressure differential may be established and maintainedbetween the portions, with distal portion 22302 having a lower pressurethan proximal portion 22315.

Some disclosed embodiments include an annular seal. As used herein, a“seal” may refer to an element, device, or apparatus configured toprevent the passage or leakage of fluid (e.g., air) from a first area toa second area. For example, a “seal” may refer to a device or apparatusconfigured to maintain a pressure differential between two areas. Insome embodiments, a seal may be provided in a connection or passagebetween a first, high-pressure area and a second, low-pressure area andmay block fluid flow from the first area to the second area. In someembodiments, the seal may be removed or broken (e.g., to allow fluidpassage or to receive another device). Additionally, or alternatively,the seal may be adjusted or deformed to allow the passage of materialsby or through the seal. As also used herein, the term “annular” may mean“ring-shaped” or may refer to an object having one or more openingsextending through it. Thus, an annular seal may refer to a ring-shapedapparatus or device configured to prevent fluid flow or leakage betweentwo areas. Some embodiments may include a single annular seal.Alternative embodiments may include two annular seals, three annularseals, four annular seals, or any other suitable number of annularseals. Some non-limiting examples of an annular seal include a flangegasket, an O-ring, a piston ring, or any other structure configure toform a barrier about a circumference or periphery.

In some embodiments, the annular seal is disposed between the vacuumchamber region and the non-vacuum region. As discussed above, the vacuumchamber region may be configured to maintain a lower pressure than thenon-vacuum region. Accordingly, the annular seal may be provided in afluid passage connecting the vacuum chamber region and non-vacuum regionand may block fluid from passing from the non-vacuum region to thevacuum chamber region, thus maintaining the pressure differentialbetween them. As an example, FIG. 12 shows a sheath 800 having aring-shaped seal 1200 provided in between a distal portion 1214 and aproximal portion 1216. When an elongated device (e.g., tool 1220 or tool1222) is received within channel 1212, seal 1200 may press against theouter surface of the tool to provide a fluid-tight seal separatingdistal portion 1214 from proximal portion 1216. As a result, a pressuredifferential may be maintained between the portions (e.g., distalportion 1214 may have a lower pressure than proximal portion 1216).

In some embodiments, the annular seal is formed of a flexible material.For example, the annular seal may be resilient such that the seal maybend or be compressed by an applied force without breaking. Somenon-limiting examples of a flexible material may include rubber, asynthetic rubber (e.g., a EPDM rubber, a fluoroelastomer, a nitrilerubber, or a silicone rubber), a thermoplastic (e.g., PEBA, athermoplastic polyurethane, or a thermoplastic elastomer), or any othersuitable material capable of preventing fluid flow. In some embodiments,the annular seal has a hardness within a range of 25 Shore to 90 Shorebased on the General Rockwell A Hardness Values. In some embodiments,the annular seal has a hardness within a range of 35 Shore to 65 Shorebased on the General Rockwell A Hardness Values. For example, theannular seal may be sufficiently resistant to plastic deformation sothat the seal may return to its original shape after being compressed orotherwise deformed. Thus, the annular seal will not lose its shape (andthus its ability to act as a fluid seal) when a large pressuredifferential or another force is applied to it.

In some embodiments, and as discussed above, the annular seal includesan opening. The opening may extend from one end of the seal to another,such that an object may be advanced through the opening of the seal. Theannular seal may include one opening, two openings, three openings, orany other suitable number of openings. In some embodiments, an openingdiameter of the annular seal is less than 4.5 mm. As used herein, an“opening diameter” may refer to the diameter of the opening through theannular seal. In some embodiments, the opening diameter of the seal maybe less than 4.5 mm when the opening is in a non-biased position (i.e.,in the absence of an applied force that widens or enlarges the opening).As a non-limiting example, annular seal 1200 shown in FIG. 12 includesan opening 1230 that may have a diameter less than 4.5 mm. In someembodiments, a diameter of the opening of the annular seal is configuredto change upon tool insertion. For example, and as discussed above, theannular seal may be constructed from a flexible material. As a result,the opening may become larger (that is, may stretch to have a largerdiameter) to accommodate a tool having a larger diameter than thediameter of the opening. When the tool is removed from the opening, theopening may return to its original shape and size due to the resilientmaterial from which it is constructed.

In some embodiments, the annular seal includes a flap. As used herein, a“flap” may refer to a component that is connected only at one side tothe remainder of the annular seal. As a result, the flap may be hingedor may pivot around the point of connection with the annular seal. Insome embodiments, the flap may extend around the opening of the annularseal. For example, the flap may extend around the entire diameter of theopening; thus, the flap may also be annular (i.e., there may be anopening through the flap). Alternatively, the flap may be connected toan outer surface of the annular seal. As a non-limiting example, FIG. 12shows an annular seal 1200 having an opening 1230 and a flap 1232 thatmay pivot around the seal's annular side wall 1234. Flap 1232 may alsobe annular, with the opening 1230 of the seal also being an openingthrough the flap.

In some embodiments, the annular seal is provided within the channel ofthe enclosure. For example, the annular seal may be mounted on, orotherwise connected to, an inner wall of the enclosure. As a result,when an elongated tool is advanced into the channel, the annular sealmay come into contact with the tool. In some embodiments, the flap ofthe annular seal is configured to extend inward from a wall of theenclosure into the channel. For example, the annular seal may be seatedon a side wall of the enclosure. The flap may extend inward from theinner wall of the enclosure towards the center of the channel, thusproviding an opening having a smaller diameter than the channel. As anon-limiting example, FIG. 12 depicts a sheath 800 having an annularseal 1200 situated in channel 1212. Annular seal 1200 may be seated onthe side wall of sheath 800 such that flaps 1232 are configured toextend inward from the side wall of sheath 800 towards the center ofchannel 1212. In alternative embodiments, the annular seal is providedin a different part of the enclosure.

In some embodiments, the annular seal is configured to form a vacuumseal against a wall of a tool inserted through the annular seal. As usedherein, a “vacuum seal” may refer to a capacity of the annular seal topress against another object with sufficient force to provide afluid-tight seal between them (that is, between the annular seal and theother object). For example, due to the resilient material of the annularseal, the opening through the annular seal may stretch to become largerin order to accommodate a passing object (e.g., a tool being advancedthrough the annular seal's opening). However, due to both theflexibility and the hardness of the material, the material around theopening may press against the object, exerting sufficient force toestablish a fluid-tight seal. Thus, when a vacuum is created on one sideof the annular seal (such as in the vacuum chamber region), the annularseal may block fluid from leaking between the non-vacuum region andvacuum chamber region and may therefore maintain the pressuredifferential.

Further, due to its elastic properties, the annular seal may beconfigured to accommodate, and to form a vacuum seal against, tools withdifferent shapes and dimensions. For example, in some embodiments, theannular seal is configured to form a vacuum seal against a wall of afirst tool when the first tool is inserted therein and against a wall ofa second tool when the second tool is inserted therein, the first toolhaving a diameter at least one and a half times greater than a diameterof the second tool. Additionally, or alternatively, the annular seal maybe configured to form vacuum seals against tools having other dimensionsthat differ, such as their respective lengths, widths, surface areas,and cross-sectional areas. As a non-limiting example, FIG. 12 depicts asheath 800 having an annular seal 1200 configured to receive both afirst tool 1220 and a second tool 1222. In the example shown, first tool1220 may have a diameter 2 d that is two-times greater than the diameterd of second tool 1222; however, the tools may have other relativediameters having a ratio of between 1.5 and 4. Annular seal 1200 may beconfigured to form a vacuum seal against first tool 1220 as first tool1220 is inserted in opening 1230. Annular seal 1200 may also beconfigured to form a vacuum seal against second tool 1222 as second tool1222 is inserted in opening 1230.

In some embodiments, the first tool and the second tool are opticalmedical scopes of differing sizes. As used herein, an optical medicalscope may refer to an instrument configured to be inserted into a bodyopening (such as a surgical opening or a preexisting opening such as themouth or anus) in order to visualize an interior body cavity or organ orto assist with a medical procedure. For example, an optical medicalscope may include an endoscope, as defined elsewhere in the presentdisclosure. The optical medical scope may include at least one imagingmechanism (e.g., a small camera) at or near the distal end of the scope.Additionally, or alternatively, an optical medical scope may include alight source at or near its distal end. The first optical medical scopeand the second optical medical scope have different sizes, such as atleast one of a different diameter, a different length, a differentwidth, a different surface area, and a different cross-sectional area.However, due to its resilient construction and annular shape, theannular seal is configured to adapt to and seal against the differingsizes of the medical scopes.

In some embodiments, the annular seal is configured to adjust to a tooldiameter in a first range of 0.5 mm to 8 mm. The first range may, forexample, correspond to outer diameter values of the second tool (i.e.,the smaller of the first and second tools). Additionally, oralternatively, the annular seal is configured to adjust to a tooldiameter in a second range of 2 mm to 12 mm. The second range may, forexample, correspond to outer diameter values of the first tool (i.e.,the larger of the first and second tools). In some embodiments, theannular seal is configured to form a vacuum seal against a first toolwith a diameter of between 2 mm and 12 mm and is also configured to forma vacuum seal against a second, smaller tool with a diameter of between0.5 mm and 8 mm. As mentioned above, the first tool may have a largerdiameter that is at least one and a half times larger than the diameterof the second tool.

In some embodiments, the annular seal is configured to sequentially forma vacuum seal against the first tool and the second tool. For example,the annular seal is sized to enable sealing the vacuum chamber regionwhen the second tool is inserted in the channel after extraction of thefirst tool from the channel. Said another way, the annular seal isconfigured to form a vacuum seal against the first tool when the firstis inserted therein, such that the pressure differential may bemaintained between the vacuum chamber region and the non-vacuum region.The first tool may then be removed, and the second tool inserted in theannular seal. The annular seal may then form a vacuum seal against thesecond, smaller tool so that the pressure differential may against beestablished and maintained between the vacuum chamber region and thenon-vacuum region.

As discussed above, the first tool and second tool are optical medicalscopes in some disclosed embodiments. Such medical scopes (that is, thefirst tool and the second tool) each have an optical element. As usedherein, an optical element of an optical medical scope may include acomponent or surface positioned on the scope, or connected to the scope,through which light passes and/or is reflected. The optical element mayinclude one or more of a lens, polarizer, diffraction grating, prism,reflector, filter, viewing window, mirror, protective window, or anyother component through which light passes or is reflected. By way ofexample, FIG. 1B shows an object 200 (e.g., an endoscope) including anoptical element 220 such as a window or lens of an imaging mechanism,which may be situated at the distal end 210 of the object. As anotherexample, FIG. 7 depicts an optical element 706 of an object 708, such asan endoscope. Optical element 706 may be a lens of an imaging mechanismconfigured to capture images of a hollow body organ or cavity.

In some embodiments, the vacuum chamber region is configured to containeach optical element therein during treatments that expose each opticalelement to plasma. As discussed elsewhere in the present disclosure,optical elements such as imaging lenses may be treated with plasma toincrease their hydrophilicity, allowing formation of a thin water layerthat does not distort passing light and therefore keeps the opticalelement from fogging. In some embodiments, the vacuum chamber region maycorrespond to a sub-atmospheric volume in which a plasma cloud may beformed (such as a plasma generation zone, as discussed elsewhere in thepresent disclosure). Thus, the vacuum chamber region may be configuredto contain each optical element while a plasma cloud is formed in thevacuum chamber region for treating the optical element. In someembodiments, the vacuum chamber region is configured to maintain avacuum of less than about 0.3 atm when the annular seal forms a vacuumseal against at least one of the first tool or the second tool. Forexample, in some embodiments, the vacuum chamber region is configured tomaintain a vacuum of less than about 0.1 atm when the annular seal formsa vacuum seal against at least one of the first tool or the second tool.Since the annular seal is configured to form a vacuum seal against aninserted tool, the vacuum chamber region may be airtight so that the gasand other molecules may be removed from the vacuum chamber region untilthe desired pressure is achieved (e.g., a vacuum of between 0.1 atm and0.01 atm). As a non-limiting example, FIG. 7 depicts a tool 708 (e.g.,an endoscope) having an optical element 706 contained within plasmageneration zone 716 (which may be an example of a vacuum chamberregion). Plasma generation zone 716 may be airtight due the vacuum sealformed by the annular seal, so that a desired vacuum pressure may beestablished within the plasma generation zone (e.g., using a pluralityof vacuum pumps connected in series). Although not shown in FIG. 7,apparatus 500 is also configured to perform plasma treatment on othertools of different sizes.

In some embodiments, the enclosure is within a reusable housing. Asdiscussed elsewhere in the present disclosure, a housing may include anystructure, casing, frame, enclosure, or support that covers and/orprotects components of a plasma generation device. For example, ahousing may cover and protect the components of the plasma generationdevice that are configured to cause the reaction that creates the plasma(e.g., a vacuum chamber, one or more electrode pairs, and a mechanismfor supplying reaction gas). As used herein, the term “reusable” mayrefer to an implement that can be used multiple times or on multipleoccasions. For example, a reusable housing may be used in multipletreatment sessions and/or for treatment of multiple patients. Forexample, a reusable housing may be configured for easy cleaning so thatit may safely be used for multiple patients. Housing 710 depicted inFIG. 7 and operational unit 21120 shown in FIG. 21A are examples of ahousing that may be reusable in disclosed embodiments.

In some embodiments, the annular seal is configured for reuse. Forexample, the annular seal may be removed from the enclosure, sterilized,and either returned to the enclosure for reuse or inserted into adifferent enclosure. Alternatively, the entire enclosure (including theannular seal) may be configured to be sterilized and reused.

In some embodiments, the enclosure is sized to be removably insertedinto the housing. For example, the housing may include at least onebore, cavity, or hollow internal chamber that may hold or accommodate atleast a portion of the enclosure, either alone or while the enclosurereceives an elongated tool therein. The enclosure may be accommodatedwithin the housing (e.g., for plasma treatment of the elongated tool),after which the enclosure (and the elongated tool) can be removed fromthe housing. In some embodiments, the housing may contain electricalcircuitry for inducing a voltage drop to thereby generate plasma withinthe vacuum chamber region. For example, and as discussed elsewhere inthe present disclosure, an electrode pair may be provided between theenclosure and the housing. In some embodiments, a first electrode may belocated on the enclosure and a second electrode may be located on thehousing. In alternative embodiments, both electrodes may be located onthe enclosure or both electrodes may be positioned on the housing. Inthe latter situation, the enclosure may extend between the electrodeswhen the enclosure is inserted into the housing. When an enclosure andsubsequently a tool is inserted into the housing, a circuit includingthe electrode pair and associated electrical circuitry (e.g., a powersupply) may be closed and may drive current between the electrodes toproduce an ionizing field for plasma generation within the vacuumchamber region. Said another way, closing the electrical circuit betweenthe enclosure and the housing causes a voltage drop associated with theionizing field that induces plasma generation.

In some embodiments, the enclosure is configured to be identifiable bythe housing. As used herein, the term “identifiable” may refer to acapacity of the enclosure to send a signal and/or energy to the housing,which may be used by the housing or another device to identify theenclosure. For example, a transponder may be provided on one of theenclosure and the housing, and a receiver may be provided on the other.The transponder may be passive (e.g., a reflector) and/or may be active(e.g., powered by an energy source). When the enclosure is suitablyarranged in a well-defined position within the housing, the transpondermay transmit a signal and/or energy which is received by the receiverand which may certify the identity of the enclosure or the positionthereof relative to the housing. In some embodiments, the transpondermay include at least one of a magnet, a mirror, a code sticker, an RFIDchip, or a smart card. Non-limiting examples are provided in FIGS.25A-25E, which depict an adapter 24620 (an example of an enclosure)removably received within a slot 24640 of an operational unit 24610 (anexample of a housing). Adapter 24620 may include a transponder 24654configured, when adapter 24620 is arranged in a particular positionrelative to operation unit 24610, to transmit a signal and/or energy toa receiver 24652 that identifies the adapter 24620 and/or certifies theadapter's position. In disclosed embodiments, the transponder mayinclude at least one of a magnet (24654 a), a mirror (24654 b), a lightsource, an optical filter, a code sticker (24654 c), a RFID chip (24654d), or a smart card (24654 e).

Some disclosed embodiments include a method for treating equipment ofdiffering dimensions in a vacuum environment. Embodiments includeinserting during a first treatment session, a first removable enclosureinto a housing, the first removable enclosure being divided into avacuum chamber region and a non-vacuum region separated by a firstannular seal configured to adjust to varying tool sizes. As used herein,a treatment session may refer to a diagnostic, therapeutic, and/orsurgical operation performed on a patient. A non-limiting example of atreatment session may include an endoscopic procedure. In someembodiments, and as disclosed elsewhere in the present disclosure, theannular seal is formed of a flexible material and includes an openingdiameter of less than 4.5 mm. To illustrate, FIG. 26 depicts a flowchartof an exemplary method 2610 for treating equipment of differingdimensions in a vacuum environment. Method 2610 may include a step 2612that may include inserting a first removable enclosure into a housingduring a first treatment session.

Some disclosed embodiments also include inserting during the firsttreatment session, a first elongated tool into the first removableenclosure, the first elongated tool having a first region of a firstdimension. The first region of the first elongated tool may include adistal portion of the tool and/or another suitable portion of the tool.For example, method 2610 may include a step 2614 that may includeinserting a first elongated tool into the first removable enclosureduring the first treatment session.

Some disclosed embodiments also include sealing, upon insertion of thefirst elongated tool, the first region of the first dimension with thefirst annular seal. For example, sealing may include utilizing the firstannular seal to form a vacuum seal against a diameter of the firstelongated tool. To illustrate, method 2610 may include a step 2616including sealing the first region of the first elongated tool havingthe first dimension with the first annular seal.

Some disclosed embodiments further include maintaining the firstelongated tool in the first enclosure during an establishment of atleast a partial vacuum in the vacuum chamber region. As used herein, apartial vacuum may refer to an enclosed space having a sub-atmosphericpressure. As discussed elsewhere in the present disclosure, the at leasta partial vacuum may be established in the vacuum chamber with aplurality of vacuum pumps connected in series. Some embodiments includegenerating plasma in the vacuum chamber region during the firsttreatment session, such as for exposing the first elongated tool toplasma (e.g., as a surface treatment). Plasma may be generated while thefirst elongated tool is sealed with the first annular seal and the atleast partial vacuum is established in the vacuum chamber. Toillustrate, method 2610 may include a step 2618 including maintainingthe first tool in the first enclosure during establishment of a vacuumin the vacuum chamber region, such as for treating the elongated toolwith plasma.

Some disclosed embodiments additionally include extracting the firstelongated tool from the first enclosure. To illustrate, method 2610 mayinclude a step 2620 including extracting the first elongated tool fromthe first enclosure.

Some disclosed embodiments also include inserting a second removableenclosure into the housing during a second treatment session. Forexample, after extracting the first elongated tool, the first enclosuremay be extracted from the housing and a second removable enclosure maybe inserted into the housing in a second treatment session. Thus, thehousing may be reusable such that it may be used to perform differenttreatment sessions (e.g., for different patients and/or for differenttypes of treatment). The second removable enclosure may be divided intoa second vacuum chamber region and a second non-vacuum region separatedby a second annular seal corresponding in configuration to the firstannular seal. Embodiments may also include inserting a second elongatedtool into the second removable enclosure during the second treatmentsession. The second elongated tool may have a second region (e.g., adistal portion thereof) having a second dimension differing from thefirst dimension of the first elongated tool. For example, the secondregion may differ from the first region in at least one of a length,width, height, diameter, radius, circumference, surface area,cross-sectional area, or arc length. Embodiments may also includesealing, upon insertion of the second elongated tool, the second regionof the second dimension with the second annular seal (e.g., using thesecond annular seal to establish a vacuum seal with the second elongatedtool). Embodiments may also include maintaining the second elongatedtool in the second enclosure during an establishment of at least apartial vacuum in the second vacuum chamber region. Embodiments may alsoinclude extracting the second elongated tool from the second enclosure.

Additionally, or alternatively, some disclosed embodiments includereusing both the housing and the first removable enclosure in a secondtreatment session. For example, after extracting the first elongatedtool, the first enclosure and housing may be sanitized (e.g., bycleaning and/or replacing the annular seal) and then used for a secondtreatment session (e.g., for a different patient and/or for a differenttype of treatment). Embodiments include maintaining, during a secondtreatment session, the first removable enclosure within the housing.Embodiments also include inserting, during the second treatment session,a second elongated tool into the first removable enclosure. The secondelongated tool may have a second region (e.g., a distal portion thereof)of a second dimension differing from the first dimension. Embodimentsalso include sealing, upon insertion of the second elongated tool, thesecond region of the second dimension with the first annular seal. Someembodiments also include maintaining the second elongated tool in thefirst enclosure during an establishment of at least a partial vacuum inthe vacuum chamber region. Embodiments also include extracting thesecond elongated tool from the first enclosure.

Some disclosed embodiments include generating plasma in the secondvacuum chamber region during the second treatment session. Plasma may begenerated while the second removable enclosure is inserted into thehousing and the second elongated tool is sealed in the second annularseal to maintain at least a partial vacuum in the second vacuum chamberregion. Additionally, or alternatively, plasma may be generated whilethe first removable enclosure is inserted into the housing and thesecond elongated tool is sealed in the first annular seal of the firstenclosure to maintain at least a partial vacuum in the first vacuumchamber region. Disclosed embodiments include exposing the secondelongated tool to plasma, such as for surface treatment of the secondelongated tool.

Disclosed embodiments may include any one of the followingbullet-pointed features alone or in combination with one or more otherbullet-pointed features, whether implemented as a system and/or method,by at least one processor, and/or stored as executable instructions onnon-transitory computer readable media.

-   -   a plasma generation device for treating objects;    -   a housing;    -   a plasma-generation zone within the housing configured to enable        accommodation of an object;    -   circuitry for supplying energy to carry out a plasma treatment        for increasing hydrophilicity of the object to a desired level;    -   at least one sensor configured to measure at least one        plasma-activation parameter during the plasma treatment;    -   at least one processor configured to determine, based on at        least one plasma-activation parameter, that the plasma treatment        is below a threshold for increasing the hydrophilicity of the        object to the desired level;    -   outputting a notification indicating of plasma treatment        failure;    -   at least one sensor configured to measure at least one        plasma-activation parameter by detecting a pressure in a        plasma-generating zone during a plasma treatment;    -   determining that a plasma treatment fails to meet the threshold        when a pressure is outside a pressure range;    -   at least one sensor configured to measure at least one        plasma-activation parameter by detecting a voltage at an        electrode generating the plasma during a plasma treatment;    -   determining that a plasma treatment fails to meet the threshold        when a detected voltage is outside a voltage range;    -   at least one sensor configured to measure at least one        plasma-activation parameter by detecting a plasma frequency        during a plasma treatment;    -   determining that a plasma treatment fails to meet a threshold        when a detected plasma frequency is outside a plasma frequency        range    -   a gas reservoir configured to stream a gas into a        plasma-generation zone for carrying out a plasma treatment;    -   determining that a plasma treatment fails to meet a threshold        based on a characteristic of a gas;    -   at least one sensor including at least one of a pressure sensor,        a voltage sensor, or a plasma frequency sensor;    -   an object including an optical element;    -   an object that is an endoscope;    -   a plasma generation device including a detachable sheath        dimensioned to receive a distal end of an endoscope;    -   a plasma-generation zone configured to apply a plasma treatment        to a distal end of an endoscope within a sheath;    -   an object that is at least a portion of a medical instrument;    -   outputting a notification indicating of plasma treatment failure        prior to using a medical instrument in a medical procedure;    -   maintaining a plasma treatment for a predefined time duration;    -   a predefined time duration based on a characteristic of plasma        generated for a plasma treatment;    -   a predefined time duration based on a physical characteristic of        an object;    -   a predefined time duration based on a desired level of        hydrophilicity of an object;    -   increasing a time duration for a subsequent plasma treatment in        response to determining that that a plasma treatment is below a        threshold;    -   a plasma-generation zone associated with a cavity configured to        retain an object in a manner exposing at least a portion of an        object to a plasma activation zone;    -   a plasma-generation zone configured to contain a plasma cloud on        a first side of a dielectric barrier while an object is located        on a second side of the dielectric barrier;    -   a plasma generator configured to be activated to cause formation        of a plasma cloud in a plasma activation zone;    -   activating a plasma generator for a time period sufficient to        increase a hydrophilicity of an object to a desired level;    -   a desired level of hydrophilicity of an object such that at        least one hour after a plasma treatment, droplets hitting a        surface of an object have contact angles of less than 10        degrees;    -   a method for generating plasma to treat an object;    -   identifying entry of an object into a plasma-generation zone;    -   activating circuitry for supplying energy to generate plasma in        a plasma-generation zone to carry out a plasma treatment for        increasing hydrophilicity of an object to a desired level;    -   measuring at least one plasma-activation parameter during a        plasma treatment;    -   determining, based on at least one plasma-activation parameter,        that a plasma treatment is below a threshold for increasing        hydrophilicity of an object to a desired level;    -   outputting a notification indicating of plasma treatment        failure;    -   a non-transitory computer readable medium containing        instructions that when executed by at least one processor cause        the at least one processor to perform operations for generating        plasma to treat an object;    -   identifying entry of an object into a plasma-generation zone;    -   activating circuitry for supplying energy to generate plasma in        a plasma-generation zone to carry out a plasma treatment for        increasing hydrophilicity of an object to a desired level;    -   measuring at least one plasma-activation parameter during a        plasma treatment;    -   determining, based on at least one plasma-activation parameter,        that a plasma treatment is below a threshold for increasing        hydrophilicity of an object to a desired level;    -   outputting a notification indicating of plasma treatment        failure;    -   a device for treating an elongated tool with plasma;    -   a housing;    -   a bore within a housing;    -   a bore having an open end on a surface of a housing for        insertion of an elongated tool therein;    -   at least one vacuum pump for causing a vacuum in at least a        portion of a bore;    -   an insertion detector for determining when an elongated tool is        inserted within a bore;    -   a vacuum sensor associated with a housing for determining an        extent of negative pressure in at least a portion of a bore;    -   a plasma generator for generating plasma within a bore;    -   at least one processor;    -   receiving an insertion signal from an insertion detector        indicating that an elongated tool is within a bore;    -   in response to an insertion signal, activating at least one        vacuum pump to generate a negative pressure in at least a        portion of a bore;    -   receiving a signal from a vacuum sensor and determining        therefrom that a negative pressure in at least a portion of a        bore is sufficient for plasma generation;    -   activating a plasma generator after determination is made that        negative pressure in at least a portion of bore is sufficient        for plasma generation, thereby exposing a distal end region of        an elongated tool to plasma;    -   a bore configured to receive a sheath therein, the sheath being        sized to receive an elongated tool;    -   causing plasma generation within a sheath;    -   an insertion detector configured to sense insertion of an        elongated tool within a sheath in a bore and to automatically        initiate a plasma generation process upon sensed insertion of        the elongated tool within the sheath;    -   an elongated tool that is a scope having an optical element        located in a distal end region;    -   maintaining activation of a plasma generator for a period        sufficient to cause an external surface of an optical element to        become hydrophilic;    -   a display;    -   outputting a signal to a display indicating a status of a plasma        generator treatment;    -   a sheath including a vacuum port and a vacuum seal therein;    -   a vacuum port being flow-connectable to at least one vacuum pump        to enable causation of a negative pressure within a sheath when        located within a bore;    -   a vacuum seal configured to engage with an elongated tool upon        insertion of the elongated tool into a sheath to maintain a        negative pressure on a distal side of the elongated tool;    -   a bore including an electrical contact therein configured to        engage a contact on a sheath, to thereby enable plasma        generation within the sheath;    -   calculating a number of plasma treatments remaining before        required maintenance;    -   detecting a malfunction of at least one of a plasma generator or        at least one vacuum pump and outputting a malfunction indicator;    -   outputting a warning signal when an optical element is        insufficiently treated to achieve a predetermined level of        hydrophilicity;    -   an elongated tool including a lens;    -   activating a plasma generator for a period sufficient to cause a        lens to become super-hydrophilic;    -   a plasma generator configured for causing a dielectric barrier        discharge;    -   at least one processor is configured to control a plasma        generator in a manner causing a voltage drop of at least 1000        volts;    -   a method for treating an elongated tool with plasma;    -   detecting that an elongated tool is within a bore of a housing;    -   an elongated tool including an optical element on a distal end        thereof;    -   upon detecting, generating a negative pressure in at least a        portion of a bore in a region of an optical element;    -   activating a plasma generator during a period of negative        pressure to thereby expose an optical element to plasma for a        time period sufficient to cause a surface of an optical element        to become hydrophilic;    -   generating a negative pressure and activating a plasma generator        automatically in response to detecting that an elongated tool is        within a bore;    -   a time period sufficient to cause a surface of an optical        element to become hydrophilic;    -   a time period sufficient to cause a surface of an optical        element to become super-hydrophilic;    -   a bore configured to receive a sheath therein;    -   a sheath being sized to receive an elongated tool;    -   exposing a distal end region of an elongated tool to plasma        within a sheath;    -   outputting a warning signal if an optical element is        insufficiently treated to achieve sufficient hydrophilicity;    -   activating a plasma generator to result in a dielectric barrier        discharge;    -   a device for inhibiting condensation distortion on an optical        element of a medical instrument configured for insertion into a        body cavity;    -   a housing;    -   a cavity within the housing, the cavity being sized to removably        retain at least a portion of the medical instrument therein,        wherein the portion includes the optical element;    -   a plasma activation zone within the cavity and arranged such        that when the at least a portion of the medical instrument is        retained within the cavity, the optical element is located        within the plasma activation zone;    -   a plasma generator configured to be activated to cause formation        of a plasma cloud in the plasma activation zone in a vicinity of        the optical element;    -   a controller configured to activate the plasma generator for a        time period sufficient to cause the optical element to become        hydrophilic prior to insertion into the body cavity;    -   the medical instrument includes a scope having an elongated        shaft, the cavity includes an elongated channel for receiving        the elongated shaft, and the plasma activation zone is located        proximate a distal end of the elongated channel;    -   the scope includes a laparoscope or an endoscope;    -   the optical element includes a lens element on a distal end of        the elongated shaft;    -   the elongated channel is sized to receive a sheath surrounding a        portion of the elongated shaft including the optical element;    -   the sheath is formed of a dielectric material;    -   the housing is configured such that the sheath surrounds the        optical element when the optical element is in the plasma        activation zone;    -   the device is configured to cause the plasma cloud to occur        within the sheath;    -   the cavity is configured to receive a sheath having a sheath        electrode therein and having an external electrical contact, and        wherein the cavity includes an internal contact configured to        form an electrical connection with the external contact when the        sheath is located within the cavity, to thereby enable a supply        of energy to the sheath electrode;    -   at least one pump configured to establish at least a partial        vacuum within the sheath in an area of the sheath electrode;    -   the housing includes a housing electrode therein;    -   the housing electrode is configured to form an electrical        circuit with the sheath electrode when the sheath is inserted in        the elongated channel;    -   a circuit for electrically transferring power to the sheath        electrode;    -   the at least one pump includes a plurality of interconnected        pumps;    -   the controller is configured to activate the plasma generator        for a time period sufficient to cause the optical element to        become super-hydrophilic prior to insertion into the body        cavity;    -   the plasma generator is configured cause formation of the plasma        cloud through Dielectric Barrier Discharge;    -   a method of inhibiting condensation distortion on an optical        element of a medical instrument configured for insertion into a        body cavity;    -   removably inserting, within a cavity, at least a portion of the        medical instrument, wherein the portion includes an optical        element;    -   locating the optical element within a plasma activation zone        inside the cavity, when the at least a portion of the medical        instrument is retained within the cavity;    -   generating plasma to cause formation of a plasma cloud in the        plasma activation zone in a vicinity of the optical element;    -   maintaining the plasma cloud for a time period sufficient to        cause the optical element to become hydrophilic;    -   inserting the hydrophilic optical element in a body cavity;    -   establishing at least a partial vacuum in a region containing        the plasma activation zone    -   maintaining the plasma cloud for a time period sufficient to        cause the optical element to become super-hydrophilic prior to        insertion into the body cavity;    -   causing the formation of the plasma cloud is achieved through        Dielectric Barrier Discharge;    -   a device for inhibiting condensation distortion on an optical        element;    -   a housing;    -   a chamber within a housing;    -   electrical circuitry in a housing;    -   a plasma activation region associated with a chamber and        configured to retain an optical element in a manner exposing an        optical surface of the optical element thereof to a plasma        activation region;    -   a plasma-activation region configured to contain gas on a first        side of a dielectric barrier;    -   an electrical circuitry configured to form an electrical        connection with a first electrode located on a first side of a        dielectric barrier;    -   a second electrode connected to an electrical circuitry and        being located on a second side of a dielectric barrier, opposite        a plasma activation region;    -   at least one processor;    -   controlling electricity flow through circuitry to cause an        electric field associated with a voltage drop between a first        electrode and a second electrode to thereby generate plasma        within a plasma-activation region;    -   maintaining generated plasma in a plasma-generating region for a        time period sufficient to cause an optical surface to become        hydrophilic;    -   an optical element including a lens;    -   an optical surface that is a surface of a lens;    -   a chamber configured to receive an elongated tool with an        optical element proximate to a distal end of an elongated tool;    -   a dielectric barrier and a first electrode that are removable        from a housing;    -   a dielectric barrier configured to isolate a second electrode        from gas in a chamber;    -   a thickness of a dielectric barrier between about 0.3 mm to        about 3 mm;    -   electrical circuitry in a housing including a plasma generating        field applicator configured to cause a voltage drop to be at        least 800 V;    -   electrical circuitry in a housing including a plasma generating        field applicator configured to cause a voltage drop to be at        least 1000 V;    -   a plasma-activation region configured to contain a gas that is        air;    -   a plasma-activation region configured to contain a gas that is        inert;    -   at least one pump for causing at least a partial vacuum in a        plasma activation region;    -   a gas pressure associated with a partial vacuum below 0.1 atm;    -   a stopper for maintaining a gap between an optical element and a        second electrode;    -   a stopper acting as a dielectric barrier between a first        electrode and a second electrode;    -   a method for inhibiting condensation distortion on an optical        element;    -   detecting an optical element inserted into a plasma-generation        region within a housing;    -   a plasma-activation region configured to contain gas on a first        side of a dielectric barrier;    -   electricity connecting a first electrode located on a first side        of the dielectric barrier with a second electrode located on a        second side of the dielectric barrier, opposite a plasma        activation region;    -   applying an electric field associated with a potential drop of        greater than 1000 V between a first electrode and a second        electrode to thereby generate plasma within a plasma-activation        region;    -   maintaining a generated plasma in a plasma-generating region for        a time period sufficient to cause an optical surface to become        hydrophilic;    -   an optical element that is part of a medical instrument having        an elongated shaft;    -   an optical element including a lens on a distal end of an        elongated shaft;    -   a medical instrument that is a laparoscope or an endoscope;    -   a time period sufficient to cause an optical surface to become        hydrophilic that is less than 1 minute of activated electric        field;    -   a time period sufficient to cause an optical surface to become        hydrophilic that is less than 10 seconds of activated electric        field;    -   a time period sufficient to cause an optical surface to become        hydrophilic that is less than 5 seconds of activated electric        field;    -   an apparatus for treating equipment of differing dimensions in a        vacuum environment;    -   an enclosure having a channel for receiving elongated tools of        varying diameters;    -   an enclosure being divided into a vacuum chamber region and a        non-vacuum region;    -   an annular seal disposed between a vacuum chamber region and a        non-vacuum region;    -   an annular seal being formed of a flexible material and        configured to form a vacuum seal against a wall of a first tool        when the first tool is inserted therein and against a wall of a        second tool when the second tool is inserted therein, wherein        the first tool has a diameter at least one and a half times        greater than a diameter of the second tool;    -   optical medical scopes of differing sizes;    -   an annular seal configured to adapt to and seal against        differing sizes of medical scopes;    -   medical scopes each having an optical element;    -   a vacuum chamber region configured to contain optical elements        therein during treatments that expose each optical element to        plasma;    -   an annular seal sized to enable sealing a vacuum chamber region        when a second tool is inserted in a channel after extraction of        a first tool from the channel;    -   an annular seal configured to adjust to a tool diameter in a        range of 0.5 mm to 8 mm;    -   an annular seal configured to adjust to a tool diameter in a        range of 2 mm to 12 mm;    -   an opening diameter of an annular seal that is less than 4.5 mm;    -   an annular seal having a hardness within a range of 25 Shore to        90 Shore;    -   an annular seal including an opening and a diameter of the        opening that is configured to change upon tool insertion;    -   an enclosure that is a disposable sheath;    -   an enclosure within a reusable housing;    -   an annular seal configured for reuse;    -   an annular seal including a flap;    -   a flap of an annular seal configured to extend inward from a        wall of an enclosure into a channel;    -   a vacuum chamber region configured to maintain a vacuum of less        than about 0.3 atm when an annular seal forms a vacuum seal        against at least one of a first tool or a second tool;    -   an enclosure sized to be removably inserted into a housing        containing electrical circuitry for inducing a voltage drop to        thereby generate plasma within a vacuum chamber region;    -   an enclosure configured to be identifiable by a housing;    -   a method for treating equipment of differing dimensions in a        vacuum environment;    -   inserting during a first treatment session, a first removable        enclosure into a housing;    -   a first removable enclosure being divided into a vacuum chamber        region and a non-vacuum region separated by a first annular seal        configured to adjust to varying tool sizes;    -   inserting during a first treatment session, a first elongated        tool into a first removable enclosure;    -   a first elongated tool having a first region of a first        dimension;    -   sealing, upon insertion of a first elongated tool, a first        region of a first dimension with a first annular seal;    -   maintaining a first elongated tool in a first enclosure during        an establishment of at least a partial vacuum in a vacuum        chamber region;    -   extracting a first elongated tool from a first enclosure;    -   inserting during a second treatment session, a second removable        enclosure into a housing;    -   a second removable enclosure being divided into a second vacuum        chamber region and a second non-vacuum region separated by a        second annular seal corresponding in configuration to a first        annular seal;    -   inserting during a second treatment session, a second elongated        tool into a second removable enclosure;    -   a second elongated tool having a second region of a second        dimension differing from a first dimension;    -   sealing, upon insertion of a second elongated tool, a second        region of a second dimension with a second annular seal;    -   maintaining a second elongated tool in a second enclosure during        an establishment of at least a partial vacuum in a second vacuum        chamber region;    -   extracting a second elongated tool from a second enclosure;    -   maintaining during a second treatment session, a first removable        enclosure within a housing;    -   inserting during a second treatment session, a second elongated        tool into a first removable enclosure;    -   a second elongated tool having a second region of a second        dimension differing from a first dimension;    -   sealing, upon insertion of a second elongated tool, a second        region of a second dimension with a first annular seal;    -   maintaining a second elongated tool in a first enclosure during        an establishment of at least a partial vacuum in a vacuum        chamber region;    -   extracting a second elongated tool from a first enclosure;    -   generating plasma in a vacuum chamber region during a first        treatment session;    -   generating plasma in a second vacuum chamber region during a        second treatment session;    -   exposing a first elongated tool to plasma;    -   exposing a second elongated tool to plasma;    -   an annular seal formed of a flexible material and including an        opening diameter of less than 4.5 mm;    -   a plasma generation device for treating objects;    -   a housing;    -   a plasma generation zone within a housing configured to enable        accommodation of an object;    -   a plasma generator for enabling formation of plasma within a        plasma generation zone;    -   a plurality of vacuum pumps within a housing, each pump having a        vacuum inlet;    -   a plurality of conduits within a housing connecting a plurality        of vacuum pumps in series, such that when activated, the series        of pumps cause a vacuum within a plasma generation zone;    -   at least one processor configured to simultaneously operate a        plurality of vacuum pumps while an object is in a region of a        plasma generation zone;    -   a series of pumps configured to cause a vacuum of between 0.1        atm and 0.01 atm;    -   at least one processor configured to activate a plasma generator        after a vacuum is caused by a series of pumps;    -   at least one processor configured to cause plasma to be        generated for a period of time sufficient to cause a portion of        an object to become hydrophilic;    -   a plurality of pumps including at least three pumps;    -   a plurality of pumps including at least four pumps;    -   a plurality of pumps including at least five pumps;    -   an object including an optical surface of an endoscope;    -   a plasma generation zone configured to enable accommodation of        an optical surface surrounded by a dielectric barrier;    -   at least one filter configured to filter air pumped from a        plasma generation zone;    -   a plasma generation zone configured to enable accommodation of        an object surrounded by a dielectric casing;    -   a dielectric casing including a one-way valve for enabling        vacuum formation within the casing;    -   a plasma generator configured to enable formation of plasma        within a plasma generation zone to treat an object when the        object and a dielectric casing are inserted into a housing;    -   a series of pumps configured to cause at least a partial vacuum        within a portion of a dielectric casing;    -   receiving an insertion signal indicating that an object is        within a region of a plasma generation zone;    -   in response to an insertion signal, activating a series of pumps        to cause a vacuum within a plasma generation zone;    -   determining that a vacuum in a plasma generation zone is        sufficient for plasma generation;    -   activating a plasma generator after a determination is made that        a vacuum in a plasma generation zone is sufficient for plasma        generation, thereby exposing at least a portion of an object to        plasma;    -   a method for generating plasma for treating an object;    -   inserting an object into a plasma generation zone within a        housing;    -   while an object is in a region of a plasma generation zone,        simultaneously operating a plurality of vacuum pumps to cause a        vacuum within the plasma generation zone;    -   vacuum pumps connected in series within a housing;    -   activating a plasma generator while a vacuum is caused within a        plasma generation zone, thereby exposing an object to plasma;    -   a vacuum having a pressure of between 0.1 atm and 0.01 atm;    -   causing plasma to be generated for a period of time sufficient        to cause a portion of an object to become hydrophilic;    -   a plurality of vacuum pumps including at least three pumps;    -   a method of inhibiting condensation distortion on an optical        element of a medical instrument configured for insertion into a        body cavity:    -   treating the optical element of the medical instrument to cause        at least one surface of the optical element to become        super-hydrophilic;    -   inserting the medical instrument, with the super-hydrophilic        optical element, into the body cavity;    -   exposing the super-hydrophilic optical element to moisture, such        that the moisture forms a film barrier on the at least one        surface of the optical element to thereby inhibit condensation        distortion;    -   treating the optical element includes maintaining a liquid in        contact with the optical element for a period sufficient to        cause the at least one surface of the optical element to become        super-hydrophilic;    -   the medical instrument is a scope and the optical element is        located on a distal end of the scope;    -   the scope is at least one of an endoscope, duodenoscope or a        laparoscope;    -   the body cavity is a surgical cavity or natural orifice;    -   treating the optical element occurs in a vacuum chamber;    -   applying a liquid to the optical element prior to inserting the        medical instrument into the body cavity;    -   treating the optical element includes exposing the optical        surface to plasma;    -   treating the optical element includes coating the optical        surface with a liquid solution;    -   causing the at least one surface of the optical element to        become super-hydrophilic includes enabling, for at least one        hour after treating the optical element, droplets hitting the at        least one surface of the optical element to have contact angles        of less than 10 degrees;    -   the contact angles are less than 8.5 degrees;    -   the contact angles are less than 7.5 degrees;    -   causing the at least one surface of the optical element to        become super-hydrophilic includes treating the optical element        for less than 30 seconds;    -   treating the optical element includes causing a        super-hydrophilic state of the at least one surface of the        optical element that deteriorates over time;    -   the deterioration of the super-hydrophilic state of the at least        one surface of the optical element occurs within 24 hours;    -   after inserting the medical instrument into the body cavity,        re-treating the optical element to cause the at least one        surface of the optical element to become super-hydrophilic;    -   re-treating the optical element to cause the at least one        surface of the optical element to become super-hydrophilic at        least one additional time within 24 hours of treating the        optical element;    -   the at least one additional re-treatment of the optical element        includes executing the at least one additional re-treatment by a        battery-powered plasma generator;    -   the at least one additional re-treatment of the optical element        includes using the battery-powered plasma generator without        charging the battery-powered plasma generator between the        treatment and the at least one additional re-treatment; and    -   estimating a number of remaining treatments of the optical        element that can be performed before maintenance is required.

Systems and methods disclosed herein involve unconventional improvementsover conventional approaches. Descriptions of the disclosed embodimentsare not exhaustive and are not limited to the precise forms orembodiments disclosed. Modifications and adaptations of the embodimentswill be apparent from consideration of the specification and practice ofthe disclosed embodiments. Additionally, the disclosed embodiments arenot limited to the examples discussed herein.

The foregoing description has been presented for purposes ofillustration. It is not exhaustive and is not limited to the preciseforms or embodiments disclosed. Modifications and adaptations of theembodiments will be apparent from consideration of the specification andpractice of the disclosed embodiments. For example, the describedimplementations include hardware and software, but systems and methodsconsistent with the present disclosure may be implemented as hardwarealone.

The features and advantages of the disclosure are apparent from thedetailed specification, and thus, it is intended that the appendedclaims cover all systems and methods falling within the true spirit andscope of the disclosure. As used herein, the indefinite articles “a” and“an” mean “one or more.” Similarly, the use of a plural term does notnecessarily denote a plurality unless it is unambiguous in the givencontext. Words such as “and” or “or” mean “and/or” unless specificallydirected otherwise. Further, since numerous modifications and variationswill readily occur from studying the present disclosure, it is notdesired to limit the disclosure to the exact construction and operationillustrated and described, and, accordingly, all suitable modificationsand equivalents may be resorted to, falling within the scope of thedisclosure.

Computer programs based on the written description and methods of thisspecification are within the skill of a software developer. The variousfunctions, scripts, programs, or modules may be created using a varietyof programming techniques. For example, programs, scripts, functions,program sections or program modules may be designed in or by means oflanguages, including JAVASCRIPT, C, C++, JAVA, PHP, PYTHON, RUBY, PERL,BASH, or other programming or scripting languages. One or more of suchsoftware sections or modules may be integrated into a computer system,non-transitory computer readable media, or existing communicationssoftware. The programs, modules, or code may also be implemented orreplicated as firmware or circuit logic.

Moreover, while illustrative embodiments have been described herein, thescope may include any and all embodiments having equivalent elements,modifications, omissions, combinations (e.g., of aspects across variousembodiments), adaptations or alterations based on the presentdisclosure. The elements in the claims are to be interpreted broadlybased on the language employed in the claims and not limited to examplesdescribed in the present specification or during the prosecution of theapplication, which examples are to be construed as non-exclusive.Further, the steps of the disclosed methods may be modified in anymanner, including by reordering steps or inserting or deleting steps. Itis intended, therefore, that the specification and examples beconsidered as exemplary only, with a true scope and spirit beingindicated by the following claims and their full scope of equivalents.

What is claimed is:
 1. A device for inhibiting condensation distortionon an optical element, the device comprising: a housing; a chamberwithin the housing; electrical circuitry in the housing; a plasmaactivation region associated with the chamber and being configured toretain the optical element in a manner exposing an optical surface ofthe optical element thereof to the plasma activation region, wherein theplasma-activation region is configured to contain gas on a first side ofa dielectric barrier and the electrical circuitry is configured to forman electrical connection with a first electrode located on the firstside of the dielectric barrier; a second electrode connected to theelectrical circuitry, and being located on a second side of thedielectric barrier, opposite the plasma activation region; and at leastone processor configured to: control electricity flow through thecircuitry to cause an electric field associated with a voltage dropbetween the first electrode and a second electrode to thereby generateplasma within the plasma-activation region; and maintain the generatedplasma in the plasma-generating region for time period sufficient tocause the optical surface to become hydrophilic.
 2. The device of claim1, wherein the optical element includes a lens, and the optical surfaceis a surface of the lens.
 3. The device of claim 1, wherein the chamberis configured to receive an elongated tool with the optical elementproximate to a distal end of the elongated tool.
 4. The device of claim1, wherein the dielectric barrier and the first electrode are removablefrom the housing.
 5. The device of claim 1, wherein the dielectricbarrier is configured to isolate the second electrode from gas in thechamber.
 6. The device of claim 1, wherein a thickness of the dielectricbarrier is between about 0.3 mm to about 3 mm.
 7. The device of claim 1,wherein the electrical circuitry in the housing includes a plasmagenerating field applicator configured to cause the voltage drop to beat least 800 V.
 8. The device of claim 1, wherein the electricalcircuitry in the housing includes a plasma generating field applicatorconfigured to cause the voltage drop to be at least 1000 V.
 9. Thedevice of claim 1, wherein the gas that the plasma-activation region isconfigured to contain is air.
 10. The device of claim 1, wherein the gasthat the plasma-activation region is configured to contain is inert. 11.The device of claim 1, further including at least one pump for causingat least a partial vacuum in the plasma activation region.
 12. Thedevice of claim 11, wherein a gas pressure associated with the partialvacuum is below 0.1 atm.
 13. The device of claim 11, wherein a gaspressure associated with the partial vacuum is below 0.3 atm.
 14. Thedevice of claim 1, further including a stopper for maintaining a gapbetween the optical element and the second electrode, the stopper actingas the dielectric barrier between the first electrode and the secondelectrode.
 15. A method for inhibiting condensation distortion on anoptical element, the method comprising: detecting an optical elementinserted into a plasma-generation region within a housing, wherein theplasma-activation region is configured to contain gas on a first side ofa dielectric barrier; electricity connecting a first electrode locatedon the first side of the dielectric barrier with a second electrodelocated on a second side of the dielectric barrier, opposite the plasmaactivation region; applying an electric field associated with apotential drop of greater than 1000 V between the first electrode and asecond electrode to thereby generate plasma within the plasma-activationregion; and maintaining the generated plasma in the plasma-generatingregion for time period sufficient to cause the optical surface to becomehydrophilic.
 16. The method of claim 15, wherein the optical element ispart of a medical instrument having an elongated shaft and the opticalelement includes a lens on a distal end of the elongated shaft.
 17. Themethod of claim 15, wherein the medical instrument is a laparoscope oran endoscope.
 18. The method of claim 15, wherein the time periodsufficient to cause the optical surface to become hydrophilic is lessthan 1 minute of activated electric field.
 19. The method of claim 15,wherein the time period sufficient to cause the optical surface tobecome hydrophilic is less than 10 seconds of activated electric field.20. The method of claim 15, wherein the time period sufficient to causethe optical surface to become hydrophilic is less than 5 seconds ofactivated electric field.